公开(公告)号：US11367634B2

公开(公告)日：2022-06-21

申请号：US16557790

申请日：2019-08-30

Applicant: SEMES CO., LTD.

Inventor： Ohyeol Kwon ,  Jihyun Lee ,  Young Ho Choo

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/68

Abstract: The inventive concept relates to a substrate treating apparatus and method for removing various types of treating liquid or cleaning solution films on an edge region of a substrate without damage to a treated surface even though the substrate is rotated in an eccentric state.

公开(公告)号：US10991603B2

公开(公告)日：2021-04-27

申请号：US16556025

申请日：2019-08-29

Applicant: SEMES CO., LTD.

Inventor： Oh Jin Kwon ,  Chong-Min Ryu ,  Young Ho Choo

IPC: H01L21/67 ,  H01L21/02

Abstract: A method for treating a substrate includes a mixing step of preparing an ozone treatment fluid containing an ozone gas and a substrate treating step of treating a surface of the substrate using the ozone treatment fluid. In the substrate treating step, light is irradiated to the substrate by a lamp.

公开(公告)号：US20200167946A1

公开(公告)日：2020-05-28

申请号：US16685345

申请日：2019-11-15

Applicant: Semes Co., Ltd.

Inventor： Ohyeol KWON ,  Soo Young Park ,  Jihyun Lee ,  Young Ho Choo

IPC: G06T7/64 ,  G06T7/13 ,  G06T7/11 ,  G06T7/00 ,  H01L21/687

Abstract: Disclosed are a substrate treating apparatus, an eccentricity inspection apparatus, an eccentricity inspection method, and a recording medium for measuring the amount of eccentricity of a spin chuck. The substrate treating apparatus includes a process chamber, a support unit that supports a substrate and rotates the substrate about a support shaft of a spin chuck, and an eccentricity inspection device that inspects eccentricity of the support shaft. The eccentricity inspection device includes an image acquisition unit that obtains an image of the substrate supported on the support unit and an eccentricity measurement unit that obtains edge data of the substrate from the image of the substrate and measures an amount of eccentricity of the support shaft, based on the edge data.

公开(公告)号：US11158079B2

公开(公告)日：2021-10-26

申请号：US16685345

申请日：2019-11-15

Applicant: Semes Co., Ltd

Inventor： Ohyeol Kwon ,  Soo Young Park ,  Jihyun Lee ,  Young Ho Choo

IPC: G06K9/00 ,  G06T7/64 ,  G06T7/13 ,  G06T7/00 ,  H01L21/687 ,  G06T7/11

Abstract: Disclosed are a substrate treating apparatus, an eccentricity inspection apparatus, an eccentricity inspection method, and a recording medium for measuring the amount of eccentricity of a spin chuck. The substrate treating apparatus includes a process chamber, a support unit that supports a substrate and rotates the substrate about a support shaft of a spin chuck, and an eccentricity inspection device that inspects eccentricity of the support shaft. The eccentricity inspection device includes an image acquisition unit that obtains an image of the substrate supported on the support unit and an eccentricity measurement unit that obtains edge data of the substrate from the image of the substrate and measures an amount of eccentricity of the support shaft, based on the edge data.

公开(公告)号：US20130284367A1

公开(公告)日：2013-10-31

申请号：US13873304

申请日：2013-04-30

Applicant: SEMES CO., LTD.

Inventor： Byung Chul Kang ,  Bong Joo Kim ,  Byung Man Kang ,  Young Ho Choo

IPC: B05C11/10 ,  B05D1/00

CPC classification number: B05C11/1042 ,  B05D1/00 ,  H01L21/67017 ,  H01L21/6715 ,  Y10T137/0329

Abstract: Provided is a substrate processing apparatus. The apparatus includes a processing chamber containing a substrate and processing the substrate by using a processing solution and a supplying unit supplying the processing solution to the processing chamber. The supplying unit includes a supply line through which the processing solution is supplied, a preliminary heater installed on the supply line and preliminary heating the processing solution, a main heater installed on the supply line at a lower stream of the preliminary heater and secondarily heating the processing solution, a first detour line connected to the supply line to detour to the preliminary heater and comprising a first valve, a second detour line connected to the supply line to detour the preliminary heater and the main heater or the main heater and comprising a second valve, and a controller controlling the first valve and the second valve.

Abstract translation: 提供了一种基板处理装置。 所述装置包括处理室，所述处理室包含基板并通过使用处理溶液和将所述处理溶液供应到所述处理室的供应单元来处理所述基板。 供给单元包括供给管线，通过该供给管路供给处理液，将预热加热器安装在供给管路上，对该处理液进行预加热，将主加热器安装在预热器的下游的供给管路上， 连接到所述供应管线以绕行到所述预加热器的第一绕线，包括第一阀，连接到所述供应管线的第二绕行线，以绕过所述预加热器和所述主加热器或所述主加热器并且包括第二阀 阀，以及控制第一阀和第二阀的控制器。