公开(公告)号：US5148037A

公开(公告)日：1992-09-15

申请号：US675059

申请日：1991-03-26

申请人： Shigeyuki Suda ,  Sakae Houryu ,  Noriyuki Nose

发明人： Shigeyuki Suda ,  Sakae Houryu ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G01B11/14 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7049

摘要： A method and apparatus for detecting a positional relationship between first and second objects is disclosed, which includes a light source for projecting light to the first and second objects, a photodetecting system for detecting light from one of the first and second objects irradiated with the light from the light source, the detecting system being operable to detect first light whose position of incidence upon a predetermined plane is dependent upon the positional relationship of the first and second objects in a direction along the interval therebetween and in a direction perpendicular to the interval, second light whose position of incidence upon the predetermined plane is dependent upon the positional relationship of the first and second objects in the direction of the interval therebetween, and third light whose position of incidence upon the predetermined plane is independent of the positional relationship of the first and second objects in both the direction of the interval and the direction perpendicular to the interval, and a positional relationship detecting system for detecting the positional relationship of the first and second objects in the direction of the interval and the direction perpendicular to the interval, on the basis of the detection by the photodetecting system.

公开(公告)号：US5162656A

公开(公告)日：1992-11-10

申请号：US841790

申请日：1992-03-02

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda ,  Ryo Kuroda ,  Yukichi Niwa ,  Noriyuki Nose

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda ,  Ryo Kuroda ,  Yukichi Niwa ,  Noriyuki Nose

IPC分类号： G03F9/00

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.

摘要翻译： 公开了一种用于检测预定方向上的第一和第二物体之间的位置关系的装置。 该装置包括用于将光投射到第一物体上的光源，使得入射在第一物体上的光由此偏转，并在垂直于预定方向的方向上从其发出; 光接收部分沿着垂直于预定方向偏转并被第二物体再次偏转的方向设置的方向延伸，光接收部分可操作以检测其上的光的入射位置，其中， 光在光接收装置上的位置可随着第二物体上的光入射位置而改变; 以及检测系统，用于基于光接收部分的检测来检测第一和第二物体在预定方向上的位置关系。

公开(公告)号：US5028797A

公开(公告)日：1991-07-02

申请号：US413739

申请日：1989-09-28

申请人： Naoto Abe ,  Shigeyuki Suda ,  Koji Uda ,  Hirohisa Ohta ,  Noriyuki Nose

发明人： Naoto Abe ,  Shigeyuki Suda ,  Koji Uda ,  Hirohisa Ohta ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7096 ,  G03F9/7049

摘要： An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.

公开(公告)号：US5327221A

公开(公告)日：1994-07-05

申请号：US919380

申请日：1992-07-29

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Yukichi Niwa ,  Ryo Kuroda ,  Noriyuki Nose ,  Minoru Yoshii ,  Naoto Abe ,  Mitsutoshi Ohwada

IPC分类号： G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light. On the basis of the detection by the first and second detecting portions, the positional relationship between the first and second objects is detected without being affected by an inclination thereof.

摘要翻译： 一种用于检测在预定方向上的第一和第二物体之间的位置关系的装置包括：用于沿与第一或第二物体的方向发射光的光源;以及第一检测部分，用于检测第一和第二物体偏转的第一光的入射位置 第一和第二物体，其中在第一检测部分上的第一光的入射位置随预定方向上第一和第二物体之间的位置关系的改变而改变。 第二检测部分检测由第一和第二物体中的至少一个偏转的第二光的入射位置，其中由第一和第二物体之间的位置关系的变化引起的第二光的入射位置的状态 在预定方向上的物体与第一光不同。 基于第一和第二检测部分的检测，检测第一和第二物体之间的位置关系，而不受其倾斜的影响。

公开(公告)号：US5200800A

公开(公告)日：1993-04-06

申请号：US892732

申请日：1992-05-29

申请人： Shigeyuki Suda ,  Kenji Saitoh ,  Minoru Yoshii ,  Noriyuki Nose

发明人： Shigeyuki Suda ,  Kenji Saitoh ,  Minoru Yoshii ,  Noriyuki Nose

IPC分类号： G03F9/00

CPC分类号： G03F9/7076

摘要： A method of detecting a position of a substrate having an alignment mark includes the steps of projecting a radiation beam from an optical head to the alignment mark such that the alignment mark produces a signal beam on the basis of which the position of the substrate is detected, forming a reference mark on the substrate at a position different from that of the alignment mark, projecting a radiation beam from the optical head to the reference mark, such that the reference mark produces a reference beam, detecting the relative positional deviation of the optical head relative to the reference mark on the basis of the produced reference beam, and adjusting the relative position of the optical head and the alignment mark on the basis of the detected relative positional deviation and, after the adjustment, detecting the position of the substrate on the basis of the produced signal beam.

摘要翻译： 检测具有对准标记的基板的位置的方法包括以下步骤：将来自光学头的辐射束投射到对准标记，使得对准标记产生信号光束，基于该信号光束检测基板的位置 在与所述对准标记不同的位置的基板上形成参考标记，将来自所述光学头的辐射束投射到所述基准标记，使得所述基准标记产生参考光束，检测所述光学器件的相对位置偏差 基于所生成的参考光束相对于参考标记的头部，并且基于检测到的相对位置偏差来调整光学头和对准标记的相对位置，并且在调整之后，检测基板的位置 产生信号光束的基础。

公开(公告)号：US5343291A

公开(公告)日：1994-08-30

申请号：US851109

申请日：1992-03-16

申请人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

发明人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

IPC分类号： G03F9/00 ,  G01B11/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.

摘要翻译： 用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

公开(公告)号：US5319444A

公开(公告)日：1994-06-07

申请号：US20464

申请日：1993-02-22

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Yukichi Niwa ,  Noriyuki Nose ,  Minoru Yoshii ,  Shigeyuki Suda

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Yukichi Niwa ,  Noriyuki Nose ,  Minoru Yoshii ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  G01B11/14 ,  G01N21/86

CPC分类号： G03F9/7049

摘要： A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.

摘要翻译： 一种检测第一和第二物体之间的相对位置偏差的方法。 该方法包括以下步骤：向第一物体提供用作透镜的第一标记，为第二物体提供用作透镜的第二标记，在第一和第二物体之间提供光学系统，引导辐射束通过 第一标记和第二标记的光学系统，并且检测来自用来自光学系统的辐射束照射的第二标记的辐射束的任何偏移，以检测第一和第二物体的相对位置偏差。

公开(公告)号：US5294980A

公开(公告)日：1994-03-15

申请号：US58662

申请日：1993-05-10

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Yukichi Niwa ,  Noriyuki Nose ,  Ryo Kuroda ,  Shigeyuki Suda

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Yukichi Niwa ,  Noriyuki Nose ,  Ryo Kuroda ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  G01B11/00 ,  G01N21/85

CPC分类号： G03F9/70

摘要： A device for detecting a relative positional relationship between first and second objects with respect to a predetermined direction includes an illumination system for irradiating the first object with light, wherein the first and second objects are provided with first and second physical optic elements, respectively, each having a light converging or diverging function in at least one direction and wherein the illumination system illuminates the first physical optic element. A photodetecting system detects light passing through the first object and emanating from the second object, and is operable to detect light convergently or divergently influenced by both of the first and physical optic elements, such that the relative positional relationship between the first and second objects can be detected on the basis of the detection by the photodetecting system. At least one of the first and second physical optic elements has a light converging or diverging function in a direction perpendicular to the one direction and has different focal lengths in the perpendicular direction and in the one direction.

摘要翻译： 用于检测相对于预定方向的第一和第二物体之间的相对位置关系的装置包括用于用光照射第一物体的照明系统，其中第一和第二物体分别设置有第一和第二物理光学元件， 在至少一个方向上具有聚光或发散功能，并且其中所述照明系统照亮所述第一物理光学元件。 光检测系统检测穿过第一物体并从第二物体发出的光，并且可操作以从第一物理光学元件和物理光学元件两者收敛或分散地检测光，使得第一和第二物体之间的相对位置关系 基于光检测系统的检测来检测。 第一和第二物理光学元件中的至少一个在垂直于一个方向的方向上具有聚光或发散功能，并且在垂直方向和一个方向上具有不同的焦距。

公开(公告)号：US4802746A

公开(公告)日：1989-02-07

申请号：US832649

申请日：1986-02-25

申请人： Takeshi Baba ,  Shigeyuki Suda ,  Noriyuki Nose ,  Eigo Kawakami ,  Toshiyuki Nakajima ,  Nobuo Kushibiki

发明人： Takeshi Baba ,  Shigeyuki Suda ,  Noriyuki Nose ,  Eigo Kawakami ,  Toshiyuki Nakajima ,  Nobuo Kushibiki

IPC分类号： G02B3/14 ,  G02B7/36

CPC分类号： G02B7/36 ,  G02B3/14

摘要： A variable focus optical element comprises plural elastic members superposed in the axial direction and a deforming member having an aperture to cause the elastic member to protrude therefrom or descend therein thereby deforming the surface of the elastic members, and the modulus of elasticity of an elastic member at the protruding side is selected larger than that of another elastic member adjacent to first-mentioned elastic member at the protruding side. A focus detecting device comprises an imaging optical system having a variable-focus optical element, an image sensor provided at a determined image plane of the imaging optical system or an optically equivalent position, a sharpness detecting device for detecting the sharpness of the image from image signals obtained from the image sensor, and a device for varying the refractive power of the variable-focus optical element, and the focus state of the image on the image sensor is detected by comparing the sharpnesses detected by the sharpness detecting device at plural refractive powers of the variable-focus optical element.

摘要翻译： 可变焦距光学元件包括沿轴向重叠的多个弹性构件和具有孔的变形构件，以使弹性构件从其突出或下降，从而使弹性构件的表面变形，并且弹性构件的弹性模量 在突出侧的突出侧被选择为大于在突出侧与第一弹性构件相邻的另一个弹性构件的突出侧。 焦点检测装置包括具有可变焦点光学元件的成像光学系统，设置在成像光学系统的确定的图像平面上的图像传感器或光学等效位置，用于从图像中检测图像的清晰度的锐度检测装置 通过将由锐度检测装置检测的锐度与多个折射力进行比较来检测从图像传感器获得的信号和用于改变可变焦点光学元件的折射力的装置和图像在图像传感器上的聚焦状态 的可变焦光学元件。

公开(公告)号：US5182615A

公开(公告)日：1993-01-26

申请号：US563420

申请日：1990-08-07

申请人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

发明人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70691 ,  G03F9/7049

摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.