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1.发明授权Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method 有权无掩模曝光装置，无掩模曝光方法和由无掩模曝光装置制造的显示基板和无掩模曝光方法公开(公告)号：US09436098B2
公开(公告)日：2016-09-06
申请号：US14635339
申请日：2015-03-02
发明人： Jung-Chul Heo , Hi-Kuk Lee , Jae-Hyuk Chang , Sang-Hyun Lee , Jung-In Park , Sang-Hyun Yun , Ki-Beom Lee , Hyun-Seok Kim , Kab-Jong Seo , Jun-Ho Sim , Byoung-Min Yun , Sang-Don Jang , Jae-Young Jang , Chang-Hoon Kim
IPC分类号： G03F7/20 , H01L29/786 , H01L27/12
CPC分类号： G03F7/70508 , G03F7/2022 , G03F7/2051 , G03F7/702 , G03F7/70291 , G03F7/70391 , H01L27/1222 , H01L27/124 , H01L27/1259 , H01L29/78669 , H01L29/78693 , H01L29/78696
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.
摘要翻译： 无掩模曝光装置包括具有数字微镜装置的曝光头。 数字微镜装置被配置为将从曝光源施加的源光束传输到衬底。 系统控制部分被配置为通过使用图形数据系统文件来控制数字微镜装置。 图形数据系统文件包括用于形成源电极，漏电极和设置在源电极和漏电极之间的沟道部分的数据。 图形系统文件包括用于形成相对于曝光头的扫描方向沿对角线方向延伸的通道部分的数据。
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2.发明授权公开(公告)号：US09726982B2
公开(公告)日：2017-08-08
申请号：US14831830
申请日：2015-08-20
发明人： Hi-Kuk Lee , Jae-Young Jang , Jae-Hyuk Chang , Sang-Don Jang
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70358 , G03F7/70558
摘要： A maskless exposure device including a light source configured to emit an exposure beam, a light modulation element configured to modulate the exposure beam according to an exposure pattern, a projection optical system configured to transfer a modulated exposure beam to a substrate as a beam spot array, a beam measurement part configured to measure a beam data of the beam spot array, and a compensating mask generator configured to generate a compensating mask by utilizing a measured data of the exposure beam for compensating cumulative illumination, wherein the compensating mask generator is configured to turn off left and right beams of a first selected spot beam selected by the beam data, and then to turn off a second selected spot beam.
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公开(公告)号：US09897772B2
公开(公告)日：2018-02-20
申请号：US14563463
申请日：2014-12-08
发明人： Sang-Joon Hong , Hi-Kuk Lee , Sang-Don Jang
CPC分类号： G02B7/025 , F16B11/008 , Y10T403/472
摘要： Disclosed is a fixing module for fixing an optical system to an optical apparatus, including a coupling unit having a plate to couple to the apparatus, the coupling unit having a first penetrating space at a central portion thereof and a protruding portion protruded downwards from the plate; a first fixing unit combinable with the coupling unit and having a receiving space including a thermosetting resin such that the protruding portion is fixed into the thermosetting resin; and a second fixing unit combinable with the first fixing unit and having a second penetrating space communicating with the first penetrating space, such that the optical system can penetrate through the first and the second penetrating spaces and be fixed by the second fixing unit.
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4.发明申请MASKLESS EXPOSURE DEVICE AND METHOD FOR COMPENSATING CUMULATIVE ILLUMINATION USING THE SAME 有权用于使用该方法来补偿积分照明的无障碍曝光装置和方法公开(公告)号：US20160109809A1
公开(公告)日：2016-04-21
申请号：US14831830
申请日：2015-08-20
发明人： Hi-Kuk Lee , Jae-Young Jang , Jae-Hyuk Chang , Sang-Don Jang
IPC分类号： G03F7/20
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70358 , G03F7/70558
摘要： A maskless exposure device including a light source configured to emit an exposure beam, a light modulation element configured to modulate the exposure beam according to an exposure pattern, a projection optical system configured to transfer a modulated exposure beam to a substrate as a beam spot array, a beam measurement part configured to measure a beam data of the beam spot array, and a compensating mask generator configured to generate a compensating mask by utilizing a measured data of the exposure beam for compensating cumulative illumination, wherein the compensating mask generator is configured to turn off left and right beams of a first selected spot beam selected by the beam data, and then to turn off a second selected spot beam.
摘要翻译： 一种无掩模曝光装置，包括被配置为发射曝光光束的光源，配置成根据曝光图案调制曝光光束的光调制元件，被配置为将调制曝光光束传送到基板的投影光学系统作为光束阵列 ，被配置为测量所述光束阵列的光束数据的光束测量部分以及被配置为通过利用所述曝光光束的测量数据来补偿累积照明来生成补偿掩模的补偿掩码发生器，其中所述补偿掩码发生器被配置为 关闭由光束数据选择的第一选定光束的左右光束，然后关闭第二选定的光束。
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