Semiconductor device and its manufacturing method
    2.
    发明授权
    Semiconductor device and its manufacturing method 失效
    半导体器件及其制造方法

    公开(公告)号:US08179739B2

    公开(公告)日:2012-05-15

    申请号:US12672685

    申请日:2007-08-10

    IPC分类号: G11C8/00

    摘要: A technique capable of manufacturing a semiconductor device without posing contamination in a manufacturing apparatus regarding a phase change memory including a memory cell array formed of memory cells using a storage element (RE) by a variable resistor and a select transistor (CT). A buffer cell is arranged between a sense amplifier (SA) and a memory cell array (MCA) and between a word driver (WDB) and the memory cell array. The buffer cell is formed of the resistive storage element (RE) and the select transistor (CT) same as those of the memory cell. The resistive storage element in the memory cell is connected to a bit-line via a contact formed above the resistive storage element. Meanwhile, in the buffer cell, the contact is not formed above the resistive storage element, and a state of being covered with an insulator is kept upon processing the contact in the memory cell. By such a processing method, exposure and sublimation of a chalcogenide film used in the resistive storage element can be avoided.

    摘要翻译: 一种能够制造半导体器件的技术,而不会在涉及包括由可变电阻器和选择晶体管(CT)使用存储元件(RE)的存储器单元形成的存储单元阵列的相变存储器的制造设备中产生污染。 缓冲单元布置在读出放大器(SA)和存储单元阵列(MCA)之间以及字驱动器(WDB)和存储单元阵列之间。 缓冲单元由与存储单元相同的电阻存储元件(RE)和选择晶体管(CT)形成。 存储单元中的电阻存储元件通过形成在电阻存储元件上方的触点连接到位线。 同时,在缓冲单元中,电阻性存储元件之上不形成接触,并且在处理存储单元中的接触时保持被绝缘体覆盖的状态。 通过这种处理方法,可以避免在电阻存储元件中使用的硫族化物膜的曝光和升华。

    SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
    3.
    发明申请
    SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD 失效
    半导体器件及其制造方法

    公开(公告)号:US20110211390A1

    公开(公告)日:2011-09-01

    申请号:US12672685

    申请日:2007-08-10

    IPC分类号: G11C11/00 H01L21/8239

    摘要: A technique capable of manufacturing a semiconductor device without posing contamination in a manufacturing apparatus regarding a phase change memory including a memory cell array formed of memory cells using a storage element (RE) by a variable resistor and a select transistor (CT). A buffer cell is arranged between a sense amplifier (SA) and a memory cell array (MCA) and between a word driver (WDB) and the memory cell array. The buffer cell is formed of the resistive storage element (RE) and the select transistor (CT) same as those of the memory cell. The resistive storage element in the memory cell is connected to a bit-line via a contact formed above the resistive storage element. Meanwhile, in the buffer cell, the contact is not formed above the resistive storage element, and a state of being covered with an insulator is kept upon processing the contact in the memory cell. By such a processing method, exposure and sublimation of a chalcogenide film used in the resistive storage element can be avoided.

    摘要翻译: 一种能够制造半导体器件的技术,而不会在涉及包括由可变电阻器和选择晶体管(CT)使用存储元件(RE)的存储器单元形成的存储单元阵列的相变存储器的制造设备中产生污染。 缓冲单元布置在读出放大器(SA)和存储单元阵列(MCA)之间以及字驱动器(WDB)和存储单元阵列之间。 缓冲单元由与存储单元相同的电阻存储元件(RE)和选择晶体管(CT)形成。 存储单元中的电阻存储元件通过形成在电阻存储元件上方的触点连接到位线。 同时,在缓冲单元中,电阻性存储元件之上不形成接触,并且在处理存储单元中的接触时保持被绝缘体覆盖的状态。 通过这种处理方法,可以避免在电阻存储元件中使用的硫族化物膜的曝光和升华。

    Semiconductor storage device
    4.
    发明授权
    Semiconductor storage device 失效
    半导体存储设备

    公开(公告)号:US07864568B2

    公开(公告)日:2011-01-04

    申请号:US12516690

    申请日:2006-12-07

    IPC分类号: G11C11/00

    摘要: In a semiconductor storage device such as a phase change memory, a technique which can realize high integration is provided. The semiconductor storage device includes a phase change thin film 101 having two stable phases of a crystal state with low electric resistance and an amorphous state with high electric resistance, upper plug electrodes 102 and 103 provided on one side of the phase change thin film 101, a lower electrode 104 provided on the other side of the phase change thin film 101, a selecting transistor 114 whose drain/source terminals are connected to the upper plug electrode 102 and the lower electrode 104, and a selecting transistor 115 whose drain/source terminals are connected to the upper plug electrode 103 and the lower electrode 104, and a first memory cell is configured with the selecting transistor 114 and a phase change region 111 in the phase change thin film 101 sandwiched between the upper plug electrode 102 and the lower electrode 104, and a second memory cell is configured with the selecting transistor 115 and a phase change region 112 in the phase change thin film 101 sandwiched between the upper plug electrode 103 and the lower electrode 104.

    摘要翻译: 在诸如相变存储器的半导体存储装置中,提供了可以实现高集成度的技术。 半导体存储装置包括:具有低电阻的晶体状态的两个稳定相和具有高电阻的非晶态的相变薄膜101,设置在相变薄膜101一侧的上部插塞电极102和103, 设置在相变薄膜101的另一侧的下部电极104,漏极/源极端子连接到上部插塞电极102和下部电极104的选择晶体管114,以及选择晶体管115,其漏极/源极端子 连接到上插头电极103和下电极104,并且第一存储单元配置有夹在上插头电极102和下电极之间的相变薄膜101中的选择晶体管114和相变区域111 104,并且第二存储单元配置有夹在b中的相变薄膜101中的选择晶体管115和相变区域112 在上塞电极103和下电极104之间。

    SEMICONDUCTOR DEVICE
    5.
    发明申请
    SEMICONDUCTOR DEVICE 失效
    半导体器件

    公开(公告)号:US20100072451A1

    公开(公告)日:2010-03-25

    申请号:US12373185

    申请日:2006-07-21

    IPC分类号: H01L45/00 H01L27/04

    摘要: A recording layer 52 made of a chalcogenide material which stores a high-resistance state of a high electrical resistance value and a low-resistance state of a low electrical resistance value is used as a memory element RM in a memory cell region, and it is formed so that a concentration of Ga or In of a first layer 52a positioned on a lower electrode TP side of the recording layer 52 is higher than the corresponding concentration of a second layer 52b positioned on an upper electrode 53 side. For example, the recording layer is formed so that a content of Ga or In of the second layer is 5 atomic % or more smaller than that of the first layer. Also, a circuit which can reverse the voltage polarity between the upper electrode and the lower electrode in a set operation and a reset operation is provided.

    摘要翻译: 作为存储单元区域中的存储元件RM,使用由存储高电阻值的高电阻状态和低电阻值的低电阻状态的硫族化物材料制成的记录层52, 使得位于记录层52的下电极TP侧的第一层52a中的Ga或In的浓度高于位于上电极53侧的第二层52b的相应浓度。 例如,记录层形成为使得第二层中的Ga或In的含量比第一层的含量低5原子%以上。 此外,提供了在设定操作和复位操作中可以反转上电极和下电极之间的电压极性的电路。

    SEMICONDUCTOR STORAGE DEVICE
    6.
    发明申请
    SEMICONDUCTOR STORAGE DEVICE 失效
    半导体存储设备

    公开(公告)号:US20100061132A1

    公开(公告)日:2010-03-11

    申请号:US12516690

    申请日:2006-12-07

    摘要: In a semiconductor storage device such as a phase change memory, a technique which can realize high integration is provided. The semiconductor storage device includes a phase change thin film 101 having two stable phases of a crystal state with low electric resistance and an amorphous state with high electric resistance, upper plug electrodes 102 and 103 provided on one side of the phase change thin film 101, a lower electrode 104 provided on the other side of the phase change thin film 101, a selecting transistor 114 whose drain/source terminals are connected to the upper plug electrode 102 and the lower electrode 104, and a selecting transistor 115 whose drain/source terminals are connected to the upper plug electrode 103 and the lower electrode 104, and a first memory cell is configured with the selecting transistor 114 and a phase change region 111 in the phase change thin film 101 sandwiched between the upper plug electrode 102 and the lower electrode 104, and a second memory cell is configured with the selecting transistor 115 and a phase change region 112 in the phase change thin film 101 sandwiched between the upper plug electrode 103 and the lower electrode 104.

    摘要翻译: 在诸如相变存储器的半导体存储装置中,提供了可以实现高集成度的技术。 半导体存储装置包括:具有低电阻的晶体状态的两个稳定相和具有高电阻的非晶态的相变薄膜101,设置在相变薄膜101一侧的上部插塞电极102和103, 设置在相变薄膜101的另一侧的下部电极104,漏极/源极端子连接到上部插塞电极102和下部电极104的选择晶体管114,以及选择晶体管115,其漏极/源极端子 连接到上插头电极103和下电极104,并且第一存储单元配置有夹在上插头电极102和下电极之间的相变薄膜101中的选择晶体管114和相变区域111 104,并且第二存储单元配置有夹在b中的相变薄膜101中的选择晶体管115和相变区域112 在上塞电极103和下电极104之间。

    Semiconductor device
    7.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号:US08319204B2

    公开(公告)日:2012-11-27

    申请号:US12373185

    申请日:2006-07-21

    IPC分类号: H01L45/00 H01L27/04

    摘要: A recording layer 52 made of a chalcogenide material which stores a high-resistance state of a high electrical resistance value and a low-resistance state of a low electrical resistance value is used as a memory element RM in a memory cell region, and it is formed so that a concentration of Ga or In of a first layer 52a positioned on a lower electrode TP side of the recording layer 52 is higher than the corresponding concentration of a second layer 52b positioned on an upper electrode 53 side. For example, the recording layer is formed so that a content of Ga or In of the second layer is 5 atomic % or more smaller than that of the first layer. Also, a circuit which can reverse the voltage polarity between the upper electrode and the lower electrode in a set operation and a reset operation is provided.

    摘要翻译: 作为存储单元区域中的存储元件RM,使用由存储高电阻值的高电阻状态和低电阻值的低电阻状态的硫族化物材料制成的记录层52, 使得位于记录层52的下电极TP侧的第一层52a中的Ga或In的浓度高于位于上电极53侧的第二层52b的相应浓度。 例如,记录层形成为使得第二层中的Ga或In的含量比第一层的含量低5原子%以上。 此外,提供了在设定操作和复位操作中可以反转上电极和下电极之间的电压极性的电路。

    Semiconductor device
    8.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US08132063B2

    公开(公告)日:2012-03-06

    申请号:US13191442

    申请日:2011-07-26

    IPC分类号: G11C29/00

    摘要: To realize a fast and highly reliable phase-change memory system of low power consumption, a semiconductor device includes: a memory device which includes a first memory array having a first area including a plurality of first memory cells and a second area including a plurality of second memory cells; a controller coupled to the memory device to issue a command to the memory device; and a condition table for storing a plurality of trial writing conditions. The controller performs trial writing in the plurality of second memory cells a plurality of times based on the plurality of trial writing conditions stored in the condition table, and determines writing conditions in the plurality of first memory cells based on a result of the trial writing. The memory device performs writing in the plurality of first memory cells based on the writing conditions instructed from the controller.

    摘要翻译: 为了实现低功耗的快速且高度可靠的相变存储器系统,半导体器件包括:存储器件,其包括具有包括多个第一存储器单元的第一区域的第一存储器阵列和包括多个第一存储器单元的第二区域 第二存储单元; 控制器,其耦合到所述存储器设备以向所述存储器设备发出命令; 以及用于存储多个试写条件的条件表。 控制器基于存储在条件表中的多个试写条件,在多个第二存储单元中执行多次尝试写入,并且基于试写的结果来确定多个第一存储单元中的写入条件。 存储器件基于从控制器指示的写入条件在多个第一存储器单元中执行写入。

    Semiconductor device
    9.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号:US07885102B2

    公开(公告)日:2011-02-08

    申请号:US12377271

    申请日:2006-09-15

    IPC分类号: G11C11/00

    摘要: In a memory array MCA which includes memory cells MC each having a variable-resistance-based memory device RQ and a select transistor MQ, an object is to receive a fixed quantity of storage data for a short time, and to realize writing operation to the memory cell, with suppressed peak current. In order to achieve the object, the data bus occupation time in rewriting operation is shortened by using plural sense amplifiers and storing storage data temporarily, and plural programming circuits are provided and activated using the control signals with different phases. By the above, the phase change memory system with low current consumption can be realized, without causing degradation of the utilization ratio of the data bus.

    摘要翻译: 在包括具有可变电阻的存储器件RQ和选择晶体管MQ的存储单元MC的存储器阵列MCA中,目的是在短时间内接收固定量的存储数据,并且实现对 存储单元,具有抑制的峰值电流。 为了实现该目的,通过使用多个读出放大器和临时存储存储数据来缩短重写操作中的数据总线占用时间,并且使用具有不同相位的控制信号来提供和激活多个编程电路。 通过上述,可以实现具有低电流消耗的相变存储器系统,而不会降低数据总线的利用率。

    Semiconductor integrated circuit device
    10.
    发明授权
    Semiconductor integrated circuit device 失效
    半导体集成电路器件

    公开(公告)号:US07619911B2

    公开(公告)日:2009-11-17

    申请号:US10579911

    申请日:2003-11-21

    IPC分类号: G11C15/00

    CPC分类号: G11C15/04 G11C15/043

    摘要: In a memory array structured of memory cells using a storage circuit STC and a comparator CP, either one electrode of a source electrode or a drain electrode of a transistor, whose gate electrode is connected to a search line, of a plurality of transistors structuring the comparator CP is connected to a match line HMLr precharged to a high voltage. Further, a match detector MDr is arranged on a match line LMLr precharged to a low voltage to discriminate a comparison signal voltage generated at the match line according to the comparison result of data. According to such memory array structure and operation, comparison operation can be performed at low power and at high speed while influence of search-line noise is avoided in a match line pair. Therefore, a low power content addressable memory which allows search operation at high speed can be realized.

    摘要翻译: 在使用存储电路STC和比较器CP的存储器单元构成的存储器阵列中,将栅电极连接到搜索线的晶体管的源电极或漏电极的一个电极,构成 比较器CP连接到预充电到高电压的匹配线HMLr。 此外,匹配检测器MDr布置在预充电到低电压的匹配线LMLr上,以根据数据的比较结果来识别在匹配线处产生的比较信号电压。 根据这种存储器阵列结构和操作,可以在低功率和高速度下执行比较操作,同时在匹配线对中避免搜索线噪声的影响。 因此,可以实现允许高速搜索操作的低功率内容可寻址存储器。