公开(公告)号：US20190051597A1

公开(公告)日：2019-02-14

申请号：US15957048

申请日：2018-04-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jae-woo KIM ,  Chul-ki KIM ,  Chul-wan KIM ,  Yu-kyung PARK ,  Gil-heyun CHOI

IPC: H01L23/522 ,  H01L23/528 ,  H01L49/02

CPC classification number: H01L23/5223 ,  H01L23/5286 ,  H01L28/88 ,  H01L28/91

Abstract: A capacitor structure includes a substrate including an electrode pad and a ground pad, a plurality of dielectric layers on the substrate, the plurality of dielectric layers being at different levels on the substrate, a plurality of conductive pattern layers in at least two dielectric layers of the plurality of dielectric layers, the at least two dielectric layers of the plurality of dielectric layers being first dielectric layers, a plurality of via plugs connecting the plurality of conductive pattern layers to each other, and at least one contact layer in at least one second dielectric layer of the plurality of dielectric layers, the at least one second dielectric layer being different from the at least two first dielectric layers, and the at least one contact layer electrically connecting the plurality of conductive pattern layers to the electrode pad and the ground pad.

公开(公告)号：US20170345713A1

公开(公告)日：2017-11-30

申请号：US15638551

申请日：2017-06-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin-ho Chun ,  Byung-lyul PARK ,  Hyun-soo CHUNG ,  Gil-heyun CHOI ,  Son-kwan HWANG

IPC: H01L21/768 ,  H01L23/00 ,  H01L25/065 ,  H01L23/48 ,  H01L23/544 ,  H01L23/31

CPC classification number: H01L21/76898 ,  H01L21/768 ,  H01L21/76841 ,  H01L23/3128 ,  H01L23/481 ,  H01L23/544 ,  H01L24/03 ,  H01L24/81 ,  H01L25/065 ,  H01L25/0657 ,  H01L2223/54426 ,  H01L2224/03462 ,  H01L2224/0401 ,  H01L2224/05 ,  H01L2224/05025 ,  H01L2224/05552 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/13 ,  H01L2224/13023 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/8185 ,  H01L2924/00014 ,  H01L2924/06 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/00

Abstract: A semiconductor chip including through silicon vias (TSVs), wherein the TSVs may be prevented from bending and the method of fabricating the semiconductor chip may be simplified, and a method of fabricating the semiconductor chip. The semiconductor chip includes a silicon substrate having a first surface and a second surface; a plurality of TSVs which penetrate the silicon substrate and protrude above the second surface of the silicon substrate; a polymer pattern layer which is formed on the second surface of the silicon substrate, surrounds side surfaces of the protruding portion of each of the TSVs, and comprises a flat first portion and a second portion protruding above the first portion; and a plated pad which is formed on the polymer pattern layer and covers a portion of each of the TSVs exposed from the polymer pattern layer.

公开(公告)号：US20150111346A1

公开(公告)日：2015-04-23

申请号：US14590036

申请日：2015-01-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin-ho Chun ,  Byung-Iyul PARK ,  Hyun-soo CHUNG ,  Gil-heyun CHOI ,  Son-kwan HWANG

IPC: H01L21/768 ,  H01L23/544 ,  H01L23/00

CPC classification number: H01L21/76898 ,  H01L21/768 ,  H01L21/76841 ,  H01L23/3128 ,  H01L23/481 ,  H01L23/544 ,  H01L24/03 ,  H01L24/81 ,  H01L25/065 ,  H01L25/0657 ,  H01L2223/54426 ,  H01L2224/03462 ,  H01L2224/0401 ,  H01L2224/05 ,  H01L2224/05025 ,  H01L2224/05552 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/13 ,  H01L2224/13023 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/8185 ,  H01L2924/00014 ,  H01L2924/06 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/00

Abstract: A semiconductor chip including through silicon vias (TSVs), wherein the TSVs may be prevented from bending and the method of fabricating the semiconductor chip may be simplified, and a method of fabricating the semiconductor chip. The semiconductor chip includes a silicon substrate having a first surface and a second surface; a plurality of TSVs which penetrate the silicon substrate and protrude above the second surface of the silicon substrate; a polymer pattern layer which is formed on the second surface of the silicon substrate, surrounds side surfaces of the protruding portion of each of the TSVs, and comprises a flat first portion and a second portion protruding above the first portion; and a plated pad which is formed on the polymer pattern layer and covers a portion of each of the TSVs exposed from the polymer pattern layer.

Abstract translation: 包括通过硅通孔（TSV）的半导体芯片，其中可以防止TSV弯曲，并且可以简化制造半导体芯片的方法，以及制造半导体芯片的方法。 半导体芯片包括具有第一表面和第二表面的硅衬底; 多个TSV，其穿透硅衬底并突出在硅衬底的第二表面上方; 形成在硅衬底的第二表面上的聚合物图案层围绕每个TSV的突出部分的侧表面，并且包括平坦的第一部分和在第一部分上方突出的第二部分; 以及形成在聚合物图案层上并覆盖从聚合物图案层露出的每个TSV的一部分的电镀垫。