Method of fabricating semiconductor light emitting device

    公开(公告)号:US10304990B2

    公开(公告)日:2019-05-28

    申请号:US15341259

    申请日:2016-11-02

    Abstract: A method of fabricating a semiconductor light emitting device includes forming a first conductivity type semiconductor layer, forming an active layer by alternately forming a plurality of quantum well layers and a plurality of quantum barrier layers on the first conductivity type semiconductor layer, and forming a second conductivity type semiconductor layer on the active layer. The plurality of quantum barrier layers include at least one first quantum barrier layer adjacent to the first conductivity type semiconductor layer and at least one second quantum barrier layer adjacent to the second conductivity type semiconductor layer. The forming of the active layer includes allowing the at least one first quantum barrier layer to be grown at a first temperature and allowing the at least one second quantum barrier layer to be grown at a second temperature lower than the first temperature.

    Training method for detecting vanishing point and method and apparatus for detecting vanishing point

    公开(公告)号:US11348263B2

    公开(公告)日:2022-05-31

    申请号:US16509033

    申请日:2019-07-11

    Inventor: Sang Jun Lee

    Abstract: Provided is a method and apparatus for detecting a vanishing point in a driving image of a vehicle. The method includes: receiving the driving image; generating a probability map, comprising probability information about a position of the vanishing point in the driving image, from the driving image; detecting a vanishing point on the driving image by applying smoothing regression, which softens a boundary region of the vanishing point, to the probability map; and processing a task for driving the vehicle by converting an orientation of the driving image based on the vanishing point.

    Method of fabricating semiconductor light emitting device
    5.
    发明授权
    Method of fabricating semiconductor light emitting device 有权
    制造半导体发光器件的方法

    公开(公告)号:US09502605B2

    公开(公告)日:2016-11-22

    申请号:US14714223

    申请日:2015-05-15

    Abstract: A method of fabricating a semiconductor light emitting device includes forming a first conductivity type semiconductor layer, forming an active layer by alternately forming a plurality of quantum well layers and a plurality of quantum barrier layers on the first conductivity type semiconductor layer, and forming a second conductivity type semiconductor layer on the active layer. The plurality of quantum barrier layers include at least one first quantum barrier layer adjacent to the first conductivity type semiconductor layer and at least one second quantum barrier layer adjacent to the second conductivity type semiconductor layer. The forming of the active layer includes allowing the at least one first quantum barrier layer to be grown at a first temperature and allowing the at least one second quantum barrier layer to be grown at a second temperature lower than the first temperature.

    Abstract translation: 一种制造半导体发光器件的方法包括:形成第一导电型半导体层,通过在第一导电型半导体层上交替地形成多个量子阱层和多个量子势垒层来形成有源层,并形成第二导电型半导体层 导电型半导体层。 多个量子势垒层包括与第一导电类型半导体层相邻的至少一个第一量子势垒层和与第二导电类型半导体层相邻的至少一个第二量子势垒层。 活性层的形成包括允许至少一个第一量子势垒层在第一温度下生长并允许至少一个第二量子势垒层在低于第一温度的第二温度下生长。

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