公开(公告)号：US20190333740A1

公开(公告)日：2019-10-31

申请号：US16284649

申请日：2019-02-25

Applicant: SPTS TECHNOLOGIES LIMITED

Inventor： PAUL BENNETT

IPC: H01J37/32

Abstract: A plasma generating arrangement includes a plurality of plasma sources, each plasma source including a respective antenna coil assembly electrically coupled to a common electrical terminal via a respective transmission line. Each transmission line is configured to communicate a radio frequency electrical power signal from the common electrical terminal to the respective antenna coil assembly, and has a length which is an odd multiple of ¼ of the wavelength of the radio frequency electrical power signal.

公开(公告)号：US20170256384A1

公开(公告)日：2017-09-07

申请号：US15446052

申请日：2017-03-01

Applicant: SPTS TECHNOLOGIES LIMITED

Inventor： PAUL BENNETT

IPC: H01J37/32 ,  B08B9/08 ,  C23C16/505 ,  C23C16/448 ,  C23C16/503 ,  B08B7/00 ,  C23C16/44

CPC classification number: H01J37/32568 ,  B08B7/0035 ,  B08B9/08 ,  C23C16/4405 ,  C23C16/448 ,  C23C16/503 ,  C23C16/505 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32541 ,  H01J2237/3321 ,  H01J2237/334 ,  H01J2237/335 ,  H01L21/67069

Abstract: A plasma processing apparatus for plasma processing a substrate comprising includes a chamber having one or more walls, in which a portion of the walls of the chamber is an electrode structure formed from a metallic material and configured to act as a primary winding of an inductively coupled plasma source, and an electrical signal supply device for supplying an electrical signal that drives the electrode structure as a primary winding of an inductively coupled plasma source to sustain an inductively coupled plasma within the chamber.