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18 条记录 (耗时 0.051 秒)

    Integrated thin-film solar cells and method of manufacturing thereof and processing method of transparent electrode for integrated thin-film solar cells and structure thereof, and transparent substrate having processed transparent electrode
    6.
    发明授权
    Integrated thin-film solar cells and method of manufacturing thereof and processing method of transparent electrode for integrated thin-film solar cells and structure thereof, and transparent substrate having processed transparent electrode 有权
    集成薄膜太阳能电池及其制造方法以及用于集成薄膜太阳能电池的透明电极的处理方法及其结构，以及具有加工透明电极的透明基板

    公开(公告)号：US07927497B2

    公开(公告)日：2011-04-19

    申请号：US11908826

    申请日：2006-03-16

    申请人： Koeng Su Lim ,  Seong Won Kwon ,  Jeong Hwan Kwak ,  Sang Il Park ,  Jun-Bo Yoon ,  Gun-Woo Moon

    发明人： Koeng Su Lim ,  Seong Won Kwon ,  Jeong Hwan Kwak ,  Sang Il Park ,  Jun-Bo Yoon ,  Gun-Woo Moon

    IPC分类号： H01L31/04 ,  H01L31/18

    CPC分类号： H01L31/1884 ,  H01L31/022466 ,  H01L31/046 ,  H01L31/0463 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    摘要： The present invention relates to integrated thin film solar cells, and more particularly, to integrated thin film solar cells, which minimize the loss of integrated solar cells caused at the time of a manufacturing process and become available at a low cost process, and a method of manufacturing thereof, a processing method of a transparent electrode for integrated thin film solar cells, which widens an effective area and reduces manufacturing costs by minimizing a (insulating) gap between unit cells of the integrated thin film solar cells, and a structure thereof, and a transparent substrate having the transparent electrode. The method of manufacturing integrated thin film solar cells, comprising the steps of: (a) forming a transparent electrode pattern separately over a transparent substrate; (b) forming a solar cell (semiconductor) layer over the substrate of the step (a); (c) forming a first back electrode by obliquely depositing a conductive material over the solar cell (semiconductor) layer; (d) etching the solar cell (semiconductor) layer by using the first back electrode as a mask; and (e) forming a second back electrode so that the transparent electrode and the first back electrode are electrically connected by obliquely depositing a metal over the substrate of the step (d).

    摘要翻译： 本发明涉及集成薄膜太阳能电池，更具体地说，涉及一体化薄膜太阳能电池，其使得在制造过程中引起的集成太阳能电池的损耗最小化并且以低成本的方法可用，以及一种方法 制造该集成薄膜太阳能电池的透明电极的处理方法及其结构，其通过使集成薄膜太阳能电池的单元电池之间的（绝缘）间隙最小化来扩大有效面积并降低制造成本， 以及具有透明电极的透明基板。 一种制造集成薄膜太阳能电池的方法，包括以下步骤：（a）在透明基板上分开形成透明电极图案; （b）在步骤（a）的衬底上形成太阳能电池（半导体）层; （c）通过在太阳能电池（半导体）层上倾斜地沉积导电材料来形成第一背电极; （d）通过使用第一背面电极作为掩模蚀刻太阳能电池（半导体）层; 和（e）形成第二背电极，使得透明电极和第一背电极通过在步骤（d）的衬底上倾斜沉积金属而电连接。

    Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same
    7.
    发明授权
    Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same 有权
    材料图案和模具，金属薄膜图案，使用其的金属图案及其形成方法

    公开(公告)号：US08278028B2

    公开(公告)日：2012-10-02

    申请号：US12098180

    申请日：2008-04-04

    申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

    发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

    IPC分类号： G03F7/20

    CPC分类号： C09K19/544 ,  Y10T428/24802

    摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.

    摘要翻译： 本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。 根据本发明的形成材料图案的方法包括以下步骤： （a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。 根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们简单地形成模具，金属薄膜和金属图案。

    MATERIAL PATTERN, AND MOLD, METAL THIN-FILM PATTERN, METAL PATTERN USING THEREOF, AND METHODS OF FORMING THE SAME
    8.
    发明申请
    MATERIAL PATTERN, AND MOLD, METAL THIN-FILM PATTERN, METAL PATTERN USING THEREOF, AND METHODS OF FORMING THE SAME 有权
    材料图案和模具，金属薄膜图案，使用其的金属图案及其形成方法

    公开(公告)号：US20080248264A1

    公开(公告)日：2008-10-09

    申请号：US12098180

    申请日：2008-04-04

    申请人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

    发明人： Jin-Wan Jeon ,  Jun-Bo Yoon ,  Koeng Su Lim

    IPC分类号： G03F7/00 ,  C09K19/00 ,  B32B5/00

    CPC分类号： C09K19/544 ,  Y10T428/24802

    摘要： The present invention relates to a material pattern, and mold using thereof, metal thin-film pattern, metal pattern, and method of forming the sames. A method of forming the material pattern according to the present invention comprises the steps of; (a) forming a photo-sensitive material film by coating a photo-sensitive material on a substrate; (b) deciding an exposure section on the photo-sensitive material film; (c) disposing a light refraction film and a light diffusion film at a route of light exposed on the photo-sensitive material film; and (d) forming a pattern on the photo-sensitive material film, by projecting a light on the exposure section of the photo-sensitive material film, wherein the light transmits the light refraction film and the light diffusion film.A method of forming the material pattern according to the present invention can form the material pattern of three-dimensional asymmetric structure having various inclinations and shapes and can form simply mold, metal thin-film and metal pattern using thereof.

    摘要翻译： 本发明涉及一种材料图案及其使用的模具，金属薄膜图案，金属图案以及形成游丝的方法。 根据本发明的形成材料图案的方法包括以下步骤： （a）通过在基板上涂布感光材料来形成感光材料膜; （b）决定感光材料薄膜的曝光部分; （c）在曝光在感光材料膜上的光线路上设置光折射膜和光漫射膜; 以及（d）通过将光投射到感光材料膜的曝光部分上，在光敏材料膜上形成图案，其中光透射光折射膜和光漫射膜。 根据本发明的形成材料图案的方法可以形成具有各种倾斜和形状的三维不对称结构的材料图案，并且可以使用它们形成简单的模具，金属薄膜和金属图案。

    INTEGRATED THIN-FILM PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF
    9.
    发明申请
    INTEGRATED THIN-FILM PHOTOVOLTAIC DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
    集成薄膜光伏器件及其制造方法

    公开(公告)号：US20120048342A1

    公开(公告)日：2012-03-01

    申请号：US13217707

    申请日：2011-08-25

    申请人： Koeng Su Lim ,  Jin-Wan Jeon

    发明人： Koeng Su Lim ,  Jin-Wan Jeon

    IPC分类号： H01L31/05 ,  H01L31/18

    CPC分类号： H01L31/1872 ,  H01L31/046 ,  H01L31/0465 ,  H01L31/072 ,  Y02E10/50 ,  Y02P70/521

    摘要： Disclosed is an integrated thin film photovoltaic device. The integrated thin film photovoltaic device includes: a substrate including trenches formed therein; a first semiconductor material layer formed on the substrate from a first basic line within each of the trenches through one side of each of the trenches to the projected surface of the substrate, which is adjacent to the one side; a second semiconductor material layer formed on a resultant substrate from a second basic line on the first semiconductor material layer within each of the trenches through the other side of each of the trenches to the projected surface of the resultant substrate, which is adjacent to the other side, so that a portion of the first semiconductor material layer and a portion of the second semiconductor material layer are overlapped with each other within each of the trenches.

    摘要翻译： 公开了一种集成薄膜光伏器件。 集成薄膜光伏器件包括：衬底，其包括形成在其中的沟槽; 第一半导体材料层，其从每个沟槽中的每个沟槽中的第一基本线通过每个沟槽的一侧到与所述一侧相邻的衬底的突出表面形成; 形成在所得基板上的第二半导体材料层，该第二基线从每个沟槽中的每个沟槽中的第一半导体材料层上的第二基线通过每个沟槽的另一侧延伸到所得衬底的与另一个相邻的投影表面 使得第一半导体材料层的一部分和第二半导体材料层的一部分在每个沟槽内彼此重叠。

    INTEGRATED THIN-FILM SOLAR CELL AND MANUFACTURING METHOD THEREOF
    10.
    发明申请
    INTEGRATED THIN-FILM SOLAR CELL AND MANUFACTURING METHOD THEREOF 审中-公开
    一体化薄膜太阳能电池及其制造方法

    公开(公告)号：US20100300525A1

    公开(公告)日：2010-12-02

    申请号：US12787125

    申请日：2010-05-25

    申请人： Koeng Su Lim ,  Jin-Wan Joon

    发明人： Koeng Su Lim ,  Jin-Wan Joon

    IPC分类号： H01L31/0224 ,  H01L31/18

    CPC分类号： H01L31/0392 ,  H01L31/022425 ,  H01L31/035281 ,  H01L31/046 ,  H01L31/0465 ,  Y02E10/50

    摘要： An integrated thin-film solar cell and a method of manufacturing the same. In one aspect, the invention can be a method of manufacturing a thin-film solar cell comprising: providing a substrate on which trenches are formed separately from each other by a predetermined interval; forming a first electrode layer on a portion or the bottom side and one side of each of the trenches by using a first conductive material; forming a solar cell layer on the first electrode layer and on a portion of the trench on which the first electrode layer is not formed; forming a second electrode layer by obliquely emitting a second conductive material so that the second conductive material is deposited on the solar cell layer; etching the solar cell layer formed on the trenches such that the first electrode layer is exposed; and forming a conductive layer by obliquely emitting a third conductive material and depositing the third conductive material on the second electrode layer such that the exposed first electrode layer is electrically connected to the second electrode layer.

    摘要翻译： 一种集成薄膜太阳能电池及其制造方法。 一方面，本发明可以是一种制造薄膜太阳能电池的方法，包括：提供一个基板，沟槽彼此隔开预定间隔形成在其上; 通过使用第一导电材料在每个沟槽的一部分或底侧和一侧上形成第一电极层; 在所述第一电极层上形成太阳能电池层，在所述沟槽的未形成有所述第一电极层的部分上形成太阳能电池层; 通过倾斜地发射第二导电材料形成第二电极层，使得第二导电材料沉积在太阳能电池层上; 蚀刻形成在沟槽上的太阳能电池层，使得第一电极层露出; 以及通过倾斜地发射第三导电材料并在所述第二电极层上沉积所述第三导电材料形成导电层，使得所述暴露的第一电极层电连接到所述第二电极层。