公开(公告)号：US06455214B1

公开(公告)日：2002-09-24

申请号：US09523293

申请日：2000-03-10

申请人： Shinji Wakamoto ,  Yuji Imai ,  Masayoshi Yamazaki ,  Osamu Furukawa

发明人： Shinji Wakamoto ,  Yuji Imai ,  Masayoshi Yamazaki ,  Osamu Furukawa

IPC分类号： G03F900

CPC分类号： G03F9/7026 ,  G03F7/70358 ,  G03F9/7003

摘要： The present invention relates, to an exposure method, exposure apparatus, and the like having a configuration for effectively preventing color inconsistencies from occurring due to defocusing upon scanning exposure. In particular, the exposure method and apparatus according to the present invention control the scanning exposure according to the positional relationship between a substrate and a detection area for detecting a focus state of the substrate, the positional relationship between individual shot areas on the substrate the positional relationship between a shot area on the substrate and an edge of the substrate, or the like.

摘要翻译： 本发明涉及曝光方法，曝光装置等，其具有有效地防止因扫描曝光引起的散焦而发生颜色不一致的结构。 具体而言，根据本发明的曝光方法和装置根据基板和用于检测基板的聚焦状态的检测区域之间的位置关系，基板上的各个照射区域之间的位置关系， 基板上的照射区域和基板的边缘之间的位置关系等。

公开(公告)号：US5473166A

公开(公告)日：1995-12-05

申请号：US330826

申请日：1994-10-27

申请人： Yuji Imai ,  Shinji Wakamoto

发明人： Yuji Imai ,  Shinji Wakamoto

IPC分类号： G01B11/26 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01N21/86

CPC分类号： G03F9/70

摘要： An inclination detecting device has a light emitting system for emitting a parallel light flux to a substrate; a light receiving system for condensing the light reflected from the substrate, detecting the reflected light photoelectrically and outputting a photoelectric signal in accordance with the intensity of the reflected light; a stop member for changing at least one of the shape and the size of an illumination area of the parallel light flux on the substrate; an adjusting unit for changing the intensity of the photoelectric signal in accordance with the change of at least one of the shape and the size of the illumination area defined by the stop member; and a unit for detecting an inclination of the substrate with respect to a predetermined reference plane based on the photoelectric signal from the light receiving system.

摘要翻译： 倾斜检测装置具有用于向基板发射平行光通量的发光系统; 光接收系统，用于会聚从基板反射的光，根据反射光的强度检测反射光并输出光电信号; 用于改变所述基板上的平行光束的照明区域的形状和尺寸中的至少一个的停止构件; 调整单元，用于根据由停止构件限定的照明区域的形状和尺寸中的至少一个的变化来改变光电信号的强度; 以及用于基于来自光接收系统的光电信号来检测基板相对于预定参考平面的倾斜度的单元。

公开(公告)号：US5510892A

公开(公告)日：1996-04-23

申请号：US158060

申请日：1993-11-24

申请人： Hideo Mizutani ,  Kesayoshi Amano ,  Shinji Wakamoto ,  Yuji Imai

发明人： Hideo Mizutani ,  Kesayoshi Amano ,  Shinji Wakamoto ,  Yuji Imai

IPC分类号： G01B11/26 ,  G03F7/20 ,  G03F9/00 ,  G01B11/14 ,  G01N21/00

CPC分类号： G03F7/70583 ,  G01B11/26 ,  G03F7/70125 ,  G03F9/70

摘要： An inclination detecting apparatus is for detecting an inclination of a front surface of a transparent wafer placed on a perpendicular to an optical axis of a projection objective in an exposure apparatus. The inclination detecting apparatus includes an illumination optical system and a condenser optical system. The illumination optical system obliquely supplies a collimated beam onto the front surface of the wafer. The condenser optical system can condense the collimated beam supplied from the illumination optical system and reflected by the wafer, and it has a quartered photodetector for receiving the reflected beam and generating a position signal corresponding to a light receiving position. The apparatus further includes a first slit plate and a second slit plate located in the illumination optical system and the condenser optical system respectively. Each of the slit plate has a plurality of slits which are arranged such that light shield portions between slits of the second slit plate can cut off the collimated beam reflected by the back surface of the wafer.

摘要翻译： 倾斜检测装置用于检测在曝光装置中与投影物镜的光轴垂直的透明晶片的前表面的倾斜度。 倾斜检测装置包括照明光学系统和聚光镜系统。 照明光学系统将准直光束倾斜地提供到晶片的前表面上。 聚光镜系统可以冷凝从照明光学系统提供并被晶片反射的准直光束，并且其具有用于接收反射光束并产生对应于光接收位置的位置信号的四分之一光电检测器。 该装置还包括分别位于照明光学系统和聚光镜系统中的第一狭缝板和第二狭缝板。 每个狭缝板具有多个狭缝，其布置成使得第二狭缝板的狭缝之间的遮光部分可以切断由晶片的背面反射的准直光束。

公开(公告)号：US5461237A

公开(公告)日：1995-10-24

申请号：US280535

申请日：1994-07-26

申请人： Shinji Wakamoto ,  Yuji Imai ,  Yasuaki Tanaka

发明人： Shinji Wakamoto ,  Yuji Imai ,  Yasuaki Tanaka

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  G01N21/86

CPC分类号： G03F9/7026 ,  G03F7/707 ,  G03F7/70716 ,  G03F9/7003 ,  G03F9/7011 ,  G03F9/7034

摘要： In an apparatus which positions an average plane thereof parallel to a best focus plane of a projection optical system even if there is unevenness on a wafer, a leveling stage is tilted on the basis of detection signal from an auto-leveling system and a surface of a shot area on a wafer is positioned in a predetermined tilt position relative to a focus plane of the projection optical system. While such a position being kept unchanged, a deviation between the focus plane of the projection optical system and the surface of the shot area is detected at each of multi-points. Within the shot area, by the use of auto-focus system, an amount of relative tilt between an average plane of the shot area obtained from plural deviations and the focus plane of the projection optical system is calculated, and by the use of thus calculated amount of tilt and the detection signal of auto-leveling system, the focus plane of the projection optical system is positioned in parallel with the average plane of the shot area.

摘要翻译： 即使在晶片上存在不均匀性的情况下，平均平面平行于投影光学系统的最佳聚焦平面的装置中，也可以根据来自自动调平系统的检测信号和 晶片上的照射区域相对于投影光学系统的聚焦平面定位在预定的倾斜位置。 当这样的位置保持不变时，在多点处检测出投影光学系统的聚焦平面与拍摄区域的表面之间的偏差。 在拍摄区域内，通过使用自动对焦系统，计算从多个偏差获得的拍摄区域的平均平面与投影光学系统的对焦面之间的相对倾斜量，并且通过使用这样计算 自动调平系统的倾斜量和检测信号，投影光学系统的聚焦平面与拍摄区域的平均平面平行。

公开(公告)号：US5635722A

公开(公告)日：1997-06-03

申请号：US521415

申请日：1995-08-30

申请人： Shinji Wakamoto ,  Yuji Imai

发明人： Shinji Wakamoto ,  Yuji Imai

IPC分类号： G03F7/207 ,  G03F9/00 ,  G01N21/86

CPC分类号： G03F9/7026 ,  G03F9/7015

摘要： A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate, a stage, for holding the photosensitive substrate, movable in an optical-axis direction of the projection optical system and in a direction perpendicular to the optical axis, a position detection system for outputting a detection signal corresponding to a deviation of the projection optical system in the optical-axis direction between an imaging plane of the projection optical system and the surface of the photosensitive substrate by projecting a beam of light assuming a predetermined shape on the photosensitive substrate and, at the same time, photoelectrically detecting the reflected light from the photosensitive substrate, a fiducial member provided on the stage and having a fiducial pattern assuming a predetermined shape, and a device for detecting an irradiation position of the light beam within a plane perpendicular to the optical axis of the projection optical system on the basis of variations in intensity of a detection signal outputted from the position detection system when the fiducial pattern and the light beam are relatively moved in the predetermined direction perpendicular to the optical axis of the projection optical system.

摘要翻译： 投影曝光装置包括：投影光学系统，用于将感光基板上的掩模图案投影;用于保持感光基板的平台，该投影光学系统可在投影光学系统的光轴方向上沿垂直于光学方向的方向移动 轴位置检测系统，用于通过投射光束来输出与投影光学系统在投影光学系统的成像平面和感光基板的表面之间的光轴方向上的偏差相对应的检测信号， 并且同时对来自感光基片的反射光进行光电检测，设置在舞台上的具有假定为预定形状的基准图案的基准部件，以及用于检测感光基片的照射位置的装置 光束垂直于专业光轴的平面内 基于当基准图案和光束在垂直于投影光学系统的光轴的预定方向上相对移动时从位置检测系统输出的检测信号的强度变化的基础光学系统。

公开(公告)号：USRE37359E1

公开(公告)日：2001-09-11

申请号：US09326220

申请日：1999-06-03

申请人： Shinji Wakamoto ,  Yuji Imai

发明人： Shinji Wakamoto ,  Yuji Imai

IPC分类号： G01N2186

CPC分类号： G03F9/7026 ,  G03F9/7015

摘要： A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate, a stage, for holding the photosensitive substrate, movable in an optical-axis direction of the projection optical system and in a direction perpendicular to the optical axis, a position detection system for outputting a detection signal corresponding to a deviation of the projection optical system in the optical-axis direction between an imaging plane of the projection optical system and the surface of the photosensitive substrate by projecting a beam of light assuming a predetermined shape on the photosensitive substrate and, at the same time, photoelectrically detecting the reflected light from the photosensitive substrate, a fiducial member provided on the stage and having a fiducial pattern assuming a predetermined shape, and a device for detecting an irradiation position of the light beam within a plane perpendicular to the optical axis of the projection optical system on the basis of variations in intensity of a detection signal outputted from the position detection system when the fiducial pattern and the light beam are relatively moved in the predetermined direction perpendicular to the optical axis of the projection optical system.

摘要翻译： 投影曝光装置包括：投影光学系统，用于将感光基板上的掩模图案投影;用于保持感光基板的平台，该投影光学系统可在投影光学系统的光轴方向上沿垂直于光学方向的方向移动 轴位置检测系统，用于通过投射光束来输出与投影光学系统在投影光学系统的成像平面和感光基板的表面之间的光轴方向上的偏差相对应的检测信号， 并且同时对来自感光基片的反射光进行光电检测，设置在舞台上的具有假定为预定形状的基准图案的基准部件，以及用于检测感光基片的照射位置的装置 光束垂直于专业光轴的平面内 基于当基准图案和光束在垂直于投影光学系统的光轴的预定方向上相对移动时从位置检测系统输出的检测信号的强度变化的基础光学系统。

公开(公告)号：US06277533B1

公开(公告)日：2001-08-21

申请号：US09599493

申请日：2000-06-22

申请人： Shinji Wakamoto ,  Yuji Imai ,  Kazuaki Suzuki

发明人： Shinji Wakamoto ,  Yuji Imai ,  Kazuaki Suzuki

IPC分类号： G03F900

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7088

摘要： In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, S1-S4, S5, S23, S28, S29-S32 on the peripheral region of the wafer 15, the exposure is performed by scanning the wafer 15 so that a slit-like exposure region 16 moves relatively from the inside to the outside of the wafer 15; or, (2) when the absolute value of the difference between the focus position at the read-ahead region 135 and the focus position of an imaging plane 139 in the exposure region exceeds an allowable value, the height of the wafer 15 is fixed at the height set until then while ignoring the read-ahead data.

摘要翻译： 在通过扫描曝光系统进行曝光时，当在向前扫描的情况下将掩模版的图案暴露在晶片上的拍摄区域上以在曝光区域16,116之前的预读区域相对于扫描方向检测对焦位置时， 1），晶片15的周边区域的拍摄区域S10，S1-S4，S5，S23，S28，S29-S32中的每一个，通过扫描晶片15进行曝光，使得狭缝状曝光区域16移动 相对地从晶片15的内部到外部; 或者，（2）当曝光区域中的预读区域135的焦点位置和成像面139的焦点位置之间的差的绝对值超过允许值时，晶片15的高度被固定在 高度设置到此为止，同时忽略预读数据。

公开(公告)号：US6118515A

公开(公告)日：2000-09-12

申请号：US647325

申请日：1996-05-09

申请人： Shinji Wakamoto ,  Yuji Imai ,  Kazuaki Suzuki

发明人： Shinji Wakamoto ,  Yuji Imai ,  Kazuaki Suzuki

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  G03B27/42

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7088

摘要： In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, S1-S4, S5, S23, S28, S29-S32 on the peripheral region of the wafer 15, the exposure is performed by scanning the wafer 15 so that a slit-like exposure region 16 moves relatively from the inside to the outside of the wafer 15; or, (2) when the absolute value of the difference between the focus position at the read-ahead region 135 and the focus position of an imaging plane 139 in the exposure region exceeds an allowable value, the height of the wafer 15 is fixed at the height set until then while ignoring the read-ahead data.

摘要翻译： 在通过扫描曝光系统进行曝光时，当在向前扫描的情况下将掩模版的图案暴露在晶片上的拍摄区域上以在曝光区域16,116之前的预读区域相对于扫描方向检测对焦位置时， 1），晶片15的周边区域的拍摄区域S10，S1-S4，S5，S23，S28，S29-S32中的每一个，通过扫描晶片15进行曝光，使得狭缝状曝光区域16移动 相对地从晶片15的内部到外部; 或者，（2）当曝光区域中的预读区域135的焦点位置和成像面139的焦点位置之间的差的绝对值超过允许值时，晶片15的高度被固定在 高度设置到此为止，同时忽略预读数据。

公开(公告)号：US5502311A

公开(公告)日：1996-03-26

申请号：US421026

申请日：1995-04-13

申请人： Yuji Imai ,  Yasuaki Tanaka ,  Shinji Wakamoto

发明人： Yuji Imai ,  Yasuaki Tanaka ,  Shinji Wakamoto

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  G01N2/86

CPC分类号： G03F9/7026 ,  G03F7/70858 ,  G03F7/70883 ,  G03F9/7034

摘要： A plane positioning apparatus comprises a projector for projecting beams to a given portion on the surface of a substrate in a diagonal direction, a light receiving device to receive beams reflected from the substrate surface and output photoelectric signals in accordance with variation of the light receiving position, a calculating circuit to output deviation signals in accordance with the deviation amount of the substrate surface with respect to a predetermined fiducial plane based on the deviation signals, a substrate shifting device to shift and set the substrate at a given position in a direction perpendicular to the fiducial plane in accordance with the deviation signals, a level variation detecting device to detect level variation of the deviation signals generated when the substrate surface and the fiducial plane are displaced interrelatedly, an inclination calculating device to calculate, in accordance with the level variation characteristics, the value of the inclination of the level variation characteristics at a point where the substrate surface and the fiducial plane are substantially matched, and a correction device to correct the allowable range set for the level variation characteristics in order to control the substrate shifting device in accordance with the difference between the inclination value and the fiducial value thus calculated.

摘要翻译： 平面定位装置包括投影仪，用于将光束投影到对角线方向上的基板表面上的给定部分;光接收装置，用于接收从基板表面反射的光束，并根据光接收位置的变化输出光电信号 基于所述偏差信号，根据所述基板表面相对于预定基准面的偏移量输出偏差信号的计算电路;基板移位装置，用于将基板沿垂直于所述基板的方向移位并设定在给定位置 根据偏差信号的基准平面;电平变化检测装置，用于检测当基板表面和基准面相互偏移时产生的偏差信号的电平变化;倾斜计算装置，用于根据电平变化特性 ，t的倾斜度值 在基板表面和基准面基本匹配的点处的电平变化特性，以及校正装置，用于校正为电平变化特性设定的允许范围，以便根据倾斜度之间的差异来控制衬底移位装置 值和由此计算的基准值。

公开(公告)号：US5985495A

公开(公告)日：1999-11-16

申请号：US824219

申请日：1997-03-25

申请人： Masahiko Okumura ,  Shinji Wakamoto

发明人： Masahiko Okumura ,  Shinji Wakamoto

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00

CPC分类号： G03F7/706 ,  G03F7/2002 ,  G03F7/70641 ,  G03F7/70691

摘要： Methods and apparatus are disclosed for exposing a reticle pattern onto a sensitive substrate (such as a sensitized semiconductor wafer) by projection-exposure at high focusing precision. According to the method, multiple evaluation marks are projected onto an area of the surface to form images of the evaluation marks. An image of a measurement mark is projected on or near at least some of the evaluation marks. Respective Z-direction displacements of each evaluation mark relative to a reference plane are detected by detecting a characteristic of the respective measurement mark that varies with a change in position of the measurement mark relative to the respective evaluation mark. Based on such measurements, an axial relationship of the projection-optical system relative to the substrate can be changed to place the substrate at a best-focus position before exposing the substrate with a reticle pattern. Associated apparatus are also disclosed.

摘要翻译： 公开了通过高聚焦精度的投影曝光将掩模版图案曝光到敏感基板（例如敏化半导体晶片）上的方法和装置。 根据该方法，将多个评价标记投影到表面的区域上以形成评价标记的图像。 测量标记的图像被投影在评估标记的至少一些上或附近。 通过检测随着测量标记相对于各个评估标记的位置变化而变化的各个测量标记的特性来检测每个评估标记相对于参考平面的Z方向位移。 基于这样的测量，可以改变投影光学系统相对于衬底的轴向关系，以便在用掩模版图案曝光衬底之前将衬底置于最佳聚焦位置。 还公开了相关装置。