-
公开(公告)号:US20170331493A1
公开(公告)日:2017-11-16
申请号:US15488789
申请日:2017-04-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hye-Seung YU , Sukyong KANG , Wonjoo YUN , Hyunui LEE , Jae-Hun JUNG
CPC classification number: H03M13/098 , G06F11/1048 , G06F11/1068 , G11C29/52 , H03M13/611
Abstract: A memory device including a parity check circuit and a mask circuit may be provided. The parity check circuit may perform parity check on data sampled according to a data strobe signal, which does not include a post-amble. The mask circuit may generate a parity error signal based on results of the parity check, and output the parity error signal during a time period determined according to a burst length of the data.
-
公开(公告)号:US20190165808A1
公开(公告)日:2019-05-30
申请号:US16262127
申请日:2019-01-30
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hye-Seung YU , Sukyong KANG , Wonjoo YUN , Hyunui LEE , Jae-Hun JUNG
Abstract: A memory device including a parity check circuit and a mask circuit may be provided. The parity check circuit may perform parity check on data sampled according to a data strobe signal, which does not include a post-amble. The mask circuit may generate a parity error signal based on results of the parity check, and output the parity error signal during a time period determined according to a burst length of the data.
-
3.
公开(公告)号:US20170345754A1
公开(公告)日:2017-11-30
申请号:US15396633
申请日:2016-12-31
Applicant: Samsung Electronics Co., Ltd.
Inventor: Won-Joo YUN , Suk-Yong KANG , Sang-Hoon SHIN , Hye-Seung YU , Hyun-Ui LEE , Jae-Hun JUNG
IPC: H01L23/522 , H01L23/525 , H01L25/065 , H02J50/12 , H01L23/528 , H01L23/48
CPC classification number: H01L23/5227 , H01F27/2804 , H01F38/14 , H01F2027/2809 , H01F2038/143 , H01L23/481 , H01L23/5256 , H01L23/528 , H01L25/0657 , H01L2225/06524 , H01L2225/06541 , H02J50/12 , H04B5/0037 , H04B5/0075 , H05K1/0306 , H05K1/165 , H05K3/4629 , H05K2201/09709 , H05K2201/09845 , H05K2201/10098 , H05K2201/10159 , H05K2201/10181
Abstract: A three-dimensional (3D) inductor structure comprising: a first semiconductor die including: a first conductive pattern; and a second conductive pattern spaced apart from the first conductive pattern; a second semiconductor die stacked on the first semiconductor die, the second semiconductor die including: a third conductive pattern; a fourth conductive pattern spaced apart from the third conductive pattern; a first through-substrate via (TSV) penetrating the second semiconductor die and electrically connecting the first conductive pattern with the third conductive pattern; and a second TSV penetrating the second semiconductor die and electrically connecting the second conductive pattern with the fourth conductive pattern, and a first conductive connection pattern included in the first semiconductor die and electrically connecting a first end of the first conductive pattern with a first end of the second conductive pattern, or included in the second semiconductor die and electrically connecting a first end of the third conductive pattern with a first end of the fourth conductive pattern.
-
-