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    Display device
    1.
    发明授权
    Display device 有权

    公开(公告)号：US11132087B2

    公开(公告)日：2021-09-28

    申请号：US16861217

    申请日：2020-04-29

    Applicant: Samsung Display Co., LTD.

    Inventor： Hyunjoo Lee ,  Jun-Woo Kim ,  Dae Won Kim ,  ShiYong Kim ,  Kee Hyun Nam

    IPC: G06F3/041 ,  G09G3/3233

    Abstract: A display device includes a display panel, a folding information detector, a control module, and a distortion compensator. The display panel displays an image and includes a folding area folded with respect to an imaginary folding axis and a plurality of non-folding areas adjacent to the folding area when viewed in a plan view. The folding information detector detects folding information about the display panel, and a control module outputs a control signal based on the folding information provided from the folding information detector. The distortion compensator compensates for a distortion of the image displayed through the folding area in response to the control signal.

    Phase shift mask and method of manufacturing display apparatus using the same
    4.
    发明授权
    Phase shift mask and method of manufacturing display apparatus using the same 有权
    相移掩模和使用其的显示装置的制造方法

    公开(公告)号：US09417516B2

    公开(公告)日：2016-08-16

    申请号：US14794079

    申请日：2015-07-08

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Bongyeon Kim ,  Min Kang ,  Yong Son ,  Hyunjoo Lee ,  Myounggeun Cha ,  Jinho Ju

    IPC: H01L21/00 ,  G03F1/26 ,  G03F7/20 ,  H01L21/02

    CPC classification number: H01L21/0268 ,  G03F1/30 ,  G03F7/0043 ,  G03F7/20 ,  H01L21/02532 ,  H01L21/02678

    Abstract: Provided is a method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate; changing amorphous silicon in the amorphous silicon layer into crystalline silicon by irradiating the amorphous silicon with a laser beam emitted through a phase shift mask; and forming a display device, the phase shift mask including a base substrate; a barrier layer on the base substrate and including a plurality of transmissive portions which are spaced apart from each other in a first direction; and phase shift portions which alternately fill the plurality of transmissive portions in the first direction.

    Abstract translation: 提供一种制造显示装置的方法，所述方法包括在基板上形成非晶硅层; 通过用通过相移掩模发射的激光束照射非晶硅，将非晶硅层中的非晶硅变成晶体硅; 以及形成显示装置，所述相移掩模包括基底基板; 在所述基底基板上的阻挡层，并且包括在第一方向上彼此间隔开的多个透射部; 以及在第一方向交替地填充多个透射部的相移部。

    MASK FOR EXPOSURE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING DISPLAY PANEL USING THE MASK
    5.
    发明申请
    MASK FOR EXPOSURE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING DISPLAY PANEL USING THE MASK 审中-公开
    曝光掩模，其制造方法以及使用掩模制作显示面板的方法

    公开(公告)号：US20150064857A1

    公开(公告)日：2015-03-05

    申请号：US14224284

    申请日：2014-03-25

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： MIN KANG ,  Hyunjoo Lee ,  Bong-Yeon Kim ,  DongEon Lee ,  Yong Son ,  Junhyuk Woo ,  Jinho Ju

    IPC: G03F1/26 ,  H01L21/033 ,  H01L27/12

    CPC classification number: G03F1/26 ,  G03F1/32 ,  H01L27/1288

    Abstract: A mask for etching a target layer includes a mask substrate. A phase inversion layer is disposed to correspond to a non-etched area of a pattern target layer. The phase inversion layer is configured to generate inverted light by inverting a phase of incident light and to transmit the inverted light to the non-etched area of a pattern target layer. An inversion offset part is disposed in a center part of the phase inversion layer. The inversion offset part is configured to generate offset light causing destructive interference with the inverted light in the non-etched area and to provide the offset light to the non-etched area.

    Abstract translation: 用于蚀刻目标层的掩模包括掩模基板。 相位反转层设置成对应于图案目标层的未蚀刻区域。 相位反转层被配置为通过反射入射光的相位并将反射的光传输到图案目标层的未蚀刻区域来产生反相光。 反转偏移部分设置在相位反转层的中心部分。 反转偏移部分被配置为产生偏移光，其对非蚀刻区域中的反射光产生相消干涉并且向非蚀刻区域提供偏移光。

    PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME
    7.
    发明申请
    PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME 有权
    相移片掩模和使用其形成图案的方法

    公开(公告)号：US20150293438A1

    公开(公告)日：2015-10-15

    申请号：US14604459

    申请日：2015-01-23

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： DongEon Lee ,  Min Kang ,  Bong Yeon Kim ,  Yong Son ,  Junhyuk Woo ,  Hyunjoo Lee ,  Jinho Ju

    IPC: G03F1/26

    CPC classification number: G03F1/30 ,  G03F1/26 ,  G03F7/2002 ,  G03F7/2008 ,  G03F7/70191 ,  G03F7/70283 ,  G03F9/7003 ,  G03F9/7007

    Abstract: A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.

    Abstract translation: 形成图案的方法包括：在基底基板上制备包括光致抗蚀剂层的目标基板; 将相移掩模对准目标衬底，所述相移掩模包括掩模衬底，所述掩模衬底分别包括在所述第一子区域的侧面处包括第一子区域和第二子区域的第一区域，以及所述第一区域的侧面处的第二区域， 所述相移掩模包括对应于所述第一区域的所述掩模基板上的相移层; 通过利用相移掩模使第一子区和第二区的光致抗蚀剂层完全曝光; 以及去除所述第一子区域和所述第二区域处的所述光致抗蚀剂层，以形成对应于所述第二子区域的第一和第二光致抗蚀剂图案。 选择相移层的透射率以完全暴露第一子区域中的光致抗蚀剂层。

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