公开(公告)号：US06273957B1

公开(公告)日：2001-08-14

申请号：US09532446

申请日：2000-03-23

申请人： Mikio Yamamuka ,  Tsuyoshi Horikawa ,  Takaaki Kawahara ,  Fusaoki Uchikawa ,  Shigeru Matsuno ,  Takehiko Sato ,  Akira Yamada ,  Masayoshi Tarutani

发明人： Mikio Yamamuka ,  Tsuyoshi Horikawa ,  Takaaki Kawahara ,  Fusaoki Uchikawa ,  Shigeru Matsuno ,  Takehiko Sato ,  Akira Yamada ,  Masayoshi Tarutani

IPC分类号： C23C1600

CPC分类号： C23C16/4486

摘要： A vaporizing device for chemical vapor deposition (CVD) source materials includes a vaporizer for vaporizing introduced CVD source materials by heating, a spray nozzle of which an end portion is fixedly attached to the vaporizer for spraying the CVD source materials into the vaporizer, a cooling mechanism for cooling the spray nozzle, and a heat conduction restrictor attached to the end portion, proximate of the end portion, or to the vaporizer. Generation of non-vaporized residues and particles is decreased, improving productivity owing to prolongation of continuous operation time of the apparatus and a decrease in film defects.

摘要翻译： 用于化学气相沉积（CVD）源材料的蒸发装置包括用于通过加热蒸发引入的CVD源材料的蒸发器，将其端部固定地附接到蒸发器的喷嘴，用于将CVD源材料喷射到蒸发器中， 用于冷却喷嘴的机构，以及附接到端部附近的端部部分或蒸发器的导热限制器。 不蒸发残留物和颗粒的产生减少，由于设备的连续操作时间的延长以及膜缺陷的减少而提高了生产率。

公开(公告)号：US06512297B2

公开(公告)日：2003-01-28

申请号：US09277185

申请日：1999-03-26

申请人： Shigeru Matsuno ,  Fusaoki Uchikawa ,  Takehiko Sato ,  Akira Yamada

发明人： Shigeru Matsuno ,  Fusaoki Uchikawa ,  Takehiko Sato ,  Akira Yamada

IPC分类号： C23C1600

CPC分类号： H01L28/60 ,  C23C16/18 ,  H01L28/55

摘要： A CVD source material which can be stably tramsported to a reactor in order to form a platinum metal, Cu, or an oxide of them as an electrode. An organometallic compound including a platinum metal (Ru, Pt, Ir, Pd, Os, Rh, Re) or Cu, is dissolved into tetrahydrofuran or a solvent containing tetrahydrofuran to obtain the CVD source material. In this material, the amount of moisture is preferably not more than 200 ppm. A film is formed by CVD employing this source material, the material is supplied stably, and the properties of the electrode film are improved. The capacitance property of the film is improved. Wiring of an electrical device may be formed by employing source material.

摘要翻译： 可以将CVD源材料稳定地传送到反应器以形成铂金属Cu或其氧化物作为电极。 将包含铂金属（Ru，Pt，Ir，Pd，Os，Rh，Re）或Cu的有机金属化合物溶解在四氢呋喃或含有四氢呋喃的溶剂中，得到CVD源材料。 在该材料中，水分的含量优选为200ppm以下。 通过使用该源材料的CVD形成膜，稳定地供给材料，并提高电极膜的性能。 膜的电容性能得到改善。 可以通过使用源材料来形成电气装置的布线。

公开(公告)号：US20080295770A1

公开(公告)日：2008-12-04

申请号：US12219583

申请日：2008-07-24

申请人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

发明人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

IPC分类号： B05C11/10

CPC分类号： F16K11/207 ,  B01D1/0082 ,  C23C16/448 ,  C23C16/4486 ,  F16K31/1221 ,  Y10S261/65

摘要： In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.

公开(公告)号：US20070085226A1

公开(公告)日：2007-04-19

申请号：US11604235

申请日：2006-11-27

申请人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

发明人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

IPC分类号： B01F3/04

CPC分类号： F16K11/207 ,  B01D1/0082 ,  C23C16/448 ,  C23C16/4486 ,  F16K31/1221 ,  Y10S261/65

摘要： In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.

摘要翻译： 在液体物质供给装置中，三端口二阀方向控制阀设置在输送管线中，物质容器和输送管线通过四端口三阀方向控制阀连接在一起，使得四端口 三阀方向控制阀和物质容器可以作为一个单元从输送管线中取出。 此外，在蒸发器中，设置有用于包围内部导管的端部的孔部件，在内部导管的端部，将由气体和与其混合的液体物质构成的混合物流动，将用于雾化的气体通过间隙喷射到蒸发室内 限定在内部管道和孔口构件之间。 此外，可以根据液体物质的性质独立地控制蒸发室中的汽化表面的温度。

公开(公告)号：US07637482B2

公开(公告)日：2009-12-29

申请号：US12219584

申请日：2008-07-24

申请人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

发明人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

IPC分类号： B01F3/04

CPC分类号： F16K11/207 ,  B01D1/0082 ,  C23C16/448 ,  C23C16/4486 ,  F16K31/1221 ,  Y10S261/65

摘要： In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.

摘要翻译： 在液体物质供给装置中，三端口二阀方向控制阀设置在输送管线中，物质容器和输送管线通过四端口三阀方向控制阀连接在一起，使得四端口 三阀方向控制阀和物质容器可以作为一个单元从输送管线中取出。 此外，在蒸发器中，设置有用于包围内部导管的端部的孔部件，在内部导管的端部，将由气体和与其混合的液体物质构成的混合物流动，将用于雾化的气体通过间隙喷射到蒸发室内 限定在内部管道和孔口构件之间。 此外，可以根据液体物质的性质独立地控制蒸发室中的汽化表面的温度。

公开(公告)号：US07422198B2

公开(公告)日：2008-09-09

申请号：US11604235

申请日：2006-11-27

申请人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

发明人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

IPC分类号： B01F3/04

CPC分类号： F16K11/207 ,  B01D1/0082 ,  C23C16/448 ,  C23C16/4486 ,  F16K31/1221 ,  Y10S261/65

摘要： In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.

摘要翻译： 在液体物质供给装置中，三端口二阀方向控制阀设置在输送管线中，物质容器和输送管线通过四端口三阀方向控制阀连接在一起，使得四端口 三阀方向控制阀和物质容器可以作为一个单元从输送管线中取出。 此外，在蒸发器中，设置有用于包围内部导管的端部的孔部件，在内部导管的端部，将由气体和与其混合的液体物质构成的混合物流动，将用于雾化的气体通过间隙喷射到蒸发室内 限定在内部管道和孔口构件之间。 此外，可以根据液体物质的性质独立地控制蒸发室中的汽化表面的温度。

公开(公告)号：US07163197B2

公开(公告)日：2007-01-16

申请号：US09957470

申请日：2001-09-21

申请人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

发明人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

IPC分类号： B01F3/04

CPC分类号： F16K11/207 ,  B01D1/0082 ,  C23C16/448 ,  C23C16/4486 ,  F16K31/1221 ,  Y10S261/65

摘要： In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.

摘要翻译： 在液体物质供给装置中，三端口二阀方向控制阀设置在输送管线中，物质容器和输送管线通过四端口三阀方向控制阀连接在一起，使得四端口 三阀方向控制阀和物质容器可以作为一个单元从输送管线中取出。 此外，在蒸发器中，设置有用于包围内部导管的端部的孔部件，在内部导管的端部，将由气体和与其混合的液体物质构成的混合物流动，将用于雾化的气体通过间隙喷射到蒸发室内 限定在内部管道和孔口构件之间。 此外，可以根据液体物质的性质独立地控制蒸发室中的汽化表面的温度。

公开(公告)号：US07731162B2

公开(公告)日：2010-06-08

申请号：US12219583

申请日：2008-07-24

申请人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

发明人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

IPC分类号： B01F3/04

CPC分类号： F16K11/207 ,  B01D1/0082 ,  C23C16/448 ,  C23C16/4486 ,  F16K31/1221 ,  Y10S261/65

摘要： In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.

摘要翻译： 在液体物质供给装置中，三端口二阀方向控制阀设置在输送管线中，物质容器和输送管线通过四端口三阀方向控制阀连接在一起，使得四端口 三阀方向控制阀和物质容器可以作为一个单元从输送管线中取出。 此外，在蒸发器中，设置有用于包围内部导管的端部的孔部件，在内部导管的端部，将由气体和与其混合的液体物质构成的混合物流动，将用于雾化的气体通过间隙喷射到蒸发室内 限定在内部管道和孔口构件之间。 此外，可以根据液体物质的性质独立地控制蒸发室中的汽化表面的温度。

公开(公告)号：US20090045531A1

公开(公告)日：2009-02-19

申请号：US12219584

申请日：2008-07-24

申请人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

发明人： Naoki Yoshioka ,  Tatsushi Kawamoto ,  Mitsushi Kawao ,  Shigeru Matsuno ,  Akira Yamada ,  Shoji Miyashita ,  Fusaoki Uchikawa

IPC分类号： B01F3/04

CPC分类号： F16K11/207 ,  B01D1/0082 ,  C23C16/448 ,  C23C16/4486 ,  F16K31/1221 ,  Y10S261/65

摘要： In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.

公开(公告)号：US5372850A

公开(公告)日：1994-12-13

申请号：US18900

申请日：1993-02-17

申请人： Fusaoki Uchikawa ,  Shigeru Matsuno ,  Shin-ichi Kinouchi ,  Toshihisa Honda ,  Takeharu Kuroiwa ,  Hisao Watarai ,  Takashi Higaki

发明人： Fusaoki Uchikawa ,  Shigeru Matsuno ,  Shin-ichi Kinouchi ,  Toshihisa Honda ,  Takeharu Kuroiwa ,  Hisao Watarai ,  Takashi Higaki

IPC分类号： C23C16/40 ,  C23C16/448 ,  C23C16/00

CPC分类号： C23C16/409 ,  C23C16/4481

摘要： In a process for manufacturing an oxide-system dielectric thin film using a raw material compound in which a metal atom is coupled with an organic group through oxygen atoms by the CVD method. A vapor of organic solvent having a boiling point less than 100.degree. C. contacts to the raw material compound at least in one of processes for vaporizing or transporting said raw material compound. The raw material compound of oxide-system dielectric thin film can be vaporized stably and transported to the reactor at a low temperature than before. Therefore, a composition can be controlled homogeneously and an oxide-system dielectric thin film having a good performance can be manufactured.

摘要翻译： 在使用其中通过CVD法将金属原子与有机基团通过氧原子偶联的原料化合物制造氧化物系介质薄膜的方法中。 沸点低于100℃的有机溶剂的蒸气与原料化合物接触，至少一种蒸发或输送原料化合物的方法。 氧化物系介质薄膜的原料化合物能够在比以前低的温度下稳定地蒸发并输送到反应器。 因此，可以均匀地控制组合物，并且可以制造具有良好性能的氧化物系介电薄膜。