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1.发明授权Silver halide emulsion, production process thereof and novel pyridinium compound 失效卤化银乳剂，其制备方法和新型吡啶鎓化合物公开(公告)号：US06773876B2
公开(公告)日：2004-08-10
申请号：US10059003
申请日：2002-01-30
IPC分类号： G03C107
CPC分类号： G03C1/07 , G03C1/0051 , G03C1/047 , G03C2001/0153 , G03C2200/03 , G03C2200/43
摘要： A silver halide emulsion comprising tabular grains having a very small thickness with the main surfaces thereof having a very large surface area and being (111) face, is disclosed. More specifically, a silver halide emulsion is disclosed, comprising light-sensitive silver halide grains having a silver bromide content of 70 mol % or more, with 60 % or more of the entire projected area of said silver halide grains being occupied by tabular grains having an average grain thickness of less than 0.04 &mgr;m, an average equivalent-circle diameter of 4 &mgr;m or more, and (111) face as main surfaces.
摘要翻译： 公开了一种卤化银乳剂，其包含具有非常小的厚度的片状颗粒，其主表面具有非常大的表面积和（111）面。更具体地，公开了一种卤化银乳剂，其包含感光卤化银颗粒 具有70摩尔％以上的溴化银含量，所述卤化银颗粒的整个投影面积的60％以上被平均粒度小于0.04μm的平片状颗粒占据，平均当量圆直径为 4个以上，（111）面为主面。
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2.发明申请公开(公告)号：US20080242860A1
公开(公告)日：2008-10-02
申请号：US12132239
申请日：2008-06-03
IPC分类号： C07D251/40 , C07D257/04 , C07D285/125 , C07D249/12 , C07D487/02 , C07D249/14 , C07D271/113
CPC分类号： G03C7/39208 , G03C7/3003 , G03C7/3022 , G03C2200/04
摘要： The present invention relates to a silver halide color photographic light-sensitive material wherein at least one of light-sensitive silver halide emulsion layers includes a silver halide emulsion having a silver chloride content of at least 95 mol % and a silver iodide content of 0.05 mol % to 0.75 mol % and/or a silver bromide content of 0.05 mol % to 4.00 mol % and further at least one compound represented by the following formula (I): X-(L)n-Y Formula (I) wherein X represents a group adsorptive to a silver halide, L represents a divalent connecting group comprising one of an atom and an atomic group including at least one of a carbon atom, a nitrogen atom, a sulfur atom and an oxygen atom, Y denotes a reducible group and n denotes an integer of 0 or 1.
摘要翻译： 本发明涉及一种卤化银彩色照相感光材料，其中至少一种感光卤化银乳剂层包括氯化银含量至少为95摩尔％，碘化银含量为0.05摩尔的卤化银乳剂 ％至0.75mol％和/或溴化银含量为0.05mol％至4.00mol％，另外至少一种由下式（I）表示的化合物：<？in-line-formula description =“In-Line Formula” end =“lead”？> X-（L） -Y式（I）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中X 表示吸附卤化银的基团，L表示包含碳原子，氮原子，硫原子和氧原子中的至少一个的原子和原子团中的一个的二价连接基团，Y表示可还原基团 n表示0或1的整数。
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公开(公告)号：US08647523B2
公开(公告)日：2014-02-11
申请号：US13415390
申请日：2012-03-08
申请人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
发明人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
IPC分类号： C03C15/00
CPC分类号： H01L21/32134 , C09K13/06 , C23F1/16 , C23F1/28 , C23F1/30 , C23F1/44 , H01L21/28518 , H01L21/76843
摘要： This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.
摘要翻译： 本公开涉及含有至少一种磺酸，至少一种含卤化物阴离子的化合物，卤化物为氯化物或溴化物，至少一种含有硝酸根或亚硝酰基离子的化合物和水的蚀刻组合物。 所述至少一种磺酸可以为所述组合物的约25重量％至约95重量％。 卤化物阴离子可以是氯化物或溴化物，并且可以是组合物的约0.01重量％至约0.5重量％。 硝酸盐或亚硝酰离子可以为组合物的约0.1重量％至约20重量％。 水可以是组合物的至少约3重量％。
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公开(公告)号：US20120231632A1
公开(公告)日：2012-09-13
申请号：US13415390
申请日：2012-03-08
申请人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
发明人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
IPC分类号： H01L21/306 , C09K13/06 , C09K13/00
CPC分类号： H01L21/32134 , C09K13/06 , C23F1/16 , C23F1/28 , C23F1/30 , C23F1/44 , H01L21/28518 , H01L21/76843
摘要： This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.
摘要翻译： 本公开涉及含有至少一种磺酸，至少一种含卤化物阴离子的化合物，卤化物为氯化物或溴化物，至少一种含有硝酸根或亚硝酰基离子的化合物和水的蚀刻组合物。 所述至少一种磺酸可以为所述组合物的约25重量％至约95重量％。 卤化物阴离子可以是氯化物或溴化物，并且可以是组合物的约0.01重量％至约0.5重量％。 硝酸盐或亚硝酰离子可以为组合物的约0.1重量％至约20重量％。 水可以是组合物的至少约3重量％。
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公开(公告)号：US08083964B2
公开(公告)日：2011-12-27
申请号：US12055930
申请日：2008-03-26
申请人： Toru Yamada , Makoto Kikuchi , Tadashi Inaba , Takahiro Matsuno , Takamitsu Tomiga , Kazutaka Takahashi
发明人： Toru Yamada , Makoto Kikuchi , Tadashi Inaba , Takahiro Matsuno , Takamitsu Tomiga , Kazutaka Takahashi
IPC分类号： C03C15/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1436 , C09K3/1463
摘要： A metal-polishing liquid used for chemical-mechanical polishing of a conductor film of copper or a copper alloy in a process for manufacturing a semiconductor device, the metal-polishing liquid comprising: (1) an amino acid derivative represented by the formula (I); and (2) a surfactant, wherein, in the formula (I), R1 represents an alkyl group having 1 to 4 carbon atoms and R2 represents an alkylene group having 1 to 4 carbon atoms.
摘要翻译： 1.一种金属抛光液，其特征在于，在所述半导体装置的制造方法中，对铜或铜合金的导体膜进行化学机械研磨的金属研磨液，所述金属抛光液含有：（1）式 ）; 和（2）表面活性剂，其中，在式（I）中，R 1表示碳原子数1〜4的烷基，R 2表示碳原子数1〜4的亚烷基。
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6.发明授权公开(公告)号：US07741017B2
公开(公告)日：2010-06-22
申请号：US12132239
申请日：2008-06-03
CPC分类号： G03C7/39208 , G03C7/3003 , G03C7/3022 , G03C2200/04
摘要： The present invention relates to a silver halide color photographic light-sensitive material wherein at least one of light-sensitive silver halide emulsion layers includes a silver halide emulsion having a silver chloride content of at least 95 mol % and a silver iodide content of 0.05 mol % to 0.75 mol % and/or a silver bromide content of 0.05 mol % to 4.00 mol % and further at least one compound represented by the following formula (I): X-(L)n-Y Formula (I) wherein X represents a group adsorptive to a silver halide, L represents a divalent connecting group comprising one of an atom and an atomic group including at least one of a carbon atom, a nitrogen atom, a sulfur atom and an oxygen atom, Y denotes a reducible group and n denotes an integer of 0 or 1.
摘要翻译： 本发明涉及一种卤化银彩色照相感光材料，其中至少一种感光卤化银乳剂层包括氯化银含量至少为95摩尔％，碘化银含量为0.05摩尔的卤化银乳剂 ％至0.75mol％和/或溴化银含量为0.05mol％至4.00mol％，另外至少一种由下式（I）表示的化合物：X-（L）nY式（I）其中X表示基团 L表示包括碳原子，氮原子，硫原子和氧原子中的至少一个的原子和原子团中的一个的二价连接基团，Y表示可还原基团，n表示 整数为0或1。
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7.发明授权公开(公告)号：US06696234B2
公开(公告)日：2004-02-24
申请号：US10252441
申请日：2002-09-24
IPC分类号： G03C134
CPC分类号： G03C1/346 , G03C1/0053 , G03C7/30 , G03C7/39276 , G03C2200/19 , G03C2200/20
摘要： A silver halide photosensitive material contains a compound of the following general formula (I): wherein A1a represents a group selected from among CR1aR2a, NR1a, an oxygen atom and sulfur atom, A1b represents a group selected from among CR1bR2b, NR1b, an oxygen atom and sulfur atom, and each of R1a, R2a, R1b, R2b and R3 represents a hydrogen atom or a substituent, provided that, in the groups of CR1aR2a and CR1bR2b, R1aR2a and R1bR2b may represent a single divalent substituent, n represents an integer of 1 to 4, provided that, when n is 2 or more, a plurality of A1bs may be the same or different.
摘要翻译： 卤化银感光材料含有下列通式（I）的化合物：其中Ala表示选自CR1aR2a，NR1a，氧原子和硫原子的基团，A1b表示选自CR1bR2b，NR1b，氧原子 并且R 1a，R 2a，R 1b，R 2b和R 3各自表示氢原子或取代基，条件是在CR1aR2a和CR1bR2b的基团中，R1aR2a和R1bR2b可以表示单个二价取代基，n表示 如果1〜4，则n为2以上时，多个A1b可以相同也可以不同。
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8.发明授权公开(公告)号：US06689555B2
公开(公告)日：2004-02-10
申请号：US10082111
申请日：2002-02-26
IPC分类号： G03C110
CPC分类号： G03C7/39208 , G03C7/3003 , G03C7/3022 , G03C2200/04
摘要： The present invention relates to a silver halide color photographic light-sensitive material wherein at least one of light-sensitive silver halide emulsion layers includes a silver halide emulsion having a silver chloride content of at least 95 mol % and a silver iodide content of 0.05 mol % to 0.75 mol % and/or a silver bromide content of 0.05 mol % to 4.00 mol % and further at least one compound represented by the following formula (I): X—(L)n—Y Formula (I) wherein X represents a group adsorptive to a silver halide, L represents a divalent connecting group comprising one of an atom and an atomic group including at least one of a carbon atom, a nitrogen atom, a sulfur atom and an oxygen atom, Y denotes a reducible group and n denotes an integer of 0 or 1.
摘要翻译： 本发明涉及一种卤化银彩色照相感光材料，其中至少一种感光卤化银乳剂层包括氯化银含量至少为95摩尔％，碘化银含量为0.05摩尔的卤化银乳剂 ％至0.75mol％和/或溴化银含量为0.05mol％至4.00mol％，另外至少一种由下式（I）表示的化合物：其中X表示吸附卤化银的基团，L表示二价 连接基团，其包含原子和包含碳原子，氮原子，硫原子和氧原子中的至少一个的原子团，Y表示可还原基团，n表示0或1的整数。
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9.发明授权Cleaning composition, method for producing semiconductor device, and cleaning method 有权清洗组合物，半导体装置的制造方法以及清洗方法公开(公告)号：US08617417B2
公开(公告)日：2013-12-31
申请号：US13107199
申请日：2011-05-13
IPC分类号： C09K13/00
CPC分类号： C11D11/0047 , C11D7/265 , C11D7/3209 , C11D7/3218 , C11D7/5004
摘要： Provided are a cleaning composition which is capable of inhibiting the metal of a semiconductor substrate from corrosion, and has an excellent removability of plasma etching residues and/or ashing residues on the semiconductor substrate, a method for producing a semiconductor device, and a cleaning method using the cleaning composition. The cleaning composition for removing plasma etching residues and/or ashing residues formed on a semiconductor substrate, and a preparation method and a cleaning method for a semiconductor device, using the cleaning composition, wherein the cleaning composition includes (Component a) water; (Component b) an amine compound; (Component c) hydroxylamine and/or a salt thereof; (Component d) a quaternary ammonium compound; (Component e) an organic acid; and (Component f) a water-soluble organic solvent; and has a pH of 6 to 9.
摘要翻译： 本发明提供能够抑制半导体衬底的金属腐蚀并且具有优异的半导体衬底上的等离子体蚀刻残留物和/或灰化残留物的可除去性的清洁组合物，半导体器件的制造方法和清洁方法 使用清洁组合物。 用于除去形成在半导体衬底上的等离子体蚀刻残渣和/或灰化残留物的清洁组合物，以及使用该清洁组合物的半导体器件的制备方法和清洁方法，其中所述清洁组合物包含（组分a）水; （组分b）胺化合物; （组分c）羟胺和/或其盐; （组分d）季铵化合物; （组分e）有机酸; 和（组分f）水溶性有机溶剂; pH为6〜9。
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公开(公告)号：US06593075B1
公开(公告)日：2003-07-15
申请号：US09624968
申请日：2000-07-24
IPC分类号： G03C106
CPC分类号： G03C1/10 , G03C1/0051 , G03C2001/0055
摘要： A silver halide photographic light-sensitive material having at least one emulsion layer comprising silver halide grains, with the emulsion layer further comprising at least one compound represented by the following formula (I) and at least one compound represented by the following formula (II), (III), (IV-1), (IV-2), (V-1), (V-2), (V-3) or (VI): (X&Parenclosest;1&Parenopenst;L&Parenclosest;m&Parenopenst;A—B)n (I) (Het&Parenclosest;k1&Brketopenst;&Parenopenst;Q1&Parenclosest;k2&Parenopenst;Hy)]k3 (III) wherein the substituents as defined herein the specification.
摘要翻译： 一种卤化银摄影感光材料，其具有至少一个包含卤化银颗粒的乳剂层，乳剂层还包含至少一种由下式（I）表示的化合物和至少一种由下式（II）表示的化合物， ，（IV），（IV-1），（IV-2），（V-1），（V-2），（V-3）或（VI）
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