Apparatus for X-ray analysis and apparatus for supplying X-rays
    1.
    发明授权
    Apparatus for X-ray analysis and apparatus for supplying X-rays 有权
    用于X射线分析的装置和用于提供X射线的装置

    公开(公告)号:US06823042B2

    公开(公告)日:2004-11-23

    申请号:US10188398

    申请日:2002-07-02

    IPC分类号: G21K106

    CPC分类号: G01N23/00

    摘要: Apparatus for X-ray analysis has a combination of a rotating target X-ray tube and a composite monochromator. The composite monochromator has a first and a second elliptic monochromators joined with each other side by side. Each of the elliptic monochromators has a first focal point at which an X-ray focal spot on a target of the X-ray tube is disposed. Each of the elliptic monochromators has a synthetic multilayered thin film whose d-spacing varies continuously along an elliptic-arc. The shortest distance between the X-ray focal spot and the composite monochromator is set to 40 to 100 mm. Under the shortest distance condition, the effective focal spot size on the target is set to 40 to 100 micrometers to obtain the maximum X-ray intensity on a sample to be analyzed.

    摘要翻译: 用于X射线分析的装置具有旋转靶X射线管和复合单色仪的组合。 复合单色仪具有彼此并排连接的第一和第二椭圆形单色器。 每个椭圆形单色器具有设置在X射线管的靶上的X射线焦斑的第一焦点。 每个椭圆单色仪具有合成的多层薄膜,其d-间距沿椭圆弧连续变化。 将X射线焦点与复合单色仪之间的最短距离设定为40〜100mm。 在最短距离条件下,目标上的有效焦斑尺寸设定为40〜100微米,以获得待分析样品上的最大X射线强度。

    Apparatus for x-ray analysis
    2.
    发明授权
    Apparatus for x-ray analysis 有权
    X射线分析装置

    公开(公告)号:US06249566B1

    公开(公告)日:2001-06-19

    申请号:US09270169

    申请日:1999-03-16

    IPC分类号: G21K106

    CPC分类号: G21K1/06

    摘要: An incident monochromator and a microfocus X-ray source with an apparent focal spot size of less than 30 micrometers are combined so that the X-ray source can be close to the monochromator and the intensity of X-rays focused on a sample is greatly increased. A side-by-side composite monochromator is arranged between the X-ray source and the sample. The composite monochromator has a first and a second elliptic monochromators each having a synthetic multilayered thin film with graded d-spacing. The first elliptic monochromator has one side which is connected to one side of the second elliptic monochromator. A preferable apparent focal spot size D of the X-ray source may be 10 micrometers. Because the invention provides a high focusing efficiency for X-rays, it is not required to use a high-power X-ray tube. The X-ray tube according to the invention, moreover, may have a stationary-anode, whose power may be about 7 Watts.

    摘要翻译: 组合入射单色仪和视点焦点尺寸小于30微米的微焦点X射线源,使得X射线源可以靠近单色仪,并且聚焦在样本上的X射线的强度大大增加 。 在X射线源和样品之间设置并排的复合单色仪。 复合单色仪具有第一和第二椭圆形单色器,每个具有分级d间距的合成多层薄膜。 第一椭圆单色仪具有连接到第二椭圆单色仪的一侧的一侧。 X射线源的优选视点焦点尺寸D可以为10微米。 由于本发明为X射线提供高的聚焦效率,所以不需要使用大功率的X射线管。 此外,根据本发明的X射线管可以具有固定阳极,其功率可以为约7瓦。

    Method and apparatus for measuring thin film, and thin film deposition system
    3.
    发明授权
    Method and apparatus for measuring thin film, and thin film deposition system 失效
    测量薄膜的方法和装置以及薄膜沉积系统

    公开(公告)号:US06970532B2

    公开(公告)日:2005-11-29

    申请号:US09852111

    申请日:2001-05-09

    IPC分类号: G01B15/02 G01N23/20

    CPC分类号: C23C14/545 G01B15/02

    摘要: The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.

    摘要翻译: 用于在设置在密封薄膜沉积炉中的基板的表面上沉积薄膜的薄膜沉积系统包括在与薄膜沉积炉连通的位置处的测量单元,测量单元包括薄膜沉积样品基板,用于允许 在测量单元的侧壁上设置X射线入射和提取窗口的同时从薄膜沉积炉流入的薄膜物质,其中在测量单元中的薄膜沉积样品基板上照射X射线 通过设置在薄膜沉积炉外部的薄膜测量单元通过X射线入射窗,并且通过X射线提取窗口感测从薄膜沉积样品基底反射的X射线。

    Beam conditioning system with sequential optic
    4.
    发明授权
    Beam conditioning system with sequential optic 有权
    光束调节系统

    公开(公告)号:US07280634B2

    公开(公告)日:2007-10-09

    申请号:US11449208

    申请日:2006-06-08

    IPC分类号: G21K1/06

    摘要: An x-ray beam conditioning system with a first diffractive element and a second diffractive element. The two diffractive elements are arranged in a sequential configuration, and one of the diffractive elements is a crystal. The other diffractive element may be a multilayer optic.

    摘要翻译: 一种具有第一衍射元件和第二衍射元件的X射线束调节系统。 两个衍射元件按顺序配置,其中一个衍射元件是晶体。 另一个衍射元件可以是多层光学元件。

    Beam conditioning system
    5.
    发明授权
    Beam conditioning system 有权
    光束调理系统

    公开(公告)号:US07076026B2

    公开(公告)日:2006-07-11

    申请号:US10866057

    申请日:2004-06-10

    IPC分类号: G21K1/06

    摘要: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.

    摘要翻译: 本发明提供一种具有Kirkpatrick-Baez衍射光学元件的X射线束调节系统,其包括两个光学元件,其中一个光学元件是晶体。 这些元件并排配置。 水晶可以是一个完美的水晶。 一个或两个衍射元件可以是镶嵌晶体。 一个元件可以是多层光学元件。 例如,多层光学器件可以是具有梯度d间距的椭圆镜或抛物面镜。 分级d间距可以是横向分级或深度分级,或两者。

    Method and apparatus of automatically selecting bragg reflections, method and system of automatically determining crystallographic orientation
    6.
    发明授权
    Method and apparatus of automatically selecting bragg reflections, method and system of automatically determining crystallographic orientation 失效
    自动选择布拉格反射的方法和装置,自动确定晶体取向的方法和系统

    公开(公告)号:US06198796B1

    公开(公告)日:2001-03-06

    申请号:US09321554

    申请日:1999-05-28

    IPC分类号: G01N2320

    CPC分类号: G01N23/20058

    摘要: A novel method and novel apparatus that are capable of selecting, with a computer, reference Bragg reflections pc1 and pc2, which form a basis for determination of the crystallographic orientation of a crystal sample by the two-reflection method, automatically and easily and accurately, wherein; firstly, x-ray intensities and diffraction conditions of all Bragg reflections which are measurable are calculated using the crystallographic information, secondly, a weight-point according to both the x-ray intensity and the angle between the sample normal and the scattering vector is obtained for each of the Bragg reflections, thirdly, two Bragg reflections having the two largest weight-points are selected as the reference Bragg reflections pc1 and pc2, respectively.

    摘要翻译: 能够通过计算机选择参考布拉格反射pc1和pc2的新型方法和新颖的装置,其通过双反射法自动且容易且准确地形成用于确定晶体样品的晶体取向的基础, 其中; 首先,使用晶体学信息计算可测量的所有布拉格反射的x射线强度和衍射条件,其次,获得根据x射线强度和样品法线与散射矢量之间的角度的加权点 对于每个布拉格反射,第三,分别选择具有两个最大权重点的两个布拉格反射作为参考布拉格反射pc1和pc2。

    Beam conditioning system
    7.
    发明申请
    Beam conditioning system 有权
    光束调理系统

    公开(公告)号:US20050025281A1

    公开(公告)日:2005-02-03

    申请号:US10866057

    申请日:2004-06-10

    IPC分类号: G02B26/08 G21K1/06

    摘要: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.

    摘要翻译: 本发明提供一种具有Kirkpatrick-Baez衍射光学元件的X射线束调节系统,其包括两个光学元件,其中一个光学元件是晶体。 这些元件并排配置。 水晶可以是一个完美的水晶。 一个或两个衍射元件可以是镶嵌晶体。 一个元件可以是多层光学元件。 例如,多层光学器件可以是具有梯度d间距的椭圆镜或抛物面镜。 分级d间距可以是横向分级或深度分级,或两者。

    Fluorescent x-ray analyzing method and apprartus
    8.
    发明授权
    Fluorescent x-ray analyzing method and apprartus 失效
    荧光X射线分析方法和apprartus

    公开(公告)号:US06385281B1

    公开(公告)日:2002-05-07

    申请号:US09657980

    申请日:2000-09-08

    IPC分类号: G01N23223

    CPC分类号: G01N23/223 G01N2223/076

    摘要: The present invention provides a new fluorescent X-ray analyzing method and an apparatus thereof which is capable of performing, with great precision, quantitative analysis and qualitative analysis for an atomic species generating fluorescent X-rays of not only a symmetrical energy spectrum but also an asymmetrical energy spectrum, wherein fluorescent X-rays generated from a sample by irradiation of X-rays or particle beams are measured as an energy spectrum, and profile fitting to the measured energy spectrum is performed by using an asymmetrical profile function which can express a symmetrical and an asymmetrical energy spectrum in accordance with an asymmetrical factor.

    摘要翻译: 本发明提供了一种新的荧光X射线分析方法及其装置,其能够以非常精确的方式对产生不对称能谱的荧光X射线的原子物质进行定量分析和定性分析, 不对称能谱,其中通过X射线或粒子束的照射从样品产生的荧光X射线被测量为能谱,并且通过使用可以表示对称的非对称轮廓函数来执行对测量的能谱的拟合曲线 以及根据不对称因素的不对称能谱。

    Beam conditioning system with sequential optic
    10.
    发明申请
    Beam conditioning system with sequential optic 有权
    光束调节系统

    公开(公告)号:US20060239405A1

    公开(公告)日:2006-10-26

    申请号:US11449208

    申请日:2006-06-08

    IPC分类号: G21K1/06

    摘要: An x-ray beam conditioning system with a first diffractive element and a second diffractive element. The two diffractive elements are arranged in a sequential configuration, and one of the diffractive elements is a crystal. The other diffractive element may be a multilayer optic.

    摘要翻译: 一种具有第一衍射元件和第二衍射元件的X射线束调节系统。 两个衍射元件按顺序配置,其中一个衍射元件是晶体。 另一个衍射元件可以是多层光学元件。