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104 条记录 (耗时 0.049 秒)

    Voltage measurement method using electron beam
    1.
    发明授权
    Voltage measurement method using electron beam 失效
    使用电子束的电压测量方法

    公开(公告)号：US5093616A

    公开(公告)日：1992-03-03

    申请号：US580532

    申请日：1990-09-11

    申请人： Shigemitsu Seitoh ,  Hideo Todokoro ,  Satoru Fukuhara ,  Hiroyuki Shinada

    发明人： Shigemitsu Seitoh ,  Hideo Todokoro ,  Satoru Fukuhara ,  Hiroyuki Shinada

    IPC分类号： H01J37/28 ,  G01R31/305

    CPC分类号： G01R31/305

    摘要： An electron beam is irradiated on a sample to generate secondary electrons from the sample, the secondary electrons are detected by a secondary electron detector through a retarding grid to provide a secondary electron detector output signal, the relation is acquired in advance between a known sample voltage and a value (normalized secondary electron signal for the known sample voltage) resulting from dividing a differential value of the secondary electron detector output signal at a retarding grid voltage by the secondary electron detector output signal, and this relation is retrieved with a normalized secondary electron signal obtained with an unknown sample voltage to determine an absolute value of the unknown sample voltage.

    摘要翻译： 电子束被照射在样品上以从样品产生二次电子，二次电子通过延迟栅格由二次电子检测器检测，以提供二次电子检测器输出信号，该关系在已知的采样电压 以及通过二次电子检测器输出信号将延迟电网电压的二次电子检测器输出信号的微分值除以由二次电子检测器输出信号分离得到的值（已知样品电压的归一化二次电子信号），并且用归一化二次电子 用未知样品电压获得的信号，以确定未知样品电压的绝对值。

    Magnetic field measurement optimization apparatus using a charged particle beam
    2.
    发明授权
    Magnetic field measurement optimization apparatus using a charged particle beam 失效
    使用带电粒子束的磁场测量优化装置

    公开(公告)号：US5111141A

    公开(公告)日：1992-05-05

    申请号：US607351

    申请日：1990-10-31

    申请人： Satoru Fukuhara ,  Hiroyuki Shinada ,  Shigemitsu Seitoh

    发明人： Satoru Fukuhara ,  Hiroyuki Shinada ,  Shigemitsu Seitoh

    IPC分类号： G01R33/028 ,  G01R31/305 ,  G01R33/02 ,  G01R33/10

    CPC分类号： G01R31/305 ,  G01R33/0213

    摘要： A magnetic field measuring apparatus measures the magnetic field intensity of a magnetic field created by a sample magnetic head by passing a finely focussed charged particle beam through the magnetic field and by measuring the deflection of the charged particle beam caused by the deflecting action of the magnetic field on the charged particle beam. The path of the charged particle beam (the sample magnetic head) is shifted stepwise toward the sample magnetic head (the path of the charged particle beam) until the charged particle impinges on the surface of the sample magnetic head. Upon the detection of the impingement of the charged particle beam on the surface of the sample magnetic head, the path of the charged particle beam (the sample magnetic head) is put one step back so that the path of the charged particle beam extends as close as possible to the surface of the sample magnetic head for accurate magnetic field intensity measurements. Thus, the distribution of magnetic field intensity in the magnetic field can be accurately determined.

    摘要翻译： 磁场测量装置通过使精细聚焦的带电粒子束通过磁场并通过测量由磁性的偏转作用引起的带电粒子束的偏转来测量由样本磁头产生的磁场的磁场强度 场上的带电粒子束。 带电粒子束（样品磁头）的路径朝向样品磁头（带电粒子束的路径）逐步移动，直到带电粒子撞击在样品磁头的表面上。 当检测到带电粒子束在样品磁头的表面上的撞击时，将带电粒子束（样品磁头）的路径退后一步，使得带电粒子束的路径尽可能地延伸 尽可能对样品磁头的表面进行精确的磁场强度测量。 因此，可以精确地确定磁场中磁场强度的分布。

    Potential measurement device
    3.
    发明授权
    Potential measurement device 失效
    电位测量装置

    公开(公告)号：US4922097A

    公开(公告)日：1990-05-01

    申请号：US232655

    申请日：1988-08-16

    申请人： Hideo Todokoro ,  Hiroyuki Shinada ,  Shigemitsu Seitoh

    发明人： Hideo Todokoro ,  Hiroyuki Shinada ,  Shigemitsu Seitoh

    IPC分类号： H01L21/26 ,  G01R31/305 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01L21/263

    CPC分类号： H01J37/1471 ,  G01R31/305 ,  H01J37/268 ,  H01J2237/2594

    摘要： A potential measurement device including an irradiator for irradiating a sample with an electron beam; an extracting electrode disposed above the sample and extracting secondary electrons emitted from the part irradiated with the electron beam; a hemi-spherical grid analyzing the energy of the extracted secondary electrons; a lens disposed between the hemispherical grid and the sample and focusing both the electron beam and the secondary electrons; and a deflector disposed on the grid side with respect to the lens and producing electric and magnetic fields crossing perpendicularly to each other, which don't deflect the electron beam, but deflect only the secondary electrons.

    摘要翻译： 一种电位测量装置，包括用电子束照射样品的照射器; 提取电极，设置在样品上方并提取从电子束照射的部分发射的二次电子; 分析提取的二次电子的能量的半球形栅格; 设置在半球形栅格和样品之间并且聚焦电子束和二次电子的透镜; 以及偏转器，其相对于所述透镜设置在所述栅极侧，并且产生不偏转所述电子束但仅偏转所述二次电子的彼此垂直交叉的电场和磁场。