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    SEMICONDUCTOR DEVICE
    1.
    发明申请
    SEMICONDUCTOR DEVICE 失效
    半导体器件

    公开(公告)号：US20100072451A1

    公开(公告)日：2010-03-25

    申请号：US12373185

    申请日：2006-07-21

    申请人： Motoyasu Terao ,  Satoru Hanzawa ,  Takahiro Morikawa ,  Kenzo Kurotsuchi ,  Riichiro Takemura ,  Norikatsu Takaura ,  Nozomu Matsuzaki

    发明人： Motoyasu Terao ,  Satoru Hanzawa ,  Takahiro Morikawa ,  Kenzo Kurotsuchi ,  Riichiro Takemura ,  Norikatsu Takaura ,  Nozomu Matsuzaki

    IPC分类号： H01L45/00 ,  H01L27/04

    CPC分类号： G11C13/0004 ,  G11C2213/79 ,  H01L27/2436 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/144 ,  H01L45/1625 ,  H01L45/1675

    摘要： A recording layer 52 made of a chalcogenide material which stores a high-resistance state of a high electrical resistance value and a low-resistance state of a low electrical resistance value is used as a memory element RM in a memory cell region, and it is formed so that a concentration of Ga or In of a first layer 52a positioned on a lower electrode TP side of the recording layer 52 is higher than the corresponding concentration of a second layer 52b positioned on an upper electrode 53 side. For example, the recording layer is formed so that a content of Ga or In of the second layer is 5 atomic % or more smaller than that of the first layer. Also, a circuit which can reverse the voltage polarity between the upper electrode and the lower electrode in a set operation and a reset operation is provided.

    摘要翻译： 作为存储单元区域中的存储元件RM，使用由存储高电阻值的高电阻状态和低电阻值的低电阻状态的硫族化物材料制成的记录层52， 使得位于记录层52的下电极TP侧的第一层52a中的Ga或In的浓度高于位于上电极53侧的第二层52b的相应浓度。 例如，记录层形成为使得第二层中的Ga或In的含量比第一层的含量低5原子％以上。 此外，提供了在设定操作和复位操作中可以反转上电极和下电极之间的电压极性的电路。

    Semiconductor device
    2.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号：US08319204B2

    公开(公告)日：2012-11-27

    申请号：US12373185

    申请日：2006-07-21

    申请人： Motoyasu Terao ,  Satoru Hanzawa ,  Takahiro Morikawa ,  Kenzo Kurotsuchi ,  Riichiro Takemura ,  Norikatsu Takaura ,  Nozomu Matsuzaki

    发明人： Motoyasu Terao ,  Satoru Hanzawa ,  Takahiro Morikawa ,  Kenzo Kurotsuchi ,  Riichiro Takemura ,  Norikatsu Takaura ,  Nozomu Matsuzaki

    IPC分类号： H01L45/00 ,  H01L27/04

    CPC分类号： G11C13/0004 ,  G11C2213/79 ,  H01L27/2436 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/144 ,  H01L45/1625 ,  H01L45/1675

    摘要： A recording layer 52 made of a chalcogenide material which stores a high-resistance state of a high electrical resistance value and a low-resistance state of a low electrical resistance value is used as a memory element RM in a memory cell region, and it is formed so that a concentration of Ga or In of a first layer 52a positioned on a lower electrode TP side of the recording layer 52 is higher than the corresponding concentration of a second layer 52b positioned on an upper electrode 53 side. For example, the recording layer is formed so that a content of Ga or In of the second layer is 5 atomic % or more smaller than that of the first layer. Also, a circuit which can reverse the voltage polarity between the upper electrode and the lower electrode in a set operation and a reset operation is provided.

    摘要翻译： 作为存储单元区域中的存储元件RM，使用由存储高电阻值的高电阻状态和低电阻值的低电阻状态的硫族化物材料制成的记录层52， 使得位于记录层52的下电极TP侧的第一层52a中的Ga或In的浓度高于位于上电极53侧的第二层52b的相应浓度。 例如，记录层形成为使得第二层中的Ga或In的含量比第一层的含量低5原子％以上。 此外，提供了在设定操作和复位操作中可以反转上电极和下电极之间的电压极性的电路。

    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
    3.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME 审中-公开
    半导体器件及其制造方法

    公开(公告)号：US20090039335A1

    公开(公告)日：2009-02-12

    申请号：US12162769

    申请日：2006-02-09

    申请人： Motoyasu Terao ,  Kenzo Kurotsuchi ,  Riichiro Takemura ,  Norikatsu Takaura ,  Satoru Hanzawa

    发明人： Motoyasu Terao ,  Kenzo Kurotsuchi ,  Riichiro Takemura ,  Norikatsu Takaura ,  Satoru Hanzawa

    IPC分类号： H01L45/00

    CPC分类号： H01L27/101 ,  G11C13/0004 ,  G11C13/0011 ,  G11C2213/79 ,  H01L27/0688 ,  H01L27/2436 ,  H01L27/2472 ,  H01L45/085 ,  H01L45/1233 ,  H01L45/1266 ,  H01L45/142 ,  H01L45/146 ,  H01L45/1625 ,  H01L45/1675

    摘要： On an insulating film (31) in which a plug (35) is embedded, a second component releasing region (45) made of a first component and a second component, a solid electrolyte region (46) made of chalcogenide and an upper electrode region (47) are sequentially formed. The second component releasing region (45) made of a first component and a second component is composed of dome-shaped electrode portions (43) and an insulating film (44) burying the peripheries of the electrode portions (43), and at least one electrode portion (43) exists on the plug (34). The electrode portion (43) is composed of a first portion made of the first component such as tantalum oxide that is stable even when electric field is applied thereto and a second portion made of the second component such as copper or silver that is easily diffused in the solid electrolyte region (42) and moves therein by the application of an electric field. The second component supplied from the electrode portion (43) moves in the solid electrolyte region (46), thereby storing the information.

    摘要翻译： 在其中嵌入有插塞（35）的绝缘膜（31）上，由第一部件和第二部件制成的第二部件释放区域（45），由硫族化物制成的固体电解质区域（46）和上部电极区域 （47）。 由第一部件和第二部件制成的第二部件释放区域（45）由埋入电极部分（43）的周边的圆顶状电极部分（43）和绝缘膜（44）组成，并且至少一个 电极部分（43）存在于插头（34）上。 电极部（43）由第一部分（例如氧化钽）构成的第一部分，即使施加电场也是稳定的，而由诸如铜或银的第二部分制成的第二部分容易扩散 固体电解质区域（42）并通过施加电场而在其中移动。 从电极部（43）供给的第二部件在固体电解质区域（46）中移动，从而存储信息。

    Semiconductor device
    4.
    发明授权
    Semiconductor device 失效
    半导体器件

    公开(公告)号：US08618523B2

    公开(公告)日：2013-12-31

    申请号：US12302740

    申请日：2006-05-31

    申请人： Norikatsu Takaura ,  Yuichi Matsui ,  Motoyasu Terao ,  Yoshihisa Fujisaki ,  Nozomu Matsuzaki ,  Kenzo Kurotsuchi ,  Takahiro Morikawa

    发明人： Norikatsu Takaura ,  Yuichi Matsui ,  Motoyasu Terao ,  Yoshihisa Fujisaki ,  Nozomu Matsuzaki ,  Kenzo Kurotsuchi ,  Takahiro Morikawa

    IPC分类号： H01L47/00

    CPC分类号： G11C13/0004 ,  G11C8/08 ,  G11C13/0028 ,  G11C2213/79 ,  H01L27/2436 ,  H01L45/06 ,  H01L45/12 ,  H01L45/1233 ,  H01L45/144 ,  H01L45/1625 ,  H01L45/1675

    摘要： On an insulating film (41) in which a plug (43) as a lower electrode is embedded, a laminated layer pattern of an insulating film (51) made of tantalum oxide, a recording layer (52) made of Ge—Sb—Te based chalcogenide to which indium is introduced and an upper electrode film (53) made of tungsten or tungsten alloy is formed, thereby forming a phase change memory. By interposing the insulating film (51) between the recording layer (52) and the plug (43), an effect of reducing programming current of a phase change memory and an effect of preventing peeling of the recording layer (52) can be achieved. Further, by using the Ge—Sb—Te based chalcogenide to which indium is introduced as the recording layer (52), the difference in work function between the insulating film (51) and the recording layer (52) is increased, and the programming voltage of the phase change memory can be reduced.

    摘要翻译： 在嵌入作为下电极的插头（43）的绝缘膜（41）上，由氧化钽构成的绝缘膜（51）的叠层图案，由Ge-Sb-Te制成的记录层（52） 引入铟的硫属化合物和由钨或钨合金制成的上电极膜（53），从而形成相变存储器。 通过将绝缘膜（51）插入在记录层（52）和插塞（43）之间，可以实现降低相变存储器的编程电流的效果和防止记录层（52）的剥离的效果。 此外，通过使用引入了铟的Ge-Sb-Te类硫族化物作为记录层（52），绝缘膜（51）和记录层（52）之间的功函数差增大，编程 可以减小相变存储器的电压。

    SEMICONDUCTOR DEVICE
    7.
    发明申请
    SEMICONDUCTOR DEVICE 有权
    半导体器件

    公开(公告)号：US20100096613A1

    公开(公告)日：2010-04-22

    申请号：US12522744

    申请日：2007-01-11

    申请人： Takahiro Morikawa ,  Motoyasu Terao ,  Norikatsu Takaura ,  Kenzo Kurotsuchi ,  Nozomu Matsuzaki ,  Yoshihisa Fujisaki ,  Masaharu Kinoshita ,  Yuichi Matsui

    发明人： Takahiro Morikawa ,  Motoyasu Terao ,  Norikatsu Takaura ,  Kenzo Kurotsuchi ,  Nozomu Matsuzaki ,  Yoshihisa Fujisaki ,  Masaharu Kinoshita ,  Yuichi Matsui

    IPC分类号： H01L45/00 ,  H01L21/02

    CPC分类号： H01L45/144 ,  H01L27/2436 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/1675

    摘要： A phase change memory is formed of a plug buried within a through-hole in an insulating film formed on a semiconductor substrate, an interface layer formed on the insulating film in which the plug is buried, a recording layer formed of a chalcogenide layer formed on the interface layer, and an upper contact electrode formed on the recording layer. The recording layer storing information according to resistance value change is made of chalcogenide material containing indium in an amount range from 20 atomic % to 38 atomic %, germanium in a range from 9 atomic % to 28 atomic %, antimony in a range from 3 atomic % to 18 atomic %, and tellurium in a range from 42 atomic % to 63 atomic %, where the content of germanium larger than or equal to the content of antimony.

    摘要翻译： 相变存储器由形成在半导体衬底上的绝缘膜中的埋入通孔内的插塞形成，形成在绝缘膜上的界面层，其中埋入插塞，由硫化物层形成的记录层形成在 界面层和形成在记录层上的上接触电极。 根据电阻值变化存储信息的记录层由含有20原子％至38原子％的量的铟的含量为9原子％至28原子％的锗的硫属化物材料制成，3原子级的锑 ％〜18原子％，碲为42原子％〜63原子％，锗的含量大于或等于锑的含量。

    SEMICONDUCTOR DEVIC
    8.
    发明申请
    SEMICONDUCTOR DEVIC 失效
    半导体器件

    公开(公告)号：US20100012917A1

    公开(公告)日：2010-01-21

    申请号：US12302740

    申请日：2006-05-31

    申请人： Norikatsu Takaura ,  Yuichi Matsui ,  Motoyasu Terao ,  Yoshihisa Fujisaki ,  Nozomu Matsuzaki ,  Kenzo Kurotsuchi ,  Takahiro Morikawa

    发明人： Norikatsu Takaura ,  Yuichi Matsui ,  Motoyasu Terao ,  Yoshihisa Fujisaki ,  Nozomu Matsuzaki ,  Kenzo Kurotsuchi ,  Takahiro Morikawa

    IPC分类号： H01L47/00

    CPC分类号： G11C13/0004 ,  G11C8/08 ,  G11C13/0028 ,  G11C2213/79 ,  H01L27/2436 ,  H01L45/06 ,  H01L45/12 ,  H01L45/1233 ,  H01L45/144 ,  H01L45/1625 ,  H01L45/1675

    摘要： On an insulating film (41) in which a plug (43) as a lower electrode is embedded, a laminated layer pattern of an insulating film (51) made of tantalum oxide, a recording layer (52) made of Ge—Sb—Te based chalcogenide to which indium is introduced and an upper electrode film (53) made of tungsten or tungsten alloy is formed, thereby forming a phase change memory. By interposing the insulating film (51) between the recording layer (52) and the plug (43), an effect of reducing programming current of a phase change memory and an effect of preventing peeling of the recording layer (52) can be achieved. Further, by using the Ge—Sb—Te based chalcogenide to which indium is introduced as the recording layer (52), the difference in work function between the insulating film (51) and the recording layer (52) is increased, and the programming voltage of the phase change memory can be reduced.

    摘要翻译： 在嵌入作为下电极的插头（43）的绝缘膜（41）上，由氧化钽构成的绝缘膜（51）的叠层图案，由Ge-Sb-Te制成的记录层（52） 引入铟的硫属化合物和由钨或钨合金制成的上电极膜（53），从而形成相变存储器。 通过将绝缘膜（51）插入在记录层（52）和插塞（43）之间，可以实现降低相变存储器的编程电流的效果和防止记录层（52）的剥离的效果。 此外，通过使用引入了铟的Ge-Sb-Te类硫族化物作为记录层（52），绝缘膜（51）和记录层（52）之间的功函数差增大，编程 可以减小相变存储器的电压。