Method of manufacturing display panel utilizing ratio of etching removal speeds and display panel manufactured by the same

    公开(公告)号:US11637167B2

    公开(公告)日:2023-04-25

    申请号:US17026604

    申请日:2020-09-21

    Abstract: A method of manufacturing a display panel includes forming a circuit layer including a gate, a source, and a drain on a base substrate and forming a light emitting element layer on the circuit layer. The forming of the circuit layer includes sequentially forming a preliminary metal layer, a preliminary oxide layer comprising molybdenum and tantalum, and a preliminary capping layer which comprise a preliminary electrode layer, cleaning the preliminary electrode layer, forming a photoresist layer pattern on the preliminary electrode layer, etching the preliminary electrode layer, and removing the photoresist layer pattern. During the etching of the preliminary electrode layer, a ratio between a removal speed ER1 of the preliminary oxide layer and a removal speed ER2 of the preliminary metal layer satisfies Equation 1 to maintain a low reflection property 1≤ER2/ER1≤3.  [Equation 1]

    ETCHING DEVICE USEFUL FOR MANUFACTURING A DISPLAY DEVICE
    7.
    发明申请
    ETCHING DEVICE USEFUL FOR MANUFACTURING A DISPLAY DEVICE 有权
    用于制造显示装置的蚀刻装置

    公开(公告)号:US20150118776A1

    公开(公告)日:2015-04-30

    申请号:US14267167

    申请日:2014-05-01

    CPC classification number: H01L27/1259 H01L29/40 H01L2933/0016

    Abstract: A manufacturing method of a display device includes: forming a thin film transistor on a substrate, forming a pixel electrode connected to the thin film transistor, and forming a common electrode insulated from the pixel electrode. At least one of forming the pixel electrode and forming the common electrode includes: forming an electrode layer on the substrate, coating a photoresist on the electrode layer to form a first electrode sub-layer on which the photoresist is coated and a second electrode sub-layer on which the photoresist is not coated, generating etching vapor by heating an etching solution in a double boiler, and etching the second electrode sub-layer by using the etching vapor.

    Abstract translation: 显示装置的制造方法包括:在基板上形成薄膜晶体管,形成与薄膜晶体管连接的像素电极,形成与像素电极绝缘的公共电极。 形成像素电极和形成公共电极中的至少一个包括:在衬底上形成电极层,在电极层上涂覆光致抗蚀剂以形成其上涂覆有光致抗蚀剂的第一电极子层和第二电极子层, 其上没有涂覆光致抗蚀剂的层,通过加热双锅炉中的蚀刻溶液产生蚀刻蒸气,并且通过使用蚀刻蒸气蚀刻第二电极子层。

    Display panel
    10.
    发明授权

    公开(公告)号:US11462573B2

    公开(公告)日:2022-10-04

    申请号:US16877596

    申请日:2020-05-19

    Abstract: A display panel includes a base substrate, a pixel including a thin film transistor and a display element, a first signal line connected to the pixel, and a second signal line disposed on a layer different from the first signal line. At least one of the first signal line and the second signal line includes a lower layer including a conductive material and an upper layer disposed on the lower layer and including a conductive material. The upper layer has an etch selectivity in a range equal to or greater than about 0.5 and equal to or smaller than about 3 with respect to the lower layer.

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