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公开(公告)号:US07213329B2
公开(公告)日:2007-05-08
申请号:US11196243
申请日:2005-08-04
申请人: Seung-Woo Kim , Pyeong-Wan Kim , Sang-Ho Ahn , Bo-Seong Kim , Ho-Jeong Mun , Tae-Seong Park , Hee-Guk Choi
发明人: Seung-Woo Kim , Pyeong-Wan Kim , Sang-Ho Ahn , Bo-Seong Kim , Ho-Jeong Mun , Tae-Seong Park , Hee-Guk Choi
CPC分类号: H05K1/111 , H01L21/4853 , H01L23/49816 , H01L2224/03831 , H01L2224/0391 , H01L2224/0401 , H01L2224/05551 , H01L2224/05557 , H01L2224/05567 , H01L2224/05571 , H01L2224/13007 , H01L2224/13018 , H01L2224/13022 , H01L2924/0002 , H01L2924/01046 , H01L2924/01327 , H05K3/06 , H05K3/282 , H05K3/3452 , H05K2201/09745 , H05K2201/099 , H05K2203/0353 , Y02P70/611 , Y10T29/49124 , Y10T29/49147 , H01L2924/00 , H01L2224/05552 , H01L2924/00012
摘要: In the method, a conductive pad of the board is etched to a depth that is greater than 50% and less than 100% of a thickness of the conductive pad. Subsequently, a solder ball may be formed on the etched conductive pad. For example, the conductive pad may be copper.
摘要翻译: 在该方法中,将电路板的导电焊盘蚀刻到大于导电焊盘厚度的50%且小于100%的深度。 随后,可以在蚀刻的导电焊盘上形成焊球。 例如,导电焊盘可以是铜。