公开(公告)号：US20220139669A1

公开(公告)日：2022-05-05

申请号：US17242019

申请日：2021-04-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： YOONG CHUNG ,  NAM KYUN KIM ,  NAOHIKO OKUNISHI ,  KYUNG-SUN KIM ,  SEUNG BO SHIM ,  SANG-HO LEE ,  KANG MIN JEON

IPC: H01J37/32 ,  H01L21/311

Abstract: A plasma processing apparatus includes; a chamber, a lower electrode disposed within the chamber and including a lower surface and an opposing upper surface configured to seat a wafer, an RF rod disposed on the lower surface of the lower electrode and extending in a vertical direction. The RF plate includes a first portion contacting the lower surface of the lower electrode, a second portion protruding from the first portion towards the RF rod, and a third portion extending from the second portion to connect the RF rod. A grounding electrode is spaced apart from the RF plate and at least partially surrounds a side wall of the RF rod and a side wall of the second portion of the RF plate. The grounding electrode includes a first grounding electrode facing each of the side wall of the RF rod and the second portion of the RF plate, and a second grounding electrode at least partially surrounding the first grounding electrode, and configured to horizontally rotate.

公开(公告)号：US20200157682A1

公开(公告)日：2020-05-21

申请号：US16509946

申请日：2019-07-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： MINKYU SUNG ,  SUNG-KI LEE ,  DOUGYONG SUNG ,  SANG-HO LEE ,  KANGMIN JEON

IPC: C23C16/455 ,  C23C16/509 ,  H01J37/32 ,  H01L21/683

Abstract: A gas injection module includes a showerhead having first injection holes on a first region of the showerhead and second injection holes on a second region of the showerhead, the second region being outside the first region, a first distribution plate on the showerhead and having first and second upper passages respectively connected to the first and second injection holes, and a flow rate controller on the first and second upper passages of the first distribution plate. The flow rate controller reduces a difference in pressure within the first and second upper passages so that the gas may have similar flow rates within the first and second injection holes.

公开(公告)号：US20170052019A1

公开(公告)日：2017-02-23

申请号：US15228390

申请日：2016-08-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： JUNGMIN WON ,  MYOUNGHO JUNG ,  SANG-HO LEE ,  DONGYUN SONG ,  SUNGKYUNG YUN

IPC: G01B11/14 ,  G01V8/14 ,  B25J11/00 ,  G01B11/26

CPC classification number: G01V8/14 ,  G01V8/20 ,  H01L21/67259 ,  H01L21/67265 ,  H01L21/67781 ,  Y10S901/47

Abstract: An inspection apparatus includes a supporting substrate. A first sensor unit is provided on the supporting substrate, the first sensor unit comprising a first light-emitting device and a first light-receiving device which are spaced apart from each other and face each other. A second sensor unit is provided on the supporting substrate, the second sensor unit comprising a second light-emitting device and a second light-receiving device which are spaced apart from each other and face each other. The first and second light-emitting devices and the first and second light-receiving devices are disposed at a same distance from a top surface of the supporting substrate. The first and second sensor units are configured to detect whether a robot hand moves in a first direction perpendicular to the top surface of the supporting substrate.

Abstract translation: 检查装置包括支撑基板。 第一传感器单元设置在支撑基板上，第一传感器单元包括彼此间隔开并彼此面对的第一发光装置和第一光接收装置。 第二传感器单元设置在支撑基板上，第二传感器单元包括彼此间隔开并彼此面对的第二发光装置和第二光接收装置。 第一和第二发光装置以及第一和第二光接收装置设置在与支撑基板的顶表面相同的距离处。 第一和第二传感器单元被配置为检测机器人手是否沿垂直于支撑基板的顶表面的第一方向移动。

公开(公告)号：US20210147982A1

公开(公告)日：2021-05-20

申请号：US17159244

申请日：2021-01-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： MINKYU SUNG ,  SUNG-KI LEE ,  DOUGYONG SUNG ,  SANG-HO LEE ,  KANGMIN JEON

IPC: C23C16/455 ,  H01L21/683 ,  H01J37/32 ,  C23C16/509

Abstract: A gas injection module includes a showerhead having first injection holes on a first region of the showerhead and second injection holes on a second region of the showerhead, the second region being outside the first region, a first distribution plate on the showerhead and having first and second upper passages respectively connected to the first and second injection holes, and a flow rate controller on the first and second upper passages of the first distribution plate. The flow rate controller reduces a difference in pressure within the first and second upper passages so that the gas may have similar flow rates within the first and second injection holes.

公开(公告)号：US20180358253A1

公开(公告)日：2018-12-13

申请号：US15864293

申请日：2018-01-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： YOUNGJIN NOH ,  NAMJUN KANG ,  EUNG-SU KIM ,  SEUNGBO SHIM ,  SANG-HO LEE

IPC: H01L21/683 ,  H02N13/00 ,  H01L21/67 ,  H01J37/32

CPC classification number: H01L21/6833 ,  H01J37/32724 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/3321 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/67103 ,  H02N13/00

Abstract: An electrostatic chuck includes: a chuck base including a first hole; a first plate on the chuck base, wherein the first plate includes a second hole on the first hole; a first bushing in the first hole; and a porous block in the first bushing, wherein the first bushing contacts the first plate and is disposed adjacent to the porous block.