公开(公告)号：US11429425B2

公开(公告)日：2022-08-30

申请号：US16464940

申请日：2017-12-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hak-Young Kim

IPC: G06F9/48 ,  G06F3/14

Abstract: The present invention relates to an electronic device and a control method thereof, wherein the electronic device is disposed in a transportation means, and can transmit, to a terminal apparatus connected thereto, screens which are respectively provided by multiple operating systems installed in the electronic device. The electronic device comprises: a communication unit for communicating with a terminal apparatus; a memory for storing multiple operating systems; and a processor for, when a user command is received from the terminal apparatus, controlling the communication unit to transmit a screen which is provided by an operating system selected according to the user command among the multiple operating systems, to the terminal apparatus.

公开(公告)号：US20180358209A1

公开(公告)日：2018-12-13

申请号：US15816882

申请日：2017-11-17

Applicant: Samsung Electronics Co, Ltd.

Inventor： Jun-Soo Lee ,  Hak-Young Kim ,  Chung-Won Seo ,  Tae-Hyoung Im

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  H01J37/321 ,  H01J2237/334

Abstract: A plasma processing apparatus includes a process chamber including an inner space; an electrostatic chuck on which a substrate is loaded in the process chamber; a side-gas injection unit that is installed above the electrostatic chuck and includes at least one gas nozzle having an inclined gas flow path that is inclined with respect to a nozzle axis to obliquely supply a process gas into the process chamber from a sidewall of the process chamber; a plasma generation unit configured to generate plasma from the process gas injected into the process chamber; and a controller configured to control the electrostatic chuck, the side-gas injection unit, and the plasma generation unit. The controller controls process parameters under a cyclic ramping condition in which a cycle of the process parameters is continuously increased or decreased.

公开(公告)号：US11037760B2

公开(公告)日：2021-06-15

申请号：US16226786

申请日：2018-12-20

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hak-Young Kim ,  Bi-Ah Shin ,  Bo-Ra Yoon ,  Jun-Ho Im

IPC: C23C16/00 ,  H01L21/306 ,  H01J37/32 ,  F28F3/04 ,  G01K1/143

Abstract: A temperature controller of a plasma processing apparatus, a temperature measurer for a plasma processing apparatus, and a plasma processing apparatus, the temperature controller including a movable cooling plate configured to selectively contact a dielectric window in a plasma chamber, the cooling plate having at least one cooling groove through which a cooling agent for cooling the dielectric window is flowable; at least one cooling port including a cooling passageway that is connected to the at least one cooling groove; and a resilient member configured to resiliently press the cooling port toward the cooling plate such that the cooling plate is relatively movable with respect to the dielectric window.

公开(公告)号：US10276349B2

公开(公告)日：2019-04-30

申请号：US14699443

申请日：2015-04-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hak-Young Kim ,  Ji-Myoung Lee ,  Ji-Hee Kim ,  Doug-Yong Sung ,  Kyeong-Seok Jeong ,  Seong-Chul Choi

IPC: H01J37/32

Abstract: A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma processing is performed and an antenna generating a magnetic field, and a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna, wherein the plate includes first and second regions supplied with the fluid, and the fluid supply unit independently controls the first and second regions.

公开(公告)号：US20160104604A1

公开(公告)日：2016-04-14

申请号：US14699443

申请日：2015-04-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hak-Young Kim ,  Ji-Myoung Lee ,  Ji-Hee Kim ,  Doug-Yong Sung ,  Kyeong-Seok Jeong ,  Seong-Chul Choi

IPC: H01J37/32

CPC classification number: H01J37/32119 ,  H01J37/321 ,  H01J37/32522 ,  H01J37/3299

Abstract: A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma processing is performed and an antenna generating a magnetic field, and a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna, wherein the plate includes first and second regions supplied with the fluid, and the fluid supply unit independently controls the first and second regions.

Abstract translation: 提供等离子体处理装置。 等离子体处理装置包括形成在覆盖进行等离子体处理的室的顶部的窗口和产生磁场的天线之间的板和供应用于控制窗口和天线的温度的流体的流体供应单元，其中 板包括被供应流体的第一和第二区域，并且流体供应单元独立地控制第一和第二区域。