METHODS OF FORMING NON-VOLATILE MEMORY
    2.
    发明申请
    METHODS OF FORMING NON-VOLATILE MEMORY 审中-公开
    形成非易失性存储器的方法

    公开(公告)号:US20130146963A1

    公开(公告)日:2013-06-13

    申请号:US13762704

    申请日:2013-02-08

    Inventor: Jun Zheng

    Abstract: Methods of forming non-volatile memory is described. The non-volatile memory includes a substrate having a source region, a drain region and a channel region. The channel region separates the source region and the drain region. An electrically insulating layer is adjacent to the source region, drain region and channel region. A floating gate electrode is adjacent to the electrically insulating layer. The electrically insulating layer separates the floating gate electrode from the channel region. The floating gate electrode has a floating gate major surface. A control gate electrode has a control gate major surface and the control gate major surface opposes the floating gate major surface. A vacuum layer or gas layer at least partially separates the control gate major surface from the floating gate major surface.

    Abstract translation: 描述形成非易失性存储器的方法。 非易失性存储器包括具有源极区,漏极区和沟道区的衬底。 沟道区域分离源极区域和漏极区域。 电绝缘层与源极区,漏极区和沟道区相邻。 浮栅电极与电绝缘层相邻。 电绝缘层将浮栅电极与沟道区分开。 浮栅电极具有浮栅主表面。 控制栅电极具有控制栅主表面,控制栅极主表面与浮栅主表面相对。 真空层或气体层至少部分地将控制栅极主表面与浮动栅极主表面分开。

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