Abstract:
Disclosed are semiconductor devices and methods of fabricating the same. The semiconductor device includes a first dielectric layer including a first pad, a second dielectric layer on the first dielectric layer, a through electrode that penetrates the second dielectric layer and is electrically connected to the first pad, an upper passivation layer on the second dielectric layer, a second pad on the upper passivation layer, and an upper barrier layer between the upper passivation layer and the second pad. The first pad and the through electrode include a first material. The second pad includes a second material that is different from the first material of the first pad and the through electrode. The second pad includes a first part on the upper passivation layer, and a second part that extends from the first part into the upper passivation layer and is connected to the through electrode.
Abstract:
A test system includes row decoder, column decoder, row test controller, and test circuit. The row decoder activates one of first through M-th row signals based on plurality of row input signals. The column decoder activates one of first through N-th column signals based on plurality of column input signals. The row test controller outputs first through N-th column output signals, which are activated, when row test enable signal is activated. The row test controller outputs the first through N-th column signals as the first through N-th column output signals respectively when the row test enable signal is deactivated. The test circuit includes first through M-th row test blocks, each of which includes first through N-th test units. The test circuit simultaneously performs short test of the first through N-th test units included in row test block when the row test enable signal is activated.
Abstract:
A test system includes row decoder, column decoder, row test controller, and test circuit. The row decoder activates one of first through M-th row signals based on plurality of row input signals. The column decoder activates one of first through N-th column signals based on plurality of column input signals. The row test controller outputs first through N-th column output signals, which are activated, when row test enable signal is activated. The row test controller outputs the first through N-th column signals as the first through N-th column output signals respectively when the row test enable signal is deactivated. The test circuit includes first through M-th row test blocks, each of which includes first through N-th test units. The test circuit simultaneously performs short test of the first through N-th test units included in row test block when the row test enable signal is activated.
Abstract:
Disclosed are semiconductor devices and methods of fabricating the same. The semiconductor device includes a first dielectric layer including a first pad, a second dielectric layer on the first dielectric layer, a through electrode that penetrates the second dielectric layer and is electrically connected to the first pad, an upper passivation layer on the second dielectric layer, a second pad on the upper passivation layer, and an upper barrier layer between the upper passivation layer and the second pad. The first pad and the through electrode include a first material. The second pad includes a second material that is different from the first material of the first pad and the through electrode. The second pad includes a first part on the upper passivation layer, and a second part that extends from the first part into the upper passivation layer and is connected to the through electrode.
Abstract:
A semiconductor device including a transistor on a substrate; an interlayer insulating layer on the transistor; a first metal-containing layer on the interlayer insulating layer; and a second metal-containing layer on the first metal-containing layer, wherein the second metal-containing layer includes a resistor, the resistor includes a first insulating layer on the first metal-containing layer; a resistor metal layer on the first insulating layer, and a second insulating layer on the resistor metal layer, and the resistor metal layer includes a recessed side surface.
Abstract:
A semiconductor device including a transistor on a substrate; an interlayer insulating layer on the transistor; a first metal-containing layer on the interlayer insulating layer; and a second metal-containing layer on the first metal-containing layer, wherein the second metal-containing layer includes a resistor, the resistor includes a first insulating layer on the first metal-containing layer; a resistor metal layer on the first insulating layer; and a second insulating layer on the resistor metal layer, and the resistor metal layer includes a recessed side surface.
Abstract:
Disclosed are semiconductor devices and methods of fabricating the same. The semiconductor device includes a first dielectric layer including a first pad, a second dielectric layer on the first dielectric layer, a through electrode that penetrates the second dielectric layer and is electrically connected to the first pad, an upper passivation layer on the second dielectric layer, a second pad on the upper passivation layer, and an upper barrier layer between the upper passivation layer and the second pad. The first pad and the through electrode include a first material. The second pad includes a second material that is different from the first material of the first pad and the through electrode. The second pad includes a first part on the upper passivation layer, and a second part that extends from the first part into the upper passivation layer and is connected to the through electrode.