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    AQUEOUS SOLUTION COMPOSITION CONTAINING ORGANOSILICON COMPOUND
    1.
    发明申请
    AQUEOUS SOLUTION COMPOSITION CONTAINING ORGANOSILICON COMPOUND 有权

    公开(公告)号：US20230022811A1

    公开(公告)日：2023-01-26

    申请号：US17849347

    申请日：2022-06-24

    申请人： SHIN-ETSU CHEMICAL CO., LTD.

    发明人： Munenao HIROKAMI

    IPC分类号： C07F7/08 ,  D06M13/513

    摘要： An aqueous solution composition containing a hydrolysate or a hydrolytic condensate of an organosilicon compound of formula (1), or both the hydrolysate and the hydrolytic condensate: wherein R1 and R2 are each independently an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R3 is an alkyl group having 12 to 24 carbon atoms, R4 and R5 are each independently an alkyl group having 1 to 6 carbon atoms, X is a halogen atom, m is an integer of 4 to 20, and n is an integer of 1 to 3.

    AQUEOUS SOLUTION COMPOSITION CONTAINING ORGANOSILICON COMPOUNDS
    2.
    发明申请
    AQUEOUS SOLUTION COMPOSITION CONTAINING ORGANOSILICON COMPOUNDS 有权

    公开(公告)号：US20230021428A1

    公开(公告)日：2023-01-26

    申请号：US17849234

    申请日：2022-06-24

    申请人： Shin-Etsu Chemical Co., Ltd.

    发明人： Munenao HIROKAMI ,  Tetsuro YAMADA ,  Kazuhiro TSUCHIDA

    IPC分类号： C07F7/08 ,  D06M13/513 ,  C07F7/18

    摘要： An aqueous solution composition containing a co-hydrolysate or a co-hydrolytic condensate of an organosilicon compound of formula (1) and an organosilicon compound of formula (2), or both the co-hydrolysate and the co-hydrolytic condensate: wherein R1 and R2 are each independently an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 10 carbon atoms, R3 is an alkyl group having 12 to 24 carbon atoms, R4 and R5 are each independently an alkyl group having 1 to 6 carbon atoms, X is a halogen atom, m is an integer of 1 to 20, and n is an integer of 1 to 3.

    ORGANOSILICON COMPOUND AND PRODUCTION PROCESS THEREFOR
    4.
    发明申请
    ORGANOSILICON COMPOUND AND PRODUCTION PROCESS THEREFOR 审中-公开

    公开(公告)号：US20190031690A1

    公开(公告)日：2019-01-31

    申请号：US16081175

    申请日：2017-01-30

    申请人： SHIN-ETSU CHEMICAL CO., LTD.

    发明人： Tetsuro YAMADA ,  Munenao HIROKAMI

    IPC分类号： C07F7/18 ,  C09D183/12 ,  C09J183/12

    摘要： An organosilicon compound represented by formula (1), which has, per alkoxysilyl group, a plurality of epoxy groups each capable of reacting with an organic resin moiety to form a bond and which hence is useful as a primer, a resin modifier, etc. (In the formula, the R1 moieties each independently represent an (un)substituted C1-10 alkyl group, etc.; the R2 moieties each independently represent an (un)substituted C1-10 alkyl group, etc.; the R3 moieties each independently represent a hydrogen atom or a methyl group; A1 represents a single bond, O, S, NH, or a divalent linking group containing a heteroatom; A2 represents a single bond or an (un)substituted C1-20 divalent hydrocarbon group optionally containing a heteroatom; a and c are each independently a number greater than 0; b, d, e, and f are each independently a number of 0 or greater; and m is an integer of 1 to 3. The repeating units may have been linked in any order.)

    BILE ACID ADSORBING AGENT COMPOSED OF IMIDAZOLE SILANE-TREATED SILICA
    10.
    发明公开
    BILE ACID ADSORBING AGENT COMPOSED OF IMIDAZOLE SILANE-TREATED SILICA 审中-公开

    公开(公告)号：US20230380464A1

    公开(公告)日：2023-11-30

    申请号：US18032489

    申请日：2021-09-27

    申请人： SHIN-ETSU CHEMICAL CO., LTD. ,  TOHOKU UNIVERSITY

    发明人： Shigeki YASUDA ,  Tsuneo KIMURA ,  Munenao HIROKAMI ,  Masaki TANAKA ,  Naoki TANAKA

    IPC分类号： A23L29/00 ,  A23L5/00 ,  A23L33/00

    CPC分类号： A23L29/045 ,  A23L5/00 ,  A23L33/30

    摘要： This bile acid adsorbing agent composed of silica particles, to which an organosilicon compound represented by general formula (1) is bonded, has the advantage that water-absorption swelling does not occur.
    (In formula (1), R1, R2, and R3 each independently represent a hydrogen atom, a C1-C20 alkyl group, a vinyl group, a phenyl group, or a benzyl group, and R4 represents a group represented by general formula (2), provided that R1 and R3 may be bonded to each other to form a benzene ring.)
    (In formula (2), A represents a linear or branched divalent linking group which may contain a heteroatom, a urethane bond, a urea bond, a thiourethane bond, and/or a thiourea bond, R5,s each independently represent a C1-C10 alkyl group or a C6-C10 aryl group, R6,s each independently represent a C1-C10 alkyl group or a C6-C10 aryl group, and n represents an integer of 1-3.)