公开(公告)号：US08916393B2

公开(公告)日：2014-12-23

申请号：US13624214

申请日：2012-09-21

Applicant: STMicroelectronics SA ,  STMicroelectronics (Crolles 2) SAS

Inventor： Rachid Taibi ,  Cedrick Chappaz ,  Lea Di Cioccio ,  Laurent-Luc Chapelon

IPC: H01L21/66 ,  H01L27/06

CPC classification number: H01L25/0657 ,  H01L22/12 ,  H01L22/14 ,  H01L27/0688 ,  H01L2224/48463 ,  H01L2225/0651 ,  H01L2225/06541 ,  H01L2225/06596

Abstract: A three-dimensional integrated structure may include two assembled integrated circuits respectively including two metallic lines, and at least two cavities passing through one of the integrated circuits and opening onto two locations respectively in electrical contact with the two metallic lines. The cavities may be sized to place a measuring apparatus at the bottom of the cavities, and in electrical contact with the two locations.

Abstract translation: 三维集成结构可以包括分别包括两条金属线的两个组装的集成电路，以及穿过集成电路中的一个的至少两个空腔，并分别与两个金属线电接触地分开开放到两个位置。 空腔的尺寸可以将测量装置放置在空腔的底部，并与两个位置电接触。

公开(公告)号：US09431373B2

公开(公告)日：2016-08-30

申请号：US14572288

申请日：2014-12-16

Applicant: STMicroelectronics SA ,  STMicroelectronics (Crolles 2) SAS

Inventor： Rachid Taibi ,  Cédrick Chappaz ,  Lea Di Cioccio ,  Laurent-Luc Chapelon

IPC: H01L21/66 ,  H01L25/065 ,  H01L27/06

CPC classification number: H01L25/0657 ,  H01L22/12 ,  H01L22/14 ,  H01L27/0688 ,  H01L2224/48463 ,  H01L2225/0651 ,  H01L2225/06541 ,  H01L2225/06596

Abstract: A three-dimensional integrated structure may include two assembled integrated circuits respectively including two metallic lines, and at least two cavities passing through one of the integrated circuits and opening onto two locations respectively in electrical contact with the two metallic lines. The cavities may be sized to place a measuring apparatus at the bottom of the cavities, and in electrical contact with the two locations.

Abstract translation: 三维集成结构可以包括分别包括两条金属线的两个组装的集成电路，以及穿过集成电路中的一个的至少两个空腔，并分别与两个金属线电接触地分开开放到两个位置。 空腔的尺寸可以将测量装置放置在空腔的底部，并与两个位置电接触。

公开(公告)号：US09522450B2

公开(公告)日：2016-12-20

申请号：US14221402

申请日：2014-03-21

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT ,  STMICROELECTRONICS (CROLLES 2) SAS

Inventor： Jean Berthier ,  Lea Di Cioccio ,  Sebastien Mermoz

IPC: B23Q3/02 ,  H01L23/498 ,  H01L25/00

CPC classification number: B23Q3/02 ,  H01L23/49838 ,  H01L25/50 ,  H01L2224/26175 ,  H01L2224/95146 ,  H01L2924/0002 ,  Y10T29/49982 ,  Y10T29/49998 ,  Y10T29/53091 ,  Y10T29/53178 ,  H01L2924/00

Abstract: A support is provided, including a reception zone in which the external envelope matches the shape of a plate configured to be placed on a droplet deposited at least in the reception zone in order to achieve capillary self-assembly of the plate and the support, and at least one pair of tracks that extend on the support from the reception zone and that have a lyophilic-type affinity with the droplet such that an overflow of the droplet beyond the reception zone is guided in the tracks, wherein the at least one pair of tracks includes a first track and a second track that do not have the same lyophilic-type degree of affinity with the droplet.

Abstract translation: 提供了一种支撑件，其包括接收区域，其中外部封套匹配被配置为放置在至少沉积在接收区域中的液滴上的板的形状，以便实现板和支撑件的毛细管自组装，以及 至少一对轨道，其在所述支撑体上从所述接收区域延伸并且具有与所述液滴的亲液亲和性，使得所述液滴超过所述接收区域的溢出被引导到所述轨道中，其中所述至少一对 轨道包括与液滴不具有相同的亲液亲和度的第一轨道和第二轨迹。

公开(公告)号：US09586207B2

公开(公告)日：2017-03-07

申请号：US14903960

申请日：2014-07-08

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES ,  STMICROELECTRONICS (CROLLES 2) SAS

Inventor： Sebastien Mermoz ,  Lea Di Cioccio ,  Thomas Magis ,  Loic Sanchez

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  B01L3/00 ,  B81C1/00 ,  B81C3/00 ,  B81B1/00 ,  H01L23/13 ,  H01L21/3065

CPC classification number: B01L3/561 ,  B01L3/502 ,  B01L2200/12 ,  B01L2300/0838 ,  B81B1/002 ,  B81B2201/058 ,  B81C1/00555 ,  B81C1/00626 ,  B81C3/005 ,  B81C2201/0112 ,  H01L21/30655 ,  H01L23/13 ,  H01L2224/95146

Abstract: A method for capillary self-assembly of a plate and a carrier, including: forming an etching mask on a region of a substrate; reactive-ion etching the substrate, the etching using a series of cycles each including isotropic etching followed by surface passivation, wherein a duration of the isotropic etching for each cycle increases from one cycle to another, a ratio between durations of the passivation and etching of each cycle is lower than a ratio for carrying out a vertical anisotropic etching to form a carrier having an upper surface defined by the region and side walls defining an acute angle with the upper surface; removing the etching mask; placing a droplet on the upper surface of the carrier; and placing the plate on the droplet.

Abstract translation: 一种用于板和载体的毛细管自组装的方法，包括：在衬底的区域上形成蚀刻掩模; 反应离子蚀刻衬底，蚀刻使用一系列循环，每个循环包括各向同性蚀刻，然后进行表面钝化，其中每个循环的各向同性蚀刻的持续时间从一个循环增加到另一个周期，钝化和蚀刻的持续时间之间的比率 每个周期低于进行垂直各向异性蚀刻的比例，以形成具有由与上表面限定锐角的区域和侧壁限定的上表面的载体; 去除蚀刻掩模; 在载体的上表面上放置液滴; 并将板放在液滴上。

公开(公告)号：US20140283367A1

公开(公告)日：2014-09-25

申请号：US14221402

申请日：2014-03-21

Applicant: STMICROELECTRONICS (CROLLES 2) SAS ,  COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT

Inventor： Jean Berthier ,  Lea Di Cioccio ,  Sebastien Mermoz

IPC: B23Q3/02

CPC classification number: B23Q3/02 ,  H01L23/49838 ,  H01L25/50 ,  H01L2224/26175 ,  H01L2224/95146 ,  H01L2924/0002 ,  Y10T29/49982 ,  Y10T29/49998 ,  Y10T29/53091 ,  Y10T29/53178 ,  H01L2924/00

Abstract: Support comprising a reception zone in which the external envelope matches the shape of a plate (P2) designed to be placed on a droplet deposited at least in the reception zone in order to achieve capillary self-assembly of the plate and the support, and at least one pair of tracks (T11, T12) that extend on the support from the reception zone and that have a lyophilic type affinity with the droplet such that an overflow of the droplet beyond the reception zone is guided in the tracks, characterised in that the at least one pair of tracks comprises a first track (T11) and a second track (T12) that do not have the same lyophilic type degree of affinity with the droplet.

Abstract translation: 支撑件包括接收区域，其中外部封套匹配设计成放置在至少在接收区域中沉积的液滴上的板（P2）的形状，以便实现板和支撑件的毛细管自组装，并且在 至少一对轨道（T11，T12），其在所述支撑体上从所述接收区域延伸并且具有与所述液滴的亲液亲和性，使得所述液滴超过所述接收区域的溢出被引导到所述轨道中，其特征在于， 至少一对轨迹包括与液滴不具有相同亲液性亲和度的第一轨道（T11）和第二轨道（T12）。

公开(公告)号：US20130181220A1

公开(公告)日：2013-07-18

申请号：US13624214

申请日：2012-09-21

Applicant: STMicroelectronics (Crolles 2) SAS

Inventor： Rachid Taibi ,  Cedrick Chappaz ,  Lea Di Cioccio ,  Laurent-Luc Chapelon

IPC: H01L21/66

CPC classification number: H01L25/0657 ,  H01L22/12 ,  H01L22/14 ,  H01L27/0688 ,  H01L2224/48463 ,  H01L2225/0651 ,  H01L2225/06541 ,  H01L2225/06596

Abstract: A three-dimensional integrated structure may include two assembled integrated circuits respectively including two metallic lines, and at least two cavities passing through one of the integrated circuits and opening onto two locations respectively in electrical contact with the two metallic lines. The cavities may be sized to place a measuring apparatus at the bottom of the cavities, and in electrical contact with the two locations.