公开(公告)号：US09461076B2

公开(公告)日：2016-10-04

申请号：US15001439

申请日：2016-01-20

Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

Inventor： Osamu Nakamura ,  Gen Fujii ,  Fuminori Tateishi

IPC: H01L27/12 ,  H01L29/786 ,  H01L29/423 ,  H01L29/66 ,  H01L27/15

CPC classification number: H01L51/0022 ,  H01L27/12 ,  H01L27/1222 ,  H01L27/124 ,  H01L27/1251 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/156 ,  H01L27/3262 ,  H01L27/3279 ,  H01L29/42384 ,  H01L29/66765 ,  H01L29/78669 ,  H01L29/78696 ,  H01L51/56 ,  H01L2227/323

Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.

公开(公告)号：US20160133654A1

公开(公告)日：2016-05-12

申请号：US15001439

申请日：2016-01-20

Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

Inventor： Osamu Nakamura ,  Gen Fujii ,  Fuminori Tateishi

IPC: H01L27/12 ,  H01L29/786

CPC classification number: H01L51/0022 ,  H01L27/12 ,  H01L27/1222 ,  H01L27/124 ,  H01L27/1251 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/156 ,  H01L27/3262 ,  H01L27/3279 ,  H01L29/42384 ,  H01L29/66765 ,  H01L29/78669 ,  H01L29/78696 ,  H01L51/56 ,  H01L2227/323

Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.

公开(公告)号：US20140370639A1

公开(公告)日：2014-12-18

申请号：US14472598

申请日：2014-08-29

Applicant: Semiconductor Energy Laboratory Co., Ltd.

Inventor： Mayumi Yamaguchi ,  Konami Izumi ,  Fuminori Tateishi

IPC: H01L23/00 ,  H01L21/54 ,  H01L35/34 ,  H01L21/02 ,  H01L41/25

CPC classification number: B60C23/0493 ,  A61B5/02444 ,  A61B5/681 ,  B60C23/04 ,  B60C23/0408 ,  B60C23/0411 ,  B60C23/0413 ,  B60C23/20 ,  B81C1/0023 ,  G01L1/16 ,  G01L17/00 ,  H01L21/02118 ,  H01L21/02175 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/54 ,  H01L24/93 ,  H01L27/20 ,  H01L35/34 ,  H01L41/25 ,  H01L41/311 ,  H01L41/313 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/15788 ,  Y10T29/42 ,  H01L2924/00

Abstract: The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved.

Abstract translation: 本发明提供一种具有MEMS的MEMS和传感器，该传感器可以在没有蚀刻牺牲层的工艺的情况下形成。 具有MEMS的MEMS和传感器通过使用间隔层形成间隙而形成。 在使用间隔层形成间隙的MEMS中，不需要用于形成牺牲层的工艺和牺牲层的蚀刻工艺。 结果，蚀刻时间没有限制，可以提高成品率。

公开(公告)号：US09793482B2

公开(公告)日：2017-10-17

申请号：US15280497

申请日：2016-09-29

Applicant: Semiconductor Energy Laboratory Co., LTD.

Inventor： Osamu Nakamura ,  Gen Fujii ,  Fuminori Tateishi

IPC: H01L51/00 ,  H01L51/56 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/786 ,  H01L27/15 ,  H01L27/32

CPC classification number: H01L51/0022 ,  H01L27/12 ,  H01L27/1222 ,  H01L27/124 ,  H01L27/1251 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/156 ,  H01L27/3262 ,  H01L27/3279 ,  H01L29/42384 ,  H01L29/66765 ,  H01L29/78669 ,  H01L29/78696 ,  H01L51/56 ,  H01L2227/323

Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.

公开(公告)号：US09245922B2

公开(公告)日：2016-01-26

申请号：US13975586

申请日：2013-08-26

Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

Inventor： Osamu Nakamura ,  Gen Fujii ,  Fuminori Tateishi

IPC: H01L29/04 ,  H01L27/15 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/786

CPC classification number: H01L51/0022 ,  H01L27/12 ,  H01L27/1222 ,  H01L27/124 ,  H01L27/1251 ,  H01L27/1285 ,  H01L27/1292 ,  H01L27/156 ,  H01L27/3262 ,  H01L27/3279 ,  H01L29/42384 ,  H01L29/66765 ,  H01L29/78669 ,  H01L29/78696 ,  H01L51/56 ,  H01L2227/323

Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.

公开(公告)号：US09597933B2

公开(公告)日：2017-03-21

申请号：US14730362

申请日：2015-06-04

Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

Inventor： Mayumi Yamaguchi ,  Konami Izumi ,  Fuminori Tateishi

IPC: H01L21/00 ,  B60C23/04 ,  B60C23/20 ,  A61B5/00 ,  B81C1/00 ,  G01L1/16 ,  G01L17/00 ,  H01L27/20 ,  H01L41/311 ,  H01L41/313 ,  H01L21/02 ,  H01L21/54 ,  H01L23/00 ,  H01L35/34 ,  H01L41/25 ,  A61B5/024

CPC classification number: B60C23/0493 ,  A61B5/02444 ,  A61B5/681 ,  B60C23/04 ,  B60C23/0408 ,  B60C23/0411 ,  B60C23/0413 ,  B60C23/20 ,  B81C1/0023 ,  G01L1/16 ,  G01L17/00 ,  H01L21/02118 ,  H01L21/02175 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/54 ,  H01L24/93 ,  H01L27/20 ,  H01L35/34 ,  H01L41/25 ,  H01L41/311 ,  H01L41/313 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/15788 ,  Y10T29/42 ,  H01L2924/00

Abstract: The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved.

公开(公告)号：US09054227B2

公开(公告)日：2015-06-09

申请号：US14472598

申请日：2014-08-29

Applicant: Semiconductor Energy Laboratory Co., Ltd.

Inventor： Mayumi Yamaguchi ,  Konami Izumi ,  Fuminori Tateishi

IPC: H01L21/00 ,  H01L21/30 ,  H01L21/46 ,  H01L23/00 ,  A61B5/00 ,  B60C23/04 ,  B81C1/00 ,  G01L1/16 ,  G01L17/00 ,  H01L27/20 ,  H01L41/311 ,  H01L41/313 ,  H01L21/02 ,  H01L21/54 ,  H01L35/34 ,  H01L41/25 ,  A61B5/024

CPC classification number: B60C23/0493 ,  A61B5/02444 ,  A61B5/681 ,  B60C23/04 ,  B60C23/0408 ,  B60C23/0411 ,  B60C23/0413 ,  B60C23/20 ,  B81C1/0023 ,  G01L1/16 ,  G01L17/00 ,  H01L21/02118 ,  H01L21/02175 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/54 ,  H01L24/93 ,  H01L27/20 ,  H01L35/34 ,  H01L41/25 ,  H01L41/311 ,  H01L41/313 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/15788 ,  Y10T29/42 ,  H01L2924/00

Abstract: The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved.

公开(公告)号：US10153434B2

公开(公告)日：2018-12-11

申请号：US15783096

申请日：2017-10-13

Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

Inventor： Osamu Nakamura ,  Gen Fujii ,  Fuminori Tateishi

IPC: H01L33/48 ,  H01L51/56 ,  H01L51/00 ,  H01L27/12 ,  H01L29/423 ,  H01L29/66 ,  H01L29/786 ,  H01L27/15 ,  H01L27/32

Abstract: The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.

公开(公告)号：US10035388B2

公开(公告)日：2018-07-31

申请号：US15460293

申请日：2017-03-16

Applicant: Semiconductor Energy Laboratory Co., Ltd.

Inventor： Mayumi Yamaguchi ,  Konami Izumi ,  Fuminori Tateishi

IPC: H01L21/00 ,  H01L21/30 ,  H01L21/46 ,  B60C23/04 ,  B60C23/20 ,  B81C1/00 ,  H01L41/25 ,  H01L27/20 ,  H01L41/311 ,  H01L41/313

CPC classification number: B60C23/0493 ,  A61B5/02444 ,  A61B5/681 ,  B60C23/04 ,  B60C23/0408 ,  B60C23/0411 ,  B60C23/0413 ,  B60C23/20 ,  B81C1/0023 ,  G01L1/16 ,  G01L17/00 ,  H01L21/02118 ,  H01L21/02175 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/54 ,  H01L24/93 ,  H01L27/20 ,  H01L35/34 ,  H01L41/25 ,  H01L41/311 ,  H01L41/313 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/15788 ,  Y10T29/42 ,  H01L2924/00

Abstract: The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved.

公开(公告)号：US20150343857A1

公开(公告)日：2015-12-03

申请号：US14730362

申请日：2015-06-04

Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

Inventor： Mayumi Yamaguchi ,  Konami Izumi ,  Fuminori Tateishi

IPC: B60C23/04 ,  B60C23/20

CPC classification number: B60C23/0493 ,  A61B5/02444 ,  A61B5/681 ,  B60C23/04 ,  B60C23/0408 ,  B60C23/0411 ,  B60C23/0413 ,  B60C23/20 ,  B81C1/0023 ,  G01L1/16 ,  G01L17/00 ,  H01L21/02118 ,  H01L21/02175 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/54 ,  H01L24/93 ,  H01L27/20 ,  H01L35/34 ,  H01L41/25 ,  H01L41/311 ,  H01L41/313 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/15788 ,  Y10T29/42 ,  H01L2924/00

Abstract: The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved.