公开(公告)号：US10079142B2

公开(公告)日：2018-09-18

申请号：US15165020

申请日：2016-05-26

Applicant: SEMES CO., LTD.

Inventor： Dae Min Kim ,  Sul Lee ,  Bok Kyu Lee ,  Jae Myoung Lee

IPC: H01L21/02 ,  B08B15/00 ,  C11D11/00 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/02052 ,  B08B2203/0229 ,  C11D11/0047 ,  H01L21/67051 ,  H01L21/6875

Abstract: An apparatus for treating a substrate includes an injecting member having a first nozzle configured to supply a first chemical to the substrate that is mounted on the supporting unit, and a second nozzle configured to supply a second chemical, which is different from the first chemical, to the substrate that is mounted on the supporting unit, and a controller configured to supply the first chemical before supplying the second chemicals and to control the first chemical, which is variable according to a type of thin film on the substrate mounted on the supporting unit, to be supplied.

公开(公告)号：US10211075B2

公开(公告)日：2019-02-19

申请号：US15440288

申请日：2017-02-23

Applicant: SEMES CO., LTD.

Inventor： Dae Min Kim ,  Soyoung Park ,  Muhyeon Lee

IPC: B05D1/00 ,  B05D1/02 ,  B05D1/34 ,  B05D1/36 ,  B05D3/00 ,  B05D7/00 ,  B08B3/00 ,  B08B3/02 ,  B08B3/04 ,  H01L21/02 ,  H01L21/67

Abstract: An apparatus and a method for treating a substrate with liquid are disclosed. The substrate treating apparatus comprises a substrate supporting unit for supporting the substrate, a liquid supply unit for supplying a liquid to the substrate supported on the substrate supporting unit, and a controller for controlling the liquid supply unit, wherein the liquid supply unit comprises a first nozzle for supplying a first liquid and a second nozzle for supplying a second liquid, and a second area where the second liquid is supplied on the substrate is provided within a first area where the first liquid is supplied on the substrate. The first liquid and the second liquid supplied with a hydrophobic film are discharged with different ways from each other. Thereby, particles with various sizes may be removed depending on each discharge methods.