公开(公告)号：US11794220B2

公开(公告)日：2023-10-24

申请号：US16924633

申请日：2020-07-09

Applicant: SEMES CO., LTD.

Inventor： Inhwang Park ,  Gui Su Park ,  Young Hun Lee ,  Youngseop Choi ,  Seung Hoon Oh ,  Jonghyeon Woo ,  Jin Mo Jae

IPC: B08B7/00 ,  H01L21/67

CPC classification number: B08B7/0021 ,  H01L21/6719 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67103

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space for treating the substrate; a fluid supply unit for supplying fluid to the treatment space, wherein the fluid supply unit includes: a supply pipe connected to the treatment space to supply the fluid to the treatment space; a pump installed in the supply pipe to provide flow pressure to the fluid; a vent line installed between the pump and the process chamber to discharge pressure in the fluid to an outside; a relief valve installed in the vent line to open and close the vent line; and a reservoir installed between the pump and a branch point wherein the vent line branches from the supply pipe, wherein the reservoir has a cross-sectional area larger than a cross-sectional area of a portion of the supply pipe located between the pump and the branch point.

公开(公告)号：US11721575B2

公开(公告)日：2023-08-08

申请号：US16906237

申请日：2020-06-19

Applicant: SEMES CO., LTD.

Inventor： Inhwang Park ,  Gui Su Park ,  Young Hun Lee ,  Youngseop Choi ,  Seung Hoon Oh ,  Jonghyeon Woo ,  Jin Mo Jae

IPC: H01L21/687 ,  B08B3/04 ,  H01L21/67

CPC classification number: H01L21/68785 ,  B08B3/04 ,  H01L21/67051 ,  H01L21/67126 ,  H01L21/68792

Abstract: An apparatus for supporting a substrate includes a rotatable spin head that supports the substrate, a hollow shaft that is connected with the spin head and that transmits torque to the spin head, a nozzle assembly that is disposed in an interior space of the spin head so as not to rotate and that supplies a treatment liquid to a backside of the substrate, and a sealing member that seals a gap between the spin head and the nozzle assembly using a magnetic fluid.

公开(公告)号：US12234555B2

公开(公告)日：2025-02-25

申请号：US17503741

申请日：2021-10-18

Applicant: SEMES CO., LTD.

Inventor： Jin Mo Jae ,  Seung Hoon Oh ,  Young Seop Choi ,  Mi So Park ,  Jong Hyeon Woo

IPC: C23C18/16 ,  H01L21/67 ,  H01L21/687

Abstract: An apparatus for treating a substrate includes a vessel having a sealable process space formed therein in which the substrate is accommodated, a supply port that is provided inside a wall of the vessel and that supplies a process fluid into the process space, an exhaust port provided inside the wall of the vessel and spaced apart from the supply port, and a buffer member provided in the process space, the buffer member being provided in a position overlapping with the supply port and the exhaust port when viewed from above. The buffer member includes a sidewall portion that is located outward of the supply port and the exhaust port and that makes contact with the wall of the vessel and an upper wall portion having a through-hole formed therein to correspond to a center of the substrate, the through-hole forming a straight flow path in an up/down direction.

公开(公告)号：US12060942B2

公开(公告)日：2024-08-13

申请号：US17544950

申请日：2021-12-08

Applicant: SEMES CO., LTD.

Inventor： Seung Hoon Oh ,  Sang Min Lee ,  Jong Doo Lee ,  Jin Mo Jae ,  Young Hun Lee

IPC: F16J15/3204 ,  B08B7/00

CPC classification number: F16J15/3204 ,  B08B7/0021

Abstract: A sealing member for use in sealing a chamber for treating a substrate, the sealing member inserted in a groove formed in the chamber, includes a bottom part, a top part opposite the bottom part, an inner part connecting a first side of the bottom part to the top part, an outer part opposite the inner part and connecting a second side of the bottom part to the top part, and a recessed portion between the top part and the outer part.