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    Presensitized plate for preparing lithographic printing plate
    3.
    发明授权
    Presensitized plate for preparing lithographic printing plate 失效
    用于制备平版印刷版的预感板

    公开(公告)号：US06709800B2

    公开(公告)日：2004-03-23

    申请号：US10211372

    申请日：2002-08-05

    申请人： Kazuo Fujita ,  Shiro Tan

    发明人： Kazuo Fujita ,  Shiro Tan

    IPC分类号： G03F7033

    CPC分类号： G03F7/0382 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/033 ,  G03F7/038 ,  Y10S430/108 ,  Y10S430/111

    摘要： A presensitized plate for preparing a lithographic printing plate comprises a substrate provided thereon with a light-sensitive layer containing a fluoro-aliphatic group-containing copolymer prepared by copolymerizing at least (A) an addition polymerizable monomer having, on a side chain, a fluoro-aliphatic group in which hydrogen atoms are replaced with fluorine atoms and (B) a (meth)acrylate having an ester chain represented by a specific general formula. The use of the foregoing specific fluorine atom-containing polymer permits the formation of a light-sensitive layer having uniform surface condition without causing abnormality in the surface quality due to the foaming phenomenon observed during the production and also permits the production of a positive light-sensitive resin composition having excellent solubility and dispersibility in a developer.

    摘要翻译： 用于制备平版印刷版的预感板包括其上设置有含有含氟 - 脂族基团的共聚物的感光层，所述光敏层通过至少共聚（A）在侧链上具有氟 - 脂族基团，其中氢原子被氟原子取代，和（B）具有由特定通式表示的酯链的（甲基）丙烯酸酯。 使用上述特定含氟原子的聚合物可以形成具有均匀表面状态的感光层，而不会由于在生产过程中观察到的发泡现象而引起表面质量的异常，并且还允许生产正光发射层， 敏感性树脂组合物在显影剂中具有优异的溶解性和分散性。

    Fluoroaliphatic group-containing copolymer
    4.
    发明授权
    Fluoroaliphatic group-containing copolymer 有权
    含氟脂族基团的共聚物

    公开(公告)号：US07105270B2

    公开(公告)日：2006-09-12

    申请号：US10353025

    申请日：2003-01-29

    申请人： Kazuo Fujita ,  Shiro Tan

    发明人： Kazuo Fujita ,  Shiro Tan

    IPC分类号： G03F7/004 ,  G03F7/00

    CPC分类号： C08F220/22 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/033 ,  G03F7/038

    摘要： The present invention provides a copolymer comprising repeating units derived from (A) at least one fluoroalkyl (meth) acrylate represented by the following general formula (I) or (II): wherein, X1 represents —O— or —NR3—; R1 represents —H or —CH3; R3 represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 12 carbon atoms or a substituted or unsubstituted aralkyl group having 7 to 24 carbon atoms; R2 represents H or F; m is an integer ranging from 0 to 10; n is an integer of 2 or 3; and o and p each represents an integer of 1 or 2, and (B) at least one polyoxyalkylene group-containing ethylenically unsaturated monomer, and also provides an image-forming composition, a presensitized plate useful for preparing a lithographic printing plate, a paint composition or a photo resist composition comprising the copolymer. The fluoroaliphatic group-containing copolymer can provide a coating composition capable of simultaneously satisfying the requirements for the ability of a coating liquid to wet the base material and the uniform coating ability upon the application of the liquid and the post-processing aptitudes such as the re-coating ability of the coated film and developing ability as well as the foaming ability of the coating liquid.

    摘要翻译： 本发明提供了包含衍生自（A）至少一种由以下通式（I）或（II）表示的（甲基）丙烯酸氟烷基酯的重复单元的共聚物的共聚物：其中，X 1表示-O - 或-NR 3 - 。 R 1表示-H或-CH 3 3; R 3表示氢原子，取代或未取代的碳原子数1〜12的烷基，取代或未取代的碳原子数3〜12的环烷基，取代或未取代的芳基，6〜12 碳原子或取代或未取代的碳原子数为7〜24的芳烷基; R 2表示H或F; m为0〜10的整数; n为2或3的整数; 和o和p各自表示1或2的整数，和（B）至少一个含聚氧化烯基的烯属不饱和单体，并且还提供成像组合物，用于制备平版印刷版的预敏化板，涂料 组合物或包含该共聚物的光致抗蚀剂组合物。 含氟脂族基团的共聚物可以提供能够同时满足涂布液润湿基材的能力要求的涂料组合物和在施加液体时的均匀涂布能力以及后处理能力如再次 涂膜的涂布能力和显影能力以及涂布液的发泡能力。

    Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
    5.
    发明授权
    Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound 有权
    包含乙烯基共聚物和邻萘醌二叠氮化合物的感光组合物

    公开(公告)号：US06660445B2

    公开(公告)日：2003-12-09

    申请号：US09970988

    申请日：2001-10-05

    申请人： Kazuo Fujita ,  Shiro Tan

    发明人： Kazuo Fujita ,  Shiro Tan

    IPC分类号： G03F7023

    CPC分类号： G03F7/0233

    摘要： The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.

    摘要翻译： 本发明涉及包含不溶于水并可溶于碱性水溶液和邻萘醌二叠氮化合物的乙烯基聚合物化合物的光敏化合物，其中所述乙烯基聚合物化合物是包含至少一种衍生自单体化合物的单体单元的共聚物（ A）：具有本说明书中定义的通式（I），（II）或（III）表示的碱溶性基团的化合物和至少一种衍生自单体化合物（B）的单体单元：（甲基）丙烯酸酯 具有聚（氧化烯）链。 由具有本发明的感光性化合物的感光层的预感板制备的平版印刷版显示耐磨性，印刷耐久性，耐化学性，显影宽容性和污染性的提高。

    Positive-working presensitized plate useful for preparing a lithographic printing plate
    6.
    发明授权
    Positive-working presensitized plate useful for preparing a lithographic printing plate 失效
    用于制备平版印刷版的正性工作预敏板

    公开(公告)号：US06517987B2

    公开(公告)日：2003-02-11

    申请号：US09811425

    申请日：2001-03-20

    申请人： Kazuo Fujita ,  Shiro Tan ,  Akira Nagashima

    发明人： Kazuo Fujita ,  Shiro Tan ,  Akira Nagashima

    IPC分类号： G03F7023

    CPC分类号： G03F7/022 ,  G03F7/023 ,  G03F7/0233

    摘要： The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at least one ester of 1,2-naphthoquinone-2-diazide-5-sulfonic acid, at least one ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid, and at least one polymer which is insoluble in water and soluble in an aqueous alkaline solution and which comprises at least one group or bond selected from sulfonamide group, urea bond or urethane bond. A lithographic printing plate prepared from the presensitized plate of the present invention shows improvement of chemical-resistance and printing durability, and good sensitivity, coupling property, adaptability to ball-point pen, shelf stability, and stability of sensitivity with time after exposure.

    摘要翻译： 本发明涉及一种用于制备平版印刷版的正极工作预敏板，其包含正性光敏组合物，其包含至少一种1,2-萘醌-2-重氮化物-5-磺酸酯，至少一种酯 的1,2-萘醌-2-二叠氮-4-磺酸，以及至少一种不溶于水并可溶于碱性水溶液的聚合物，其包含至少一个选自磺酰胺基，脲键或 氨基甲酸酯键。 由本发明的预敏板制备的平版印刷版显示出耐化学性和印刷耐久性的改善，以及良好的灵敏度，偶联性，圆珠笔的适应性，储存稳定性以及曝光后随时间的灵敏度的稳定性。

    Positive working photosensitive composition
    8.
    发明授权
    Positive working photosensitive composition 失效
    正光敏组合物

    公开(公告)号：US06416925B1

    公开(公告)日：2002-07-09

    申请号：US09497281

    申请日：2000-02-02

    申请人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

    发明人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

    IPC分类号： G03C173

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

    摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

    摘要翻译： 适用于使用波长为250nm或更短，特别是220nm或更短的光源的曝光的正性工作光敏组合物; 包括（A）能够在光化射线或辐射照射时能够产生酸的化合物和（B）包含具有特定结构的脂环族基团的重复单元的树脂，包括金刚烷基，并且具有能够由于作用而分解的基团 的酸以增加在碱性显影剂中的溶解度。

    Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers
    9.
    发明授权
    Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers 失效
    包含由四种酚类单体制成的碱溶性酚醛清漆树脂的正性光致抗蚀剂组合物

    公开(公告)号：US5674657A

    公开(公告)日：1997-10-07

    申请号：US743592

    申请日：1996-11-04

    申请人： Shiro Tan ,  Yasumasa Kawabe ,  Kenji Honda

    发明人： Shiro Tan ,  Yasumasa Kawabe ,  Kenji Honda

    IPC分类号： C08L61/06 ,  G03F7/022 ,  G03F7/023 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0236 ,  G03F7/022

    摘要： The invention is directed to an alkali-soluble novolak binder resin composition made by addition condensation reaction of a phenolic mixture with at least one aldehyde source, the feedstock of said phenolic mixture for the reaction comprising about 33 to about 83 mole percent of meta-cresol; about 1 to about 4 mole percent of para-cresol; about 10 to about 60 mole percent of a phenolic monomer selected from the group consisting of 2,3-xylenol, 3,4-xylenol, 3,5-xylenol and mixtures thereof; and about 5 to about 55 mole percent of a methoxy phenol monomer, the amount of aldehyde source being from about 40 to about 200 percent of the stoichiometric amount needed to react with all of the phenolic moieties in said phenolic mixture, and the alkali-soluble novolak binder resin having a weight average molecular weight (M.sub.w) of about 3,000 to about 20,000 with a molecular weight polydispersity (M.sub.w /M.sub.n) of 1.5-4.0. The invention is also directed to a positive working photoresist made from the composition.

    摘要翻译： 本发明涉及通过酚类混合物与至少一种醛源的加成缩合反应制备的碱溶性酚醛清漆粘合剂树脂组合物，所述用于反应的酚类混合物的原料包含约33-约83摩尔％的间甲酚 ; 约1至约4摩尔％的对 - 甲酚; 约10至约60摩尔％的选自2,3-二甲苯酚，3,4-二甲苯酚，3,5-二甲苯酚及其混合物的酚单体; 和约5至约55摩尔％的甲氧基酚单体，醛源的量为所述酚类混合物中所有酚部分反应所需化学计量的约40至约200％，碱溶性 酚醛清漆粘合剂树脂，重均分子量（Mw）约为3,000至约20,000，分子量多分散性（Mw / Mn）为1.5-4.0。 本发明还涉及由该组合物制成的正性工作光致抗蚀剂。