IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20190305049A1

    公开(公告)日:2019-10-03

    申请号:US16105259

    申请日:2018-08-20

    摘要: Provided are an image sensor and a method of manufacturing the same. The image sensor may include a plurality of light detection elements arranged to correspond to a plurality of pixel regions, a color filter layer on the plurality of light detection elements and including a plurality of color filters arranged to correspond to the plurality of light detection elements, and a photodiode device portion on the color filter layer. The photodiode device portion may have curved structures. The photodiode device portion may include an organic material-based photodiode layer, a first electrode between the photodiode layer and the color filter layer, and a second electrode on the photodiode layer. The photodiode device portion may have curved convex structures respectively corresponding to the plurality of color filters.

    RESISTIVE MEMORY DEVICE
    5.
    发明申请

    公开(公告)号:US20220406844A1

    公开(公告)日:2022-12-22

    申请号:US17568866

    申请日:2022-01-05

    IPC分类号: H01L27/24 H01L45/00

    摘要: A resistive memory device including a resistive memory pattern; and a selection element pattern electrically connected to the resistive memory pattern, the selection element pattern including a chalcogenide switching material and at least one metallic material, the chalcogenide switching material including germanium, arsenic, and selenium, and the at least one metallic material including aluminum, strontium, or indium, wherein the selection element pattern includes an inhomogeneous material layer in which content of the at least one metallic material in the selection element pattern is variable according to a position within the selection element pattern.