公开(公告)号：US06826442B2

公开(公告)日：2004-11-30

申请号：US09819670

申请日：2001-03-29

申请人： Seiji Takeuchi ,  Eiichi Murakami

发明人： Seiji Takeuchi ,  Eiichi Murakami

IPC分类号： G06F1900

CPC分类号： H01L21/67276

摘要： A stocker includes a first sealing member for stocking an object to be stocked, an atmosphere control device for controlling an internal atmosphere of the first sealing member to a first atmosphere of an inert gas, and a transfer device for transporting an object to be stocked to an exposure apparatus using an F2 excimer laser or receiving the object to be stocked from the exposure apparatus while the object to be stocked is shielded from an external atmosphere of the first sealing member.

摘要翻译： 储料器包括用于储存待储存物体的第一密封构件，用于将第一密封构件的内部气氛控制到惰性气体的第一气氛的气氛控制装置，以及用于将待储存的物体运送到 使用F2准分子激光器的曝光装置或者从待曝光的物体接收待存放的物体，同时将被保持物体与第一密封部件的外部气氛隔离。

公开(公告)号：US06611376B1

公开(公告)日：2003-08-26

申请号：US09089480

申请日：1998-06-02

申请人： Eiichi Murakami ,  Seiji Takeuchi

发明人： Eiichi Murakami ,  Seiji Takeuchi

IPC分类号： G02B2744

CPC分类号： G03F7/70216 ,  G02B5/1847 ,  Y10S359/90

摘要： The present invention discloses a diffractive optical element whose optical axis can be precisely positioned, and a method of manufacturing the diffractive optical element. The diffractive optical element includes a region provided with a concentric uneven pattern and having a predetermined light bending characteristic, and a peripheral section worked so that the optical axis of the diffractive optical element determined by the light bending characteristic of the region aligns with the center of the profile of the diffractive optical element.

摘要翻译： 本发明公开了一种可精确定位其光轴的衍射光学元件，以及制造衍射光学元件的方法。 衍射光学元件包括设置有同心凹凸图案并具有预定光弯曲特性的区域，并且加工周边部分，使得由该区域的光弯曲特性确定的衍射光学元件的光轴与 衍射光学元件的轮廓。

公开(公告)号：US09164370B2

公开(公告)日：2015-10-20

申请号：US12418420

申请日：2009-04-03

申请人： Yasuhiro Kishikawa ,  Tokuyuki Honda ,  Seiji Takeuchi

发明人： Yasuhiro Kishikawa ,  Tokuyuki Honda ,  Seiji Takeuchi

IPC分类号： G03B27/72 ,  G03B27/32 ,  G03F7/20

CPC分类号： G03B27/72 ,  G03B27/32 ,  G03F7/70583

摘要： An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

摘要翻译： 曝光用光致抗蚀剂涂覆的基板以形成光致抗蚀剂的潜像的曝光装置包括原始保持单元，其被配置为保持包括相位调制衍射光栅的原稿，使得在基板的表面上形成干涉图案 通过由原稿衍射的光束，被配置为保持基板的基板保持单元和被配置为分割光束以形成进入原稿的多个光束的光束分割光学系统，其中形成潜像 通过在基板的表面上形成的多个干涉图案叠加在基板上，分别对应于进入原稿的多个光束的多个干涉图案。

公开(公告)号：US20100225573A1

公开(公告)日：2010-09-09

申请号：US12680359

申请日：2008-07-16

申请人： Seiji Takeuchi

发明人： Seiji Takeuchi

IPC分类号： G09G3/36 ,  G02F1/13357

CPC分类号： G02F1/133605 ,  G02F1/133604

摘要： In a backlight device (3) including cold cathode fluorescent tubes (discharge tubes) (20a to 20h), CCFL driving circuits (driving circuits) (T) that light up the respective cold cathode fluorescent tubes (20a to 20h), and a reflective sheet (reflective layer) (19) that reflects light from the cold cathode fluorescent tubes (20a to 20h) in a predetermined direction, a reflective sheet (19) includes a first reflective portion (19a) using a non-conductive member provided in a portion up to a predetermined distance from the CCFL driving circuits (T) in a longitudinal direction of the cold cathode fluorescent tubes (20a to 20h) and a second reflective portion (19b) using a conductive member provided in a portion at a distance exceeding the predetermined distance.

摘要翻译： 在包括冷阴极荧光管（放电管）（20a〜20h）的背光装置（3）中，照亮各冷阴极荧光管（20a〜20h）的CCFL驱动电路（驱动电路）（T） 反射片（19）包括：第一反射部（19a），其使用设置在冷阴极荧光管（20a〜20h）中的非导电部件 在冷阴极荧光管（20a〜20h）的长度方向上距离CCFL驱动电路（T）预定距离的部分和使用设置在距离超过 预定距离。

公开(公告)号：US07675629B2

公开(公告)日：2010-03-09

申请号：US11851029

申请日：2007-09-06

申请人： Yumiko Ohsaki ,  Yasuhiro Sawada ,  Kenji Yamazoe ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Yasuhiro Sawada ,  Kenji Yamazoe ,  Seiji Takeuchi

IPC分类号： G01B9/02

CPC分类号： G03F7/70566 ,  G02B27/0025 ,  G03F7/706

摘要： An exposure apparatus including an illumination system which illuminates an original, and projection optics which project a pattern of the original illuminated by the illumination system onto a substrate. The apparatus includes an interferometer which forms an interference pattern including aberration information on the projection optics using a polarized light beam emitted from the illumination system, in which the interferometer is a common path interferometer in which two light beams forming interference pattern pass along a path in the projection optics, and a processor which calculates optical characteristics of the projection optics on the basis of the interference pattern formed by the interferometer. The illumination system including a polarization controller which sequentially generates at least three difference polarized light beams with respective polarization states different from each other. The processor separates first aberration and second aberration from wavefront aberration represented by the interference patterns sequentially formed by the interferometer using the at least three different polarized light beams, by calculating a data of the interference patterns, the first aberration being aberration which does not change dependent on a polarization state of polarized light beam entering the projection optics. The second aberration is aberration which changes dependent on the polarization state of the polarized light beam entering the projection optics.

摘要翻译： 一种曝光装置，包括照亮原稿的照明系统，以及投影光学元件，其将由照明系统照射的原稿的图案投影到基板上。 该装置包括干涉仪，其使用从照明系统发射的偏振光形成包括投影光学器件上的像差信息的干涉图案，其中干涉仪是公共路径干涉仪，其中形成干涉图案的两个光束沿着路径 投影光学器件和基于由干涉仪形成的干涉图案来计算投影光学元件的光学特性的处理器。 所述照明系统包括偏振控制器，其顺序地产生具有彼此不同的各自偏振状态的至少三个差分偏振光束。 处理器通过计算干涉图案的数据，使用至少三个不同的偏振光束分离由干涉仪顺序形成的干涉图案所表示的波前像差的第一像差和第二像差，第一像差是不依赖于变化的像差 在入射到投影光学器件的偏振光束的偏振状态下。 第二像差是根据进入投影光学器件的偏振光束的偏振状态而变化的像差。

公开(公告)号：US07466395B2

公开(公告)日：2008-12-16

申请号：US11458767

申请日：2006-07-20

申请人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G01M11/02 ,  G03F7/706

摘要： An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the projection optical system, the mask shaping a wavefront of light from a light source into an ideal wavefront, a detector configured to detect the light passing through the projection optical system; and an optical element placed between the mask and the projection optical system or between the projection optical system and the detector. The detector detects interference fringes (an interferogram) formed by interference between a reflected component of the light reflected by the optical element and a transmitted component of the light passing through the optical element.

摘要翻译： 一种曝光装置，包括将掩模版的图案图像投射到要曝光的物体上的投影光学系统和被配置为测量投影光学系统的光学特性的干涉仪。 所述干涉仪包括放置在所述投影光学系统的物平面侧的掩模，所述掩模将来自光源的光的波前成形为理想波前;检测器，被配置为检测通过所述投影光学系统的光; 以及放置在掩模和投影光学系统之间或投影光学系统和检测器之间的光学元件。 检测器检测由光学元件反射的光的反射分量与穿过光学元件的光的透射分量之间的干涉所形成的干涉条纹（干涉图）。

公开(公告)号：US20070019175A1

公开(公告)日：2007-01-25

申请号：US11458767

申请日：2006-07-20

申请人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

发明人： Yumiko Ohsaki ,  Akiyoshi Suzuki ,  Seiji Takeuchi

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G01M11/02 ,  G03F7/706

摘要： An exposure apparatus which includes a projection optical system that projects a pattern image of a reticle onto an object to be exposed, and an interferometer configured to measure an optical characteristic of the projection optical system. The interferometer includes a mask placed on an object plane side of the projection optical system, the mask shaping a wavefront of light from a light source into an ideal wavefront, a detector configured to detect the light passing through the projection optical system; and an optical element placed between the mask and the projection optical system or between the projection optical system and the detector. The detector detects interference fringes (an interferogram) formed by interference between a reflected component of the light reflected by the optical element and a transmitted component of the light passing through the optical element.

摘要翻译： 一种曝光装置，包括将掩模版的图案图像投射到要曝光的物体上的投影光学系统和被配置为测量投影光学系统的光学特性的干涉仪。 所述干涉仪包括放置在所述投影光学系统的物平面侧的掩模，所述掩模将来自光源的光的波前成形为理想波前;检测器，被配置为检测通过所述投影光学系统的光; 以及放置在掩模和投影光学系统之间或投影光学系统和检测器之间的光学元件。 检测器检测由光学元件反射的光的反射分量与穿过光学元件的光的透射分量之间的干涉所形成的干涉条纹（干涉图）。

公开(公告)号：US07164372B2

公开(公告)日：2007-01-16

申请号：US11062441

申请日：2005-02-23

申请人： Seiji Takeuchi

发明人： Seiji Takeuchi

IPC分类号： H03M9/00

CPC分类号： H03K17/002

摘要： In an LVDS system for converting N types (for example N=3) of parallel signals into serial signals and sending/receiving the converted serial signals between a driver and a receiver through M (M≦N) signal lines, a sequencer 11 for selecting drivers 10a to 10c to be used in accordance with the number of signal lines used for transmission/reception and a reception-side sequencer for selecting a receiver to be used in accordance with the number of signal lines M used for transmission/reception are included to perform transmission/reception by using the driver and receiver selected by the both sequencers. Thus, it is possible to select the number of channels and a data rate optimum for the impedance of a signal line without fixing the number of signal lines used for transmission/reception.

摘要翻译： 在用于将N个（例如N = 3）个并行信号转换为串行信号并且通过M（M <= N）个信号线在驱动器和接收机之间发送/接收经转换的串行信号的LVDS系统中， 根据用于发送/接收的信号线的数量选择要使用的驱动器10a至10c以及用于根据用于发送/接收的信号线M的数量来选择要使用的接收机的接收侧定序器 被包括以通过使用由两个定序器选择的驾驶员和接收机进行发送/接收。 因此，可以在不固定用于发送/接收的信号线的数量的情况下选择信道的数量和对信号线的阻抗最佳的数据速率。

公开(公告)号：US06992763B2

公开(公告)日：2006-01-31

申请号：US10864035

申请日：2004-06-08

申请人： Yasuhiro Kishikawa ,  Seiji Takeuchi

发明人： Yasuhiro Kishikawa ,  Seiji Takeuchi

IPC分类号： G01J4/00

CPC分类号： G03F7/70058 ,  G02B27/106 ,  G02B27/1073 ,  G02B27/108 ,  G02B27/144 ,  G02B27/145 ,  G03F7/7085

摘要： A beam splitting apparatus generates, from incident light having a specific polarization, first and second split light that has the specific polarization.

公开(公告)号：US06967796B2

公开(公告)日：2005-11-22

申请号：US09393966

申请日：1999-09-10

申请人： Seiji Takeuchi ,  Ichiro Tanaka ,  Yasuyuki Tomita

发明人： Seiji Takeuchi ,  Ichiro Tanaka ,  Yasuyuki Tomita

IPC分类号： G02B5/00 ,  G02B1/11 ,  G02B1/113 ,  G02B5/18

CPC分类号： G02B27/4222 ,  G02B5/1814 ,  G02B5/1876 ,  Y10S359/90

摘要： A diffractive optical element, which is used for an optical system of an exposure apparatus, includes a light-shielding member composed of a laminated layer of Cr oxide and Cr at a periphery of an effective area.

摘要翻译： 用于曝光装置的光学系统的衍射光学元件包括在有效区域的周围由Cr氧化物和Cr的层叠层构成的遮光构件。