摘要:
The present invention relates to a polyolefin composition for an interior sheet/film. The polyolefin composition of the present invention for an interior sheet comprises 70 to 99 wt % of polyolefin and 1 to 30 wt % of modified polyethylene terephthalate having a melting point of 130 to 180° C. The polyolefin composition of the present invention is environmentally friendly and has good physical properties such as workability, printing characteristics, and adhesiveness. In addition, sheets having various thicknesses can be produced by extrusion without having to stretch the sheets, and thus the sheets can be used separately or in combination in various application fields.
摘要:
Provided herein is a method of manufacturing a polyolefin sheet using a circulating belt and a first roller, comprising the steps of: heating polyolefin resin to melt polyolefin; and forming the molten polyolefin into a polyolefin sheet using an extruding die, wherein the circulating belt includes a plurality of second rollers (cooling rollers) which come into contact with an inner side of the circulating belt and are arranged in a circle around the circulating belt running in a circle and which cool the rotating circulating belt; a temperature of the circulating belt is maintained at 0˜30 to cool the polyolefin sheet such that the polyolefin sheet has desired thickness, a temperature of the first roller is set to a specific temperature between 40 and 120, and the temperature of the first roller is maintained in a temperature range of the specific temperature ±5; and a linear speed of the molten polyolefin sheet is substantially equal to a rotation speed of the circulating belt or the first roller to obtain a polyolefin sheet having a thickness of 0.05˜0.45 mm and a width of 1100˜1700 mm The method is advantageous in that a wide-width polyolefin sheet having excellent flatness and a small thickness deviation can be manufactured.
摘要:
A vane pump may include an oval fixed portion of which an outer circumference may be oval, a rotation ring that may be rotatably disposed outside of the oval fixed portion with a gap and in which blade slots may be formed in a predetermined depth along a circular interior circumference of the rotation ring at a predetermined interval from each other, blades of which one end thereof may be slidably inserted into the blade slots respectively and of which the other end slidably contacts an outer surface of the oval fixed portion, an elastic member coupled to the rotation ring and elastically pushing the blades towards the oval fixed portion, and a drive portion connected to the rotation ring and rotating the rotation ring such that oil may be sucked through an expanding space that may be formed between at least two of the blades and oil may be pumped through a shrinking space that may be formed between at least two of the blades.
摘要:
The present invention relates to a polishing composition comprising 30 to 99 wt % of deionized water, 0.1 to 50 wt % of powder of metallic oxide and 0.01 to 20 wt % of cyclic amine. This polishing composition can be used in a chemical mechanical polishing of thin films in integrated circuit manufacturing and has an effect of minimizing the occurrence of microscratches on the thin film after polishing. Thereby it can be applied to the manufacturing process of highly integrated circuits such as Shallow Trench Isolation.
摘要:
Disclosed is a process for preparing metal oxide slurries suitable for the chemical mechanical polishing (CMP) of semiconductor devices. A suspension of metal oxide in water is dispersed at a predetermined pressure through an orifice of a dispersion chamber while two intensifier pumps are used to maintain the pressure applied to the dispersion chamber constantly, resulting in restraining or minimizing the generation of macro particles as large as or larger than 1 &mgr;m. The metal oxide slurries are uniform in particle size with narrow particle size distribution and show excellent polishing performance with a significant reduction in the occurrence frequency of microscratches, so that they are suitable for CMP of ultra-integrated semiconductor devices.
摘要:
A vane pump may include an oval fixed portion of which an outer circumference may be oval, a rotation ring that may be rotatably disposed outside of the oval fixed portion with a gap and in which blade slots may be formed in a predetermined depth along a circular interior circumference of the rotation ring at a predetermined interval from each other, blades of which one end thereof may be slidably inserted into the blade slots respectively and of which the other end slidably contacts an outer surface of the oval fixed portion, an elastic member coupled to the rotation ring and elastically pushing the blades towards the oval fixed portion, and a drive portion connected to the rotation ring and rotating the rotation ring such that oil may be sucked through an expanding space that may be formed between at least two of the blades and oil may be pumped through a shrinking space that may be formed between at least two of the blades.
摘要:
Disclosed is an apparatus (1) for preventing generation of bilge water in a ship. The apparatus includes a cover (7) configured to receive fluid therein, a rotating unit (3) coupled to a shaft (91) so as to be rotated along with the shaft penetrated through the rotating unit, the rotating unit including a first coupler (31). The apparatus further includes a first sealing unit (4) located inside the cover and interposed between one side of the first coupler and one side of the cover, and a sealing piece (6) interposed in a contact interface between the rotating unit and the shaft. The apparatus completely prevents seawater from being introduced into an engine room, therby preventing generation of bilge water and achieving an extended lifespan thereof without damage.
摘要:
There is disclosed a process for preparing a metal oxide CMP slurry suitable for semiconductor devices, wherein a mixture comprising 1 to 50 weight % of a metal oxide and 50 to 99 weight % of water is mixed in a pre-mixing tank, transferred to a dispersion chamber with the aid of a transfer pump, allowed to have a flow rate of not less than 100 m/sec by pressurization with a high pressure pump, and subjected to counter collision for dispersion through two orifices in the dispersion chamber. The slurry has particles which are narrow in particle size distribution, showing an ultrafine size ranging from 30 to 500 nm. Also, the slurry is not polluted at all during its preparation and shows no tailing phenomena, so that it is preventive of &mgr;-scratching. Therefore, it can be used in the planarization for shallow trench isolation, interlayer dielectrics and inter metal dielectrics through a CMP process.
摘要:
Disclosed is a polishing composition which comprises an Al2O3/SiO2 composite-based metal oxide powder, deionized water and an additive, said metal oxide powder comprising an Al2O3/SiO2 composite as an essential component. The polishing composition is superior in removal rate and free of causing microscratches after polishing and thus, suitable for use in the global planarization of device wafer surfaces.
摘要翻译:公开了一种抛光组合物,其包含Al 2 O 3 / SiO 2复合基金属氧化物粉末,去离子水和添加剂,所述金属氧化物粉末包含Al 2 O 3 / SiO 2复合材料作为必要组分。 抛光组合物在去除速度上优异,并且在抛光后不会引起微细化,因此适用于器件晶片表面的全局平面化。