公开(公告)号：US06534380B1

公开(公告)日：2003-03-18

申请号：US09116956

申请日：1998-07-17

申请人： Shoichi Yamauchi ,  Hisayoshi Ohshima ,  Masaki Matsui ,  Kunihiro Onoda ,  Tadao Ooka ,  Akitoshi Yamanaka ,  Toshifumi Izumi

发明人： Shoichi Yamauchi ,  Hisayoshi Ohshima ,  Masaki Matsui ,  Kunihiro Onoda ,  Tadao Ooka ,  Akitoshi Yamanaka ,  Toshifumi Izumi

IPC分类号： H01L2130

CPC分类号： H01L21/76254 ,  Y10S438/96

摘要： Before a semiconductor substrate and a base substrate is directly bonded to one another, in a protective film removing step, a contamination protective film formed on the semiconductor substrate to protect it from contamination during an ion implanting step is removed. Consequently, even when flatness of the contamination protective film is degraded during the ion implanting step or even when contaminants remain in a segregated state in the vicinity of the surface of the contamination protective film, the state of the bonding between the semiconductor substrate and the base substrate after the bonding step can be made uniform over the entire area of the bonding. As a result, a high-quality semiconductor substrate can be manufactured at low cost.

摘要翻译： 在半导体基板和基底基板彼此直接接合之前，在保护膜去除步骤中，去除了在离子注入步骤期间形成在半导体衬底上以防止其污染的污染保护膜。 因此，即使当在离子注入步骤期间污染保护膜的平坦度劣化时，或者甚至当污染保护膜表面附近的污染物保持分离状态时，半导体衬底和基底之间的接合状态 接合步骤之后的基板可以在结合的整个区域上均匀。 结果，可以以低成本制造高质量的半导体衬底。

公开(公告)号：US06191007B1

公开(公告)日：2001-02-20

申请号：US09066971

申请日：1998-04-28

申请人： Masaki Matsui ,  Shoichi Yamauchi ,  Hisayoshi Ohshima ,  Kunihiro Onoda ,  Akiyoshi Asai ,  Takanari Sasaya ,  Takeshi Enya ,  Jun Sakakibara

发明人： Masaki Matsui ,  Shoichi Yamauchi ,  Hisayoshi Ohshima ,  Kunihiro Onoda ,  Akiyoshi Asai ,  Takanari Sasaya ,  Takeshi Enya ,  Jun Sakakibara

IPC分类号： H01L21331

CPC分类号： H01L21/84 ,  H01L21/02667 ,  H01L21/2022 ,  H01L21/76243 ,  H01L21/76254 ,  H01L21/76264 ,  H01L21/76267 ,  H01L21/76275 ,  H01L21/76281 ,  H01L21/76283 ,  H01L2221/68363

摘要： Methods for manufacturing semiconductor substrates in which a semiconductor layer for forming semiconductor device therein is formed on a supporting substrate with an insulating film interposed between, with which in forming the semiconductor layer on a substrate on which a buried pattern structure has been formed it is possible to greatly increase the film thickness uniformity of the semiconductor layer and the film thickness controllability, particularly when the semiconductor layer is being formed as an extremely thin film. As a result, it is possible to achieve improved quality and characteristics of the semiconductor substrates and make possible the deployment of such semiconductor substrates to various uses.

摘要翻译： 制造半导体衬底的方法，其中半导体器件用于形成半导体器件的半导体层形成在支撑衬底上，绝缘膜介于其之间，在形成掩埋图案结构的衬底上形成半导体层是可能的 大大增加了半导体层的膜厚均匀性和膜厚可控性，特别是当半导体层被形成为极薄膜时。 结果，可以实现半导体衬底的改进的质量和特性，并且可以将这种半导体衬底部署到各种用途上。

公开(公告)号：US06251754B1

公开(公告)日：2001-06-26

申请号：US09074384

申请日：1998-05-08

申请人： Hisayoshi Ohshima ,  Masaki Matsui ,  Kunihiro Onoda ,  Shoichi Yamauchi

发明人： Hisayoshi Ohshima ,  Masaki Matsui ,  Kunihiro Onoda ,  Shoichi Yamauchi

IPC分类号： H01L2120

CPC分类号： H01L21/76254

摘要： The invention provides a number of semiconductor substrate manufacturing methods with which, in manufacturing a semiconductor substrate having a semiconductor layer in an insulated state on a supporting substrate, it is possible to obtain a thick semiconductor layer with a simple process and cheaply while reducing impurity contamination of the semiconductor layer to a minimum. One of these methods includes a defective layer forming step of carrying out ion implantation to a predetermined depth from the surface of a base substrate to partition off a monocrystalline thin film layer at the surface of the base substrate by a defective layer formed by implanted ions, a semiconductor film forming step of forming a monocrystalline semiconductor film of a predetermined thickness on the monocrystalline thin film layer, a laminating step of laminating the base substrate by the surface of the monocrystalline semiconductor film to the supporting substrate, and a detaching step of detaching the base substrate laminated to the supporting substrate at the defective layer.

摘要翻译： 本发明提供了许多半导体衬底制造方法，在制造具有在支撑衬底上具有绝缘状态的半导体层的半导体衬底的情况下，可以以简单的工艺获得厚半导体层并且在降低杂质污染的同时廉价 的半导体层。 这些方法之一包括从基底表面进行离子注入到预定深度的缺陷层形成步骤，以通过由注入离子形成的缺陷层在基底基板的表面分隔单晶薄膜层， 在单晶薄膜层上形成预定厚度的单晶半导体膜的半导体膜形成步骤，通过单晶半导体膜的表面将基底基板层压到支撑基板上的层压步骤，以及将基板 基底基板层叠到不良层的支撑基板。

公开(公告)号：US6060344A

公开(公告)日：2000-05-09

申请号：US136294

申请日：1998-08-19

申请人： Masaki Matsui ,  Masatake Nagaya ,  Hisayoshi Ohshima

发明人： Masaki Matsui ,  Masatake Nagaya ,  Hisayoshi Ohshima

IPC分类号： H01L21/02 ,  H01L21/76 ,  H01L21/762 ,  H01L27/12 ,  H02L21/20

CPC分类号： H01L21/76264 ,  H01L21/76297 ,  H01L21/76275 ,  H01L21/76286

摘要： In a method for producing a semiconductor substrate completed through a bonding process for joining a semiconductor wafer to a support substrate by performing heat treatment thereto in a state in which the semiconductor wafer is closely joined to the support substrate, the method according to the present invention includes the following steps, i.e., a depositing process for depositing a poly-crystal semiconductor which covers all areas of a surface to be bonded on the surface of the semiconductor wafer; a heat treatment process for performing the heat treatment to the semiconductor wafer provided after the depositing process, during a predetermined time under a temperature equal to or higher than the heat treatment temperature at the bonding process; and a polishing process for flattening the surface of the poly-crystal semiconductor provided after the heat treatment process. After the above processes were performed in order, the bonding process is performed after the polishing process.

摘要翻译： 在半导体基板的制造方法中，通过在将半导体晶片紧密接合到支撑基板的状态下对半导体晶片与支撑基板进行热处理的接合工序而完成，本发明的方法 包括以下步骤，即，用于沉积覆盖半导体晶片表面上要接合的表面的所有区域的多晶半导体的沉积工艺; 在接合工序的等于或高于所述热处理温度的温度下的预定时间内对所述沉积工艺之后提供的所述半导体晶片进行热处理的热处理工艺; 以及用于使在热处理工艺之后提供的多晶半导体的表面变平的抛光工艺。 在进行上述处理之后，在抛光处理之后进行接合处理。

公开(公告)号：US09010915B2

公开(公告)日：2015-04-21

申请号：US13588748

申请日：2012-08-17

申请人： Yuuma Usui ,  Takeo Tsukamoto ,  Aino Hasegawa ,  Hideomi Sakuma ,  Manabu Seo ,  Hiroyuki Yamashita ,  Ryota Suzuki ,  Hisayoshi Ohshima ,  Takahiko Matsumoto ,  Shigeo Takeuchi ,  Takeshi Hihara

发明人： Yuuma Usui ,  Takeo Tsukamoto ,  Aino Hasegawa ,  Hideomi Sakuma ,  Manabu Seo ,  Hiroyuki Yamashita ,  Ryota Suzuki ,  Hisayoshi Ohshima ,  Takahiko Matsumoto ,  Shigeo Takeuchi ,  Takeshi Hihara

IPC分类号： B41J2/175 ,  C09D11/38 ,  B41J2/21 ,  C09D11/102 ,  C08K5/00 ,  C08K5/098

CPC分类号： C09D11/38 ,  B41J2/175 ,  B41J2/2107 ,  C08K5/0041 ,  C08K5/098 ,  C09D11/102

摘要： Disclosed is an aqueous ink composition, including an aqueous solvent, a coloring agent dissolved or dispersed in the aqueous solvent, an ABA-type amphipathic polymer including a hydrophobic segment A and a hydrophilic segment B, and an anionic surfactant configured to dissolve or disperse the ABA-type amphipathic polymer in the aqueous solvent, wherein a viscosity of the aqueous ink composition is changed depending on a pH thereof.

摘要翻译： 公开了一种含水溶剂，溶解或分散在水性溶剂中的着色剂的水性油墨组合物，包含疏水性链段A和亲水性链段B的ABA型两亲性聚合物，以及配置成溶解或分散 ABA型两亲性聚合物在水性溶剂中，其中水性油墨组合物的粘度根据其pH而改变。

公开(公告)号：US08944556B2

公开(公告)日：2015-02-03

申请号：US13970091

申请日：2013-08-19

申请人： Takeshi Hihara ,  Yuuma Usui ,  Takeo Tsukamoto ,  Manabu Seo ,  Takahiko Matsumoto ,  Hiroyuki Yamashita ,  Hideomi Sakuma ,  Aino Hasegawa ,  Ryota Suzuki ,  Hisayoshi Ohshima ,  Shigeo Takeuchi ,  Mizuki Otagiri

发明人： Takeshi Hihara ,  Yuuma Usui ,  Takeo Tsukamoto ,  Manabu Seo ,  Takahiko Matsumoto ,  Hiroyuki Yamashita ,  Hideomi Sakuma ,  Aino Hasegawa ,  Ryota Suzuki ,  Hisayoshi Ohshima ,  Shigeo Takeuchi ,  Mizuki Otagiri

IPC分类号： B41J29/38 ,  B41J2/015 ,  B41J2/045 ,  B41J2/005 ,  B41M5/00 ,  B41J2/21 ,  B41J11/00

CPC分类号： B41J2/04553 ,  B41J2/0057 ,  B41J2/2114 ,  B41J11/0015 ,  B41M5/0017

摘要： Disclosed is an image forming apparatus including a head configured to discharge an aqueous recording liquid onto a recording medium; and a coating unit configured to apply a process liquid onto the recording medium, wherein the process liquid is formed by emulsifying, by a first surfactant, water including a water-soluble polymer and a low polarity solvent which is not compatible with the water, wherein the water and the low polarity solvent are emulsified as a W/O emulsion in which the water is in a dispersed phase and the low polarity solvent is in a continuous phase.

摘要翻译： 公开了一种图像形成装置，包括头部，其被配置为将水性记录液体排出到记录介质上; 以及涂布单元，被配置为将处理液体施加到记录介质上，其中所述处理液体通过第一表面活性剂乳化形成水，所述水包括水溶性聚合物和与水不相容的低极性溶剂，其中 水和低极性溶剂作为W / O乳液乳化，其中水处于分散相，低极性溶剂处于连续相。

公开(公告)号：US09102138B2

公开(公告)日：2015-08-11

申请号：US14349007

申请日：2012-11-01

申请人： Ryota Suzuki ,  Takeo Tsukamoto ,  Hisayoshi Ohshima ,  Aino Hasegawa ,  Hideomi Sakuma ,  Manabu Seo ,  Hiroyuki Yamashita ,  Yuuma Usui ,  Takahiko Matsumoto ,  Takeshi Hihara

发明人： Ryota Suzuki ,  Takeo Tsukamoto ,  Hisayoshi Ohshima ,  Aino Hasegawa ,  Hideomi Sakuma ,  Manabu Seo ,  Hiroyuki Yamashita ,  Yuuma Usui ,  Takahiko Matsumoto ,  Takeshi Hihara

IPC分类号： B41J2/005 ,  B41J2/175

CPC分类号： B41J2/0057 ,  B41J2/17509 ,  B41J2202/04

摘要： Using an intermediate transfer body onto which a conductive recording liquid containing water that is ejected by heads is provided; and a potential applying unit which applies a potential which can electrolyze the water within the conductive recording liquid which is ejected from the heads and which temporarily bridges between the heads and the intermediate transfer body, the potential applying unit applies a potential between the intermediate transfer body and electrodes which are in contact with the recording liquid in supplying units which supply the recording liquid to the heads.

摘要翻译： 使用中间转印体，其上设置有由头部喷射的水的导电性记录液体; 以及潜在施加单元，其施加电位从头部喷射的导电记录液体中的水电解并且临时桥接在头部和中间转印体之间的电位施加单元，在中间转印体之间施加电位 以及在向记录头供给记录液体的供给单元中与记录液接触的电极。

公开(公告)号：US08273275B2

公开(公告)日：2012-09-25

申请号：US12303873

申请日：2008-02-25

申请人： Hisayoshi Ohshima ,  Masaru Ohgaki ,  Toshihiro Kanematsu ,  Masahiro Masuzawa ,  Shinya Seno ,  Shinji Aoki

发明人： Hisayoshi Ohshima ,  Masaru Ohgaki ,  Toshihiro Kanematsu ,  Masahiro Masuzawa ,  Shinya Seno ,  Shinji Aoki

IPC分类号： B29C44/20

CPC分类号： G09F9/372 ,  G02F1/167 ,  G02F2001/1672

摘要： A disclosed method of manufacturing an image display element structure includes a coating step of coating a substrate surface including a plurality of recessed portions arranged at predetermined intervals, with a coating material that is plastic-deformable, in such a manner as to maintain spaces in the recessed portions; and an expanding step of forming gaps in the coating material coating the substrate surface by expanding gas in the spaces, wherein the gaps correspond to the recessed portions; and a peeling step of peeling off the coating material in which the gaps have been formed, from the substrate surface.

摘要翻译： 所公开的制造图像显示元件结构的方法包括以下步骤：涂覆步骤，该方法包括以包含可塑性变形的涂层材料以预定间隔布置的多个凹陷部分的基底表面， 凹陷部分 以及通过在空间中膨胀气体而在涂覆基材表面的涂料中形成间隙的扩展步骤，其中间隙对应于凹部; 以及从基板表面剥离已经形成有间隙的涂料的剥离步骤。

公开(公告)号：US08090305B2

公开(公告)日：2012-01-03

申请号：US12770145

申请日：2010-04-29

申请人： Toshiyuki Iseki ,  Hisayoshi Ohshima ,  Takahiko Matsumoto ,  Yukimichi Someya

发明人： Toshiyuki Iseki ,  Hisayoshi Ohshima ,  Takahiko Matsumoto ,  Yukimichi Someya

IPC分类号： G03G15/20

CPC分类号： G03G15/2096 ,  G03G15/2064

摘要： Disclosed is a fixing device including a liquid supply unit that supplies a liquid fixer containing a softening agent that dissolves or swells at least part of resin to soften the resin; an air supply unit that supplies air for foaming the liquid fixer; and a foam generation unit that mixes the liquid fixer from the liquid supply unit with the air from the air supply unit to generate foams. The foam generation unit has an air channel where the air from the air supply unit flows, a liquid-fixer channel provided such that the liquid fixer from the liquid supply unit flows from a direction opposite to a flowing direction of the air channel, and an air-and-liquid mixing part that mixes the air from the air channel with the liquid fixer from the liquid fixer channel so as to be opposite to each other, thereby generating a foam-like fixer.

摘要翻译： 公开了一种定影装置，其包括：液体供应单元，其供应含有溶解或溶胀至少部分树脂以软化树脂的软化剂的液体定影剂; 空气供应单元，其供应用于使液体定影剂发泡的空气; 以及泡沫产生单元，其将来自液体供应单元的液体定影剂与来自空气供应单元的空气混合以产生泡沫。 泡沫产生单元具有空气通道，空气供给单元的空气流动，液体定影通道设置成使得来自液体供应单元的液体定影剂从与空气通道的流动方向相反的方向流动， 空气和液体混合部分，其将来自空气通道的空气与液体定影剂从液体定影剂通道混合，以便彼此相对，从而产生泡沫状定影剂。

公开(公告)号：US20100188731A1

公开(公告)日：2010-07-29

申请号：US12376843

申请日：2008-03-05

申请人： Toshihiro Kanematsu ,  Masaru Ohgaki ,  Shinji Aoki ,  Hisayoshi Ohshima ,  Shinya Seno ,  Masahiro Masuzawa

发明人： Toshihiro Kanematsu ,  Masaru Ohgaki ,  Shinji Aoki ,  Hisayoshi Ohshima ,  Shinya Seno ,  Masahiro Masuzawa

IPC分类号： G02F1/167

CPC分类号： G02F1/167 ,  B29D11/00365 ,  G02F2001/1672

摘要： A display element includes a hollow structure. The hollow structure includes plural cells disposed in a plane, each having an opening in a first wall of the hollow structure, and a partition wall separating the adjacent cells. A solvent having one or more types of white particles and/or colored particles dispersed therein is disposed in the cells. The openings are sealed with a resin insoluble in the solvent. A thickness of the partition wall separating the adjacent cells is 0.01 μm or greater but not greater than 10 μm.

摘要翻译： 显示元件包括中空结构。 中空结构包括设置在平面中的多个单元，每个单元在中空结构的第一壁中具有开口，以及分隔相邻单元的分隔壁。 具有一种或多种类型的分散在其中的白色颗粒和/或着色颗粒的溶剂设置在单元中。 开口用不溶于溶剂的树脂密封。 分隔相邻电池的隔壁的厚度为0.01μm以上且10μm以下。