METHOD OF MANUFACTURING SEMICONDUCTOR PACKAGE

    公开(公告)号:US20230096678A1

    公开(公告)日:2023-03-30

    申请号:US17850714

    申请日:2022-06-27

    Abstract: A method of manufacturing a semiconductor package, includes forming a mask layer on a wafer, the wafer including a semiconductor substrate and an insulating layer; forming a groove in the semiconductor substrate by performing a first laser grooving process; expanding an opening of the mask layer opened by the first laser grooving process by performing a second laser grooving process; exposing a portion of the insulating layer by removing a portion of the mask layer; and cutting the semiconductor substrate while removing the portion of the insulating layer exposed during the exposing by performing a dicing process.

Patent Agency Ranking