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    Positive resist laminate
    1.
    发明授权
    Positive resist laminate 有权
    正抗蚀层压板

    公开(公告)号：US06696219B2

    公开(公告)日：2004-02-24

    申请号：US09880030

    申请日：2001-06-14

    申请人： Shoichiro Yasunami ,  Kenichiro Sato

    发明人： Shoichiro Yasunami ,  Kenichiro Sato

    IPC分类号： G03F711

    CPC分类号： G03F7/0758 ,  G03F7/0045 ,  G03F7/094

    摘要： A positive resist laminate which comprises a substrate, a first resist layer and a second resist layer, wherein the first resist layer is to be a heat-hardening layer and comprises (a-1) a polymer containing an alicyclic skeleton in the side chain thereof, and the second resist layer comprises: (b) a polymer which contains a silicon atom in the side chain thereof and which is insoluble in water and becomes soluble in an aqueous alkali solution by the action of an acid; and (c) a compound which generates an acid upon irradiation with an actinic ray or radiation.

    摘要翻译： 一种正性抗蚀剂层叠体，其包含基材，第一抗蚀剂层和第二抗蚀剂层，其中所述第一抗蚀剂层为热硬化层，其包含（a-1）侧链中含有脂环族骨架的聚合物 第二抗蚀剂层包括：（b）在侧链中含有硅原子并且不溶于水并通过酸的作用而溶于碱性水溶液中的聚合物; 和（c）在用光化射线或辐射照射时产生酸的化合物。

    Positive-working photoresist composition
    2.
    发明授权
    Positive-working photoresist composition 失效
    正光刻胶组合物

    公开(公告)号：US06589705B1

    公开(公告)日：2003-07-08

    申请号：US09698190

    申请日：2000-10-30

    申请人： Kenichiro Sato ,  Kazuyoshi Mizutani ,  Shoichiro Yasunami

    发明人： Kenichiro Sato ,  Kazuyoshi Mizutani ,  Shoichiro Yasunami

    IPC分类号： G03C172

    CPC分类号： G03F7/0758 ,  G03F7/0045 ,  G03F7/0048

    摘要： A positive-working photoresist composition comprises (A) a resin comprising the specific repeating structural units which resin increases in its solubility in an alkaline developer when acted upon by an acid, (B′) an onium salt compound which generates an acid when irradiated with active ray or radiation and (C) at least one of fluorine-based and/or silicon-based surface active agent and nonionic surface active agent or a positive-working photoresist composition comprises (A) a resin comprising the specific repeating structural units which resin increases in its solubility in an alkaline developer when acted upon by an acid, (B) a compound which generates an acid when irradiated with active ray or radiation, and (D) a mixed solvent containing at least one propylene glycol monoalkyl ether carboxylate and at least one of solvents selected from the group consisting of propylene glycol monoalkyl ether, alkyl lactate and alkoxyalkyl propionate and solvents selected from the group consisting of &ggr;-butyrolactone, ethylene carbonate and propylene carbonate.

    摘要翻译： 正性光致抗蚀剂组合物包含（A）包含特定重复结构单元的树脂，当被酸作用时树脂在碱性显影剂中的溶解度增加，（B'）当照射时产生酸的鎓盐化合物 活性射线或辐射，和（C）氟基和/或硅基表面活性剂和非离子表面活性剂或正性光致抗蚀剂组合物中的至少一种包含（A）包含特定重复结构单元的树脂，该树脂 （B）当用活性射线或辐射照射时产生酸的化合物，和（D）含有至少一种丙二醇单烷基醚羧酸酯的混合溶剂，和 选自丙二醇单烷基醚，乳酸烷基酯和丙酸烷氧基烷基酯中的至少一种溶剂和选自以下的溶剂： 的γ-丁内酯，碳酸亚乙酯和碳酸亚丙酯。

    Positive resist composition and pattern-forming method using the same
    3.
    发明申请
    Positive resist composition and pattern-forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US20050064326A1

    公开(公告)日：2005-03-24

    申请号：US10941822

    申请日：2004-09-16

    申请人： Shoichiro Yasunami ,  Kenji Wada ,  Kunihiko Kodama ,  Kenichiro Sato

    发明人： Shoichiro Yasunami ,  Kenji Wada ,  Kunihiko Kodama ,  Kenichiro Sato

    IPC分类号： G03F7/004 ,  G03C1/76 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

    摘要： A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) upon irradiation with one of an actinic ray and a radiation; and (C1) at least one of an amine compound having at least an aliphatic hydroxyl group in a molecule and an amine compound having at least an ether bond in a molecule: A1A2—SO3H)n  (I) wherein A1 represents an n-valent linking group, A2 represents a single bond or a divalent aliphatic group, and A2's each may be the same or different, provided that at least one group represented by A1 or A2 contains a fluorine atom, and n represents an integer of from 2 to 4.

    摘要翻译： 正型抗蚀剂组合物包括：（A）能够通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在用光化学射线和辐射之一照射时能够产生由下式（I）表示的磺酸的化合物; 和（C1）分子中至少具有脂肪族羟基的胺化合物和分子中至少具有醚键的胺化合物中的至少一种：A1和Parenopenst; A2-SO3H）n（I）其中A1表示n 连接基团，A2表示单键或二价脂族基团，并且A2可以相同或不同，条件是由A1或A2表示的至少一个基团含有氟原子，n表示2的整数 到4。

    Positive resist composition and pattern-forming method using the same
    4.
    发明授权
    Positive resist composition and pattern-forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07351515B2

    公开(公告)日：2008-04-01

    申请号：US10941822

    申请日：2004-09-16

    申请人： Shoichiro Yasunami ,  Kenji Wada ,  Kunihiko Kodama ,  Kenichiro Sato

    发明人： Shoichiro Yasunami ,  Kenji Wada ,  Kunihiko Kodama ,  Kenichiro Sato

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

    摘要： A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) upon irradiation with one of an actinic ray and a radiation; and (C1) at least one of an amine compound having at least an aliphatic hydroxyl group in a molecule and an amine compound having at least an ether bond in a molecule: A1A2-SO3H)n   (I) wherein A1 represents an n-valent linking group, A2 represents a single bond or a divalent aliphatic group, and A2's each may be the same or different, provided that at least one group represented by A1 or A2 contains a fluorine atom, and n represents an integer of from 2 to 4.

    摘要翻译： 正型抗蚀剂组合物包括：（A）能够通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在用光化学射线和辐射之一照射时能够产生由下式（I）表示的磺酸的化合物; 和（C1）分子中至少具有脂肪族羟基的胺化合物和分子中具有至少一个醚键的胺化合物中的至少一种：＆lt;线内配方说明=“在线式” end =“lead”？> A 1 A 2 3 （I）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中A 1代表n价连接基团，A < SUB 2表示单键或二价脂族基团，并且A 2各自可以相同或不同，条件是至少一个由A 1表示的基团 或A 2 含有氟原子，n表示2〜4的整数。

    Oil Separator
    7.
    发明申请
    Oil Separator 审中-公开

    公开(公告)号：US20120037554A1

    公开(公告)日：2012-02-16

    申请号：US13263936

    申请日：2010-04-08

    申请人： Akira Sakano ,  Kenichiro Sato

    发明人： Akira Sakano ,  Kenichiro Sato

    IPC分类号： F25B43/02

    CPC分类号： B04C5/103 ,  F25B43/02 ,  F25B2400/02

    摘要： Provided is an oil separator which can separate refrigerant and refrigeration machine oil with high efficiency, which can effectively prevent the outflow of separated oil towards the refrigerant discharge path side, which can reduce pressure loss in the flow of refrigerant, and which can be made compact especially in the radial direction. The oil separator is provided with: a tubular outer pipe which is disposed on the compressor outlet side; an inlet pipe for introducing refrigerant containing refrigeration machine oil into the tubular outer pipe in such a manner as to produce a downward helical flow of refrigerant containing refrigeration machine oil along the inner surface of the tubular outer pipe; a refrigerant outlet pipe which has an external outflow port for the outflow of refrigerant to outside the tubular outer pipe, has a section extending in the axial direction of the tubular outer pipe at the central position of the tubular outer pipe, and allows the inflow, from the lower end of the above-mentioned section, of refrigerant separated from the refrigerant containing refrigeration machine oil having flowed down in the helical flow, and wherein the flow direction has been inverted in relation to the vertical direction at a first refrigerant inversion part; a refrigerant return pipe which extends in the axial direction of the tubular outer pipe at the central position of the tubular outer pipe, below the refrigerant outlet pipe, and which allows the inflow, from the lower end thereof, of refrigerant separated from the refrigerant containing refrigeration machine oil having flowed down in the helical flow, and wherein the flow direction has been inverted in relation to the vertical direction at a second refrigerant inversion part; and an oil storage part which is formed at the bottom of the tubular outer pipe. Furthermore, a part exhibiting a reflector function for preventing refrigeration machine oil stored in the oil storage part from flowing out into the refrigerant outlet pipe is provided between the refrigerant return pipe and the inner surface of the tubular outer pipe.

    Positive-working resist composition
    10.
    发明授权
    Positive-working resist composition 有权

    公开(公告)号：US06670095B2

    公开(公告)日：2003-12-30

    申请号：US10022363

    申请日：2001-12-20

    申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

    发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai

    IPC分类号： G03F7004

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.