公开(公告)号：US12040216B2

公开(公告)日：2024-07-16

申请号：US17386829

申请日：2021-07-28

Applicant: SEMES Co., Ltd.

Inventor： Yong Hoon Hong ,  Kang Suk Lee ,  Hyeon Jun Lee ,  So Young Jang

IPC: H01L21/687 ,  H01L21/67

CPC classification number: H01L21/68742 ,  H01L21/67023 ,  H01L21/68792 ,  H01L21/67051 ,  H01L21/67253

Abstract: A substrate supporting member capable of controlling the flow of charges on a substrate by controlling ground resistance values of a guide pin and a support pin using a variable resistor, and a substrate treating apparatus including the same are provided. The substrate supporting member includes the body; a support pin installed on the body and for supporting the substrate; a guide pin installed on the body and for supporting the substrate; and a charge control device for controlling a charge around the substrate by controlling an electrical connection between the support pin and a first resistor and an electrical connection between the guide pin and a second resistor.

公开(公告)号：US11424139B2

公开(公告)日：2022-08-23

申请号：US17026504

申请日：2020-09-21

Applicant: SEMES CO., LTD.

Inventor： Yong Hoon Hong ,  Heehwan Kim ,  Ji Young Lee

IPC: B08B3/08 ,  B08B13/00 ,  H01L21/67 ,  H01L21/687

Abstract: The inventive concept relates to an apparatus for treating a substrate. The apparatus includes a support unit that supports the substrate and a nozzle unit having a nozzle that dispenses a chemical onto the substrate, in which the nozzle is connected with a ground line, and a variable resistor is provided on the ground line.

公开(公告)号：US11981995B2

公开(公告)日：2024-05-14

申请号：US17086061

申请日：2020-10-30

Applicant: SEMES CO., LTD.

Inventor： Yong Hoon Hong ,  Dohyeon Yoon ,  Heehwan Kim ,  Ji Young Lee ,  Young Su Kim

IPC: C23C16/448 ,  C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  H01L21/67 ,  B05B5/00 ,  B05B5/053

CPC classification number: C23C16/4485 ,  C23C16/4412 ,  C23C16/45563 ,  C23C16/52 ,  H01L21/67 ,  B05B5/002 ,  B05B5/0533 ,  H01L21/67017 ,  H01L21/67051

Abstract: A chemical supply apparatus includes an evaporation unit disposed downstream of a chemical supply source to vaporize supplied chemical thereto, a filter unit disposed downstream of the evaporation unit, wherein the filter unit filters impurities in the vaporized chemical while the vaporized chemical passes through the filter unit, a liquefaction unit disposed downstream of the filter unit to liquefy the vaporized chemical, and a chemical storage tank disposed downstream of the liquefaction unit to store the liquefied chemical therein, wherein an electrode is disposed between the chemical supply source and the liquefaction unit, wherein the electrode electrically reacts with the chemical or particles in the chemical to change electrical properties of the chemical or the particles.

公开(公告)号：US11664212B2

公开(公告)日：2023-05-30

申请号：US17239091

申请日：2021-04-23

Applicant: SEMES CO., LTD.

Inventor： Yong Hoon Hong ,  Sul Lee ,  Myung A Jeon ,  Moonsik Choi ,  Young Su Kim

IPC: H01L21/02 ,  H01L21/263

CPC classification number: H01L21/02057 ,  H01L21/02282 ,  H01L21/2636

Abstract: The inventive concept provides a substrate treating apparatus. In an embodiment, the substrate treating apparatus includes a housing having a treatment space for treating a substrate in an interior thereof, a support unit that supports the substrate in the treatment space, a nozzle that supplies a liquid to the substrate positioned on the support unit, a liquid supply unit that supplies the liquid to the nozzle, and a controller that controls the liquid unit, the liquid supply unit includes a tank having an interior space for storing the liquid, and a first circulation line that circulates the liquid stored in the interior space and in which a first heater is installed, and the controller controls the first heater such that the first heater heats the liquid to a first temperature, at which particles in the interior of the liquid are not eluted.