公开(公告)号：US10825699B2

公开(公告)日：2020-11-03

申请号：US16224891

申请日：2018-12-19

Applicant: SEMES CO., LTD.

Inventor： Buyoung Jung ,  Jonghan Kim ,  Young Jin Jang ,  Jin Tack Yu ,  Youngjun Choi ,  Daehun Kim ,  Byungsun Bang ,  Jonghyeon Woo ,  Heehwan Kim ,  Cheol-Yong Shin ,  Gui Su Park

IPC: H01L21/67 ,  H01L21/683

Abstract: Disclosed are a standby port and a substrate processing apparatus having the same. The standby port exhausts fumes generated when a processing liquid is discharged into the standby port before the supply of the processing liquid onto a substrate, thereby preventing pollution of a chamber atmosphere.

公开(公告)号：US11794220B2

公开(公告)日：2023-10-24

申请号：US16924633

申请日：2020-07-09

Applicant: SEMES CO., LTD.

Inventor： Inhwang Park ,  Gui Su Park ,  Young Hun Lee ,  Youngseop Choi ,  Seung Hoon Oh ,  Jonghyeon Woo ,  Jin Mo Jae

IPC: B08B7/00 ,  H01L21/67

CPC classification number: B08B7/0021 ,  H01L21/6719 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67103

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

公开(公告)号：US11721575B2

公开(公告)日：2023-08-08

申请号：US16906237

申请日：2020-06-19

Applicant: SEMES CO., LTD.

Inventor： Inhwang Park ,  Gui Su Park ,  Young Hun Lee ,  Youngseop Choi ,  Seung Hoon Oh ,  Jonghyeon Woo ,  Jin Mo Jae

IPC: H01L21/687 ,  B08B3/04 ,  H01L21/67

CPC classification number: H01L21/68785 ,  B08B3/04 ,  H01L21/67051 ,  H01L21/67126 ,  H01L21/68792

Abstract: An apparatus for supporting a substrate includes a rotatable spin head that supports the substrate, a hollow shaft that is connected with the spin head and that transmits torque to the spin head, a nozzle assembly that is disposed in an interior space of the spin head so as not to rotate and that supplies a treatment liquid to a backside of the substrate, and a sealing member that seals a gap between the spin head and the nozzle assembly using a magnetic fluid.