公开(公告)号：US20230194422A1

公开(公告)日：2023-06-22

申请号：US18080552

申请日：2022-12-13

Applicant: SEMES CO., LTD.

Inventor： Seung Tae YANG ,  Sang Woo PARK ,  Young Joon HAN ,  Gi Hun CHOI ,  Moon Soon CHOI ,  Seong Hyeon KIM ,  Bu Young JUNG

IPC: G01N21/3577 ,  B01L3/00

CPC classification number: G01N21/3577 ,  B01L3/502 ,  G01N2021/3595

Abstract: A chemical liquid supply unit includes a chemical liquid storage storing a chemical liquid, a chemical liquid supply line that is connected to the chemical liquid storage, the chemical liquid flowing through the chemical liquid supply line from the chemical liquid storage, and a chemical liquid inspection means detecting impurities from the chemical liquid flowing through the chemical liquid supply line using a spectroscopy method.

公开(公告)号：US20230215741A1

公开(公告)日：2023-07-06

申请号：US17972666

申请日：2022-10-25

Applicant: SEMES CO., LTD.

Inventor： Young Joon HAN ,  Gi Hun CHOI ,  Seung Tae YANG ,  Sang Woo PARK ,  Seong Hyeon KIM ,  Bu Young JUNG

IPC: H01L21/67

CPC classification number: H01L21/67051 ,  H01L21/67103

Abstract: A substrate processing apparatus includes a nozzle unit including a nozzle tip discharging liquid to a substrate; and a liquid supply line supplying the liquid to the nozzle unit, wherein the liquid supply line includes a liquid supply pipe connected to the nozzle tip; a supply valve installed in the liquid supply pipe; and a heater disposed between the nozzle tip and the supply valve in the liquid supply pipe.

公开(公告)号：US20240216834A1

公开(公告)日：2024-07-04

申请号：US18350252

申请日：2023-07-11

Applicant: SEMES CO., LTD.

Inventor： Gi Hun CHOI ,  Seung Tae YANG ,  Seong Hyeon KIM ,  Sang Woo PARK

IPC: B01D19/00

CPC classification number: B01D19/0063 ,  B01D19/0068

Abstract: A method of circulating chemical liquid includes a chemical liquid circulation step of circulating chemical liquid through a chemical liquid supply line and a chemical liquid recovery line installed in a tank of a chemical liquid circulation portion; and a chemical liquid circulation preparation step of removing air bubbles in chemical liquid recovered to the chemical liquid recovery line by opening the chemical liquid recovery line before the chemical liquid supply line is opened, before the chemical liquid circulation step.

公开(公告)号：US20230207306A1

公开(公告)日：2023-06-29

申请号：US18145920

申请日：2022-12-23

Applicant: SEMES CO., LTD.

Inventor： Do Gyeong HA ,  Moon Soon CHOL ,  Young Joon Han ,  Seung Tae YANG

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/687 ,  B08B3/02 ,  B08B13/00

CPC classification number: H01L21/02057 ,  H01L21/67051 ,  H01L21/68764 ,  B08B3/022 ,  B08B13/00 ,  B08B2203/027

Abstract: Disclosed is a method for treating a substrate in a plurality of chambers. The substrate treating method may include performing liquid treatment on a substrate located in a chamber through a supply line for connecting a circulation line and each of the plurality of chambers while the liquid circulates in the circulation line, wherein a flow rate per unit time of the liquid flowing downstream of a valve provided in the supply line is constantly maintained at a reference flow rate, and controlling an upstream flow rate which is a flow rate per unit time of the liquid flowing upstream of the circulation line rather than the supply lines or a downstream flow rate which is a flow rate per unit time of the liquid flowing downstream of the circulation line rather than the supply lines based on a distribution flow rate which is a flow rate per unit time of the liquid flowing upstream of the valve to maintain the reference flow rate.

公开(公告)号：US20220181169A1

公开(公告)日：2022-06-09

申请号：US17520588

申请日：2021-11-05

Applicant: SEMES CO., LTD.

Inventor： Seung Tae YANG ,  Jong Han KIM ,  Do Gyeong HA

IPC: H01L21/67 ,  H01L21/02

Abstract: A substrate processing apparatus a processing liquid supply unit includes a nozzle supplying a processing liquid onto the substrate, a supply line connected to the nozzle to supply the processing liquid to the nozzle, and a cooler cooling the processing liquid. A volume of the processing liquid is reduced by the cooler so that the processing liquid may be sucked.