Precursor composition capable of yielding a polyimidesilicone resin
    3.
    发明授权
    Precursor composition capable of yielding a polyimidesilicone resin 失效
    能够产生聚酰亚胺树脂的前体组合物

    公开(公告)号:US5376733A

    公开(公告)日:1994-12-27

    申请号:US216385

    申请日:1994-03-23

    CPC分类号: C08G73/106 C08G77/455

    摘要: A polyimidesilicone resin precursor composition which comprises a polysiloxane of the following general formula ##STR1## wherein R is a monovalent organic group having up to 10 carbon atoms, R.sup.1 represents a hydrogen atom or a monovalent organic group having up to 10 carbon atoms, and m is an integer not smaller than 3, and a polyamic acid or a polyimide obtained from the polyamic acid. The composition is cured at a relatively low temperature within a short time to provide a cured film having improved solvent and heat resistances and good adhesion to various substrates.

    摘要翻译: 一种聚酰亚胺树脂前体组合物,其包含以下通式的聚硅氧烷,其中R是具有至多10个碳原子的一价有机基团,R 1表示氢原子或具有至多10个碳原子的一价有机基团,m 是不小于3的整数,和由聚酰胺酸获得的聚酰胺酸或聚酰亚胺。 该组合物在短时间内在相对低的温度下固化,以提供具有改进的溶剂和耐热性以及对各种基材的良好粘附性的固化膜。

    Photosensitive resin composition comprising a polyimide precursor and
method for making a polyimide film pattern from the same
    4.
    发明授权
    Photosensitive resin composition comprising a polyimide precursor and method for making a polyimide film pattern from the same 失效
    包含聚酰亚胺前体的光敏树脂组合物及其制备方法

    公开(公告)号:US5573886A

    公开(公告)日:1996-11-12

    申请号:US375837

    申请日:1995-01-20

    IPC分类号: G03F7/023 G03F7/40

    CPC分类号: G03F7/0233

    摘要: A photosensitive resin composition which comprises (A) a polyimide resin precursor of recurring units of a specific type, (B) at least one member selected from the group consisting of photosensitive diazoquinone compounds of the following formulas ##STR1## wherein R.sup.2 represents an organic group having from 1 to 50 carbon atoms, i is an integer of from 1 to 7, and i is an integer of from 1 to 7, and (C) a phenolic novolac resin. A method for forming a polyimide film pattern on various types of substrates is also described wherein a composition film is alkali-developed after imagewise exposure and cured to provide a heat-resistant polyimide film pattern suitable for protecting the substrate.

    摘要翻译: 一种感光性树脂组合物,其包含(A)特定类型的重复单元的聚酰亚胺树脂前体,(B)选自下式的光敏重氮醌化合物中的至少一种:其中R 2表示 1〜50个碳原子的有机基团,i为1〜7的整数,i为1〜7的整数,(C)酚醛清漆树脂。 还描述了在各种类型的基底上形成聚酰亚胺膜图案的方法,其中组合物膜在成像曝光后碱显影并固化以提供适合于保护基底的耐热聚酰亚胺膜图案。

    DT cut, contour mode piezoelectric crystal
    8.
    发明授权
    DT cut, contour mode piezoelectric crystal 失效
    DT切割,轮廓模式压电晶体

    公开(公告)号:US3979614A

    公开(公告)日:1976-09-07

    申请号:US516440

    申请日:1974-10-21

    申请人: Satoshi Toyoda

    发明人: Satoshi Toyoda

    IPC分类号: H03H9/19 H01L41/04

    CPC分类号: H03H9/19

    摘要: In a crystal element of the type wherein a DT-cut crystal element is used to generate vibrations of the contour mode, one side of the crystal element is flat and the thickness of the element is gradually decreased from the center toward the periphery thereof.

    摘要翻译: 在其中使用DT切割晶体元件来产生轮廓模式的振动的晶体元件中,晶体元件的一侧是平坦的,元件的厚度从中心向其周边逐渐减小。