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Patent Agency Ranking
公开(公告)号：US20150155188A1
公开(公告)日：2015-06-04
申请号：US14556380
申请日：2014-12-01
Applicant: SEMES CO., LTD.
Inventor： In-II Jung , Woo-Young Kim , Young il Lee , Boong Kim
CPC classification number: F26B21/10 , H01J37/32816 , H01J37/32825 , H01J37/32834 , H01J37/32935 , H01J37/3299 , H01L21/67028 , H01L21/67034 , H01L21/67051
Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus includes a process chamber in which a predetermined process is performed on a substrate, a pressure meter measuring a pressure within the process chamber, and a controller receiving the measured pressure value from the pressure meter to determine an opening time of the process chamber. The controller opens the process chamber when a set condition elapses from a time at which the pressure within the process chamber reaches a preset opening pressure.
Abstract translation: 提供了一种基板处理装置。 基板处理装置包括处理室，其中在基板上执行预定处理，测量处理室内的压力的压力计以及从压力计接收测量的压力值的控制器以确定该过程的打开时间 房间。 当处理室中的压力达到预设打开压力的时间过去了设定状态时，控制器打开处理室。
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公开(公告)号：US20150155158A1
公开(公告)日：2015-06-04
申请号：US14556334
申请日：2014-12-01
Applicant: SEMES CO., LTD.
Inventor： Ki-Bong Kim , Seong-Soo Kim , Woo-Young Kim
CPC classification number: F26B21/003 , H01L21/67017 , H01L21/67034 , H01L21/67051
Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus includes a first unit, a second unit, a supply line connecting the first unit to the second unit to supply a supercritical fluid from the first unit to the second unit, a flow rate adjustment member disposed in the supply line, and a filter disposed in the supply line to remove foreign substances. The supply line disposed between the flow rate adjustment member and the filter is disposed to get out of a straight line.
Abstract translation: 提供了一种基板处理装置。 基板处理装置包括第一单元，第二单元，将第一单元连接到第二单元的供应线，以将超临界流体从第一单元供应到第二单元，设置在供给管线中的流量调节构件，以及 设置在供给管线中以除去异物的过滤器。 设置在流量调节构件和过滤器之间的供给管线被设置为脱离直线。
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3.发明授权公开(公告)号：US10046371B2
公开(公告)日：2018-08-14
申请号：US14228562
申请日：2014-03-28
Applicant: Semes Co., Ltd.
Inventor： Eun-Sun Jung , Woo-Young Kim , Chan-youn Heo
Abstract: The substrate treating apparatus includes a process chamber in which an organic solvent remaining on a substrate is dissolved by using a fluid, that is provided as a supercritical fluid, to dry the substrate and a recycling unit including a recycler separating the organic solvent from the fluid discharged from the process chamber to recycle the fluid. The recycler includes a column having a space in which an absorbent for absorbing the organic solvent is stored, a supply tube supplying the fluid discharged from the process chamber into the space of the column, a discharge tube discharging the fluid from which the organic solvent is separated in the column, a gas supply tube supplying a purge gas into the column so that the organic solvent is separated from the absorbent, and an exhaust tube exhausting the purge gas containing the organic solvent to the outside of the column.
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公开(公告)号：US11655907B2
公开(公告)日：2023-05-23
申请号：US16591441
申请日：2019-10-02
Applicant: SEMES CO., LTD.
Inventor： Yong-Hyun Choi , Ki-Bong Kim , Woo-Young Kim
CPC classification number: F16K17/02 , H01L21/02101
Abstract: A safety valve includes a body having a flow passage formed therein, the flow passage including an inlet an outlet, in which a valve seat is formed around the inlet or the outlet, a disc provided in the body, in which one side of the disc is in contact with the valve seat, an elastic member that is connected to an opposite side of the disc and that elastically supports the disc and has a set elasticity, and a sealing member made of polyimide that is provided on contact surfaces of the disc and the valve seat.
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公开(公告)号：US09506695B2
公开(公告)日：2016-11-29
申请号：US14556334
申请日：2014-12-01
Applicant: SEMES CO., LTD.
Inventor： Ki-Bong Kim , Seong-Soo Kim , Woo-Young Kim
CPC classification number: F26B21/003 , H01L21/67017 , H01L21/67034 , H01L21/67051
Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus includes a first unit, a second unit, a supply line connecting the first unit to the second unit to supply a supercritical fluid from the first unit to the second unit, a flow rate adjustment member disposed in the supply line, and a filter disposed in the supply line to remove foreign substances. The supply line disposed between the flow rate adjustment member and the filter is disposed to get out of a straight line.
Abstract translation: 提供了一种基板处理装置。 基板处理装置包括第一单元，第二单元，将第一单元连接到第二单元的供应线，以将超临界流体从第一单元供应到第二单元，设置在供给管线中的流量调节构件，以及 设置在供给管线中以除去异物的过滤器。 设置在流量调节构件和过滤器之间的供给管线被设置为脱离直线。
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