摘要:
According to example embodiments, a nonvolatile memory device includes a first and a second NAND string. The first NAND string includes a first string selection transistor, a first local ground and a first global ground selection transistor, and first memory cells stacked in a direction perpendicular to a substrate. The second NAND string includes a second string selection transistor, a second local ground and a second global ground selection transistor, and second memory cells stacked in the direction perpendicular to the substrate. The device includes a selection line driver including path transistors configured to select and provide at least one operation voltage to the first and second string selection transistors, the first and second local and global ground selection transistors. The first and second string selection transistors are electrically isolated from each other, and the first and second global ground selection transistors are electrically connected.
摘要:
Disclosed is a method for programming a nonvolatile memory device, which includes memory cells arranged in a plurality of rows. The programming method includes alternately selecting word lines to program data at a first page portion and a second page portion associated with the memory cells. After the first and second page portions are programmed, the method includes programming data at a third page portion associated with the memory cells according to an order in which word lines are arranged. The word lines may be sequentially selected one by one from a word line adjacent to a ground selection line.
摘要:
A semiconductor device includes a semiconductor pattern on a semiconductor substrate, a three-dimensional memory array on the semiconductor pattern, and a peripheral interconnection structure between the semiconductor pattern and the semiconductor substrate. The peripheral interconnection structure includes an upper interconnection structure on a lower interconnection structure. The upper interconnection structure includes an upper interconnection and an upper barrier layer. The lower interconnection structure includes a lower interconnection and a lower barrier layer. The upper barrier layer is under a bottom surface of the upper interconnection and does not cover side surfaces of the upper interconnection. The lower barrier layer is under a bottom surface of the lower interconnection and covers side surfaces of the lower interconnection.
摘要:
A scroll compressor is provided, in which at least one bypass hole that bypass a portion of a refrigerant before the refrigerant is discharged through a discharge hole is formed at a position where a bypass section that bypasses the refrigerant through the at least one bypass hole overlaps a discharge section that discharges the refrigerant through the discharge hole. The at least one bypass hole is formed at a position where a wrap volume ratio (Vs/Vd), which is a ratio of a suction volume (Vs) with respect to a discharge volume (Vd) in a compression chamber, is within the range of about 1.8˜2.2. With this configuration, over-compression of refrigerant may be prevented in a low speed driving mode, and efficiency of the compressor may be enhanced in the low speed driving mode and under a low load condition.