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公开(公告)号：US20230030545A1
公开(公告)日：2023-02-02
申请号：US17845041
申请日：2022-06-21
Applicant: Samsung Electronics Co., Ltd.
Inventor： Kyunghyun KIM , Poonggi JUNG , Seonjung KIM , Hakju KIM , Jiwoon LIM , Jongmun CHOI , Hyunsuk CHOI
Abstract: An electronic device, rear plate, and method of forming the rear plate are disclosed. The electronic device includes a housing including a front plate, the rear plate facing an opposite direction to the front plate, and a side structure surrounding a space formed between the front plate and the rear plate, and a display. The rear plate includes a glass plate and decorative member, the decorative member including a first base plate, a second base plate, a first molding pattern disposed on the first base plate and including a 3-dimensional pattern, a first adhesive layer between the first molding pattern layer and the second base plate, wherein an index of refraction of the first adhesive layer is different from an index of refraction of the first molding pattern, and a shielding printing layer.
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公开(公告)号：US20230031125A1
公开(公告)日：2023-02-02
申请号：US17709837
申请日：2022-03-31
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jongmun CHOI , Kyunghyun KIM , Hyunsuk CHOI
Abstract: An electronic device and ornamental member for the same are disclosed herein. The electronic devices includes a housing, a front plate disposed on one surface of the housing, and a rear plate disposed on a rear surface of the housing, wherein one of the plates includes the ornamental member, which includes: a base film attached to one surface of a transparent plate and configured to at least partially transmit light, an ultra-violet (UV) molding layer formed on a surface of the base film, and a plurality of refractive layers sequentially stacked on a surface of the UV molding layer, wherein at least one of the plurality of refractive layers is formed to have a different refractive index and a different surface area from a remainder of the refractive layers.
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公开(公告)号：US20170125254A1
公开(公告)日：2017-05-04
申请号：US15242190
申请日：2016-08-19
Applicant: Samsung Electronics Co., Ltd.
Inventor： Kwangsu Kim , Byoung Jae PARK , Yongsun KO , Kyunghyun KIM , ChangSup MUN , Kijong PARK
IPC: H01L21/3065 , H01L21/3213 , H01L21/02 , H01L21/311
CPC classification number: H01L21/3065 , H01L21/02057 , H01L21/31116 , H01L21/32136 , H01L21/32137
Abstract: The inventive concepts provide a method of completely removing a damage region of a surface of an etch target layer after plasma-etching the etch target layer. The method includes performing a first post-etch plasma treatment process using a first post-treatment gas on the plasma-etched etch target layer. A polarity of ions of the first post-treatment gas may be the same as a polarity of bias power applied to a stage in a plasma apparatus.
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公开(公告)号：US20250014871A1
公开(公告)日：2025-01-09
申请号：US18406898
申请日：2024-01-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sungwon CHO , Kyunghyun KIM , Ingi KIM , Sangki NAM , Dougyong SUNG , Sejin OH , Sungho JANG
IPC: H01J37/32 , H01L21/683
Abstract: According to an aspect of the present inventive concepts, a semiconductor processing apparatus includes: a chamber; an electrostatic chuck in an internal space of the chamber; a plurality of grid electrodes installed on the electrostatic chuck so as to be separated from each other in a first direction, perpendicular to an upper surface of the electrostatic chuck, and respectively having a plurality of through-holes; a plurality of reflectors between the plurality of grid electrodes and the electrostatic chuck and reflecting ions passing through the plurality of through-holes in each of the plurality of grid electrodes; and a voltage supply unit outputting a bias voltage having a predetermined cycle to at least one of the plurality of grid electrodes, wherein each of the plurality of grid electrodes includes a base plate containing a conductive material, and a cover layer covering a surface of the base plate and containing a metal oxide.
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