SEMICONDUCTOR DEVICE
    1.
    发明申请

    公开(公告)号:US20220069011A1

    公开(公告)日:2022-03-03

    申请号:US17209660

    申请日:2021-03-23

    IPC分类号: H01L27/24 H01L45/00

    摘要: A semiconductor device includes a semiconductor substrate, a peripheral device on the semiconductor substrate, a lower insulating structure on the semiconductor substrate and covering the peripheral device, a first conductive line on the lower insulating structure, a memory cell structure on the first conductive line, and a second conductive line on the memory cell structure. The memory cell structure may include an information storage material pattern and a selector material pattern on the lower insulating structure in a vertical direction. The selector material pattern may include a first selector material layer including a first material and a second selector material layer including a second material. The second selector material layer may have a threshold voltage drift higher than that of the first material. The second selector material layer may have a second width narrower than a first width of the first selector material layer.