SUBSTRATE PROCESSING APPARATUS
    4.
    发明公开

    公开(公告)号:US20230168278A1

    公开(公告)日:2023-06-01

    申请号:US17930819

    申请日:2022-09-09

    IPC分类号: G01R1/07 H01L21/683 G02B27/28

    摘要: A substrate processing apparatus includes: a chamber configured to perform a wet process and having an internal space, a chuck in the internal spaced and being configured for loading a semiconductor substrate thereon, a probe having an end above the chuck and including an electro-optical crystal and a reflective mirror on one surface of the electro-optical crystal, a measuring unit connected to the probe and configured to provide reference light to the probe, and to detect a polarization component of reflected light reflected from the one end of the probe by the reference light, and a controller configured to calculate an amount of electrostatic charge on a surface of the semiconductor substrate from the polarization component.