摘要:
Cubic system boron nitride crystals are synthesized by using a synthesizing vessel separated into a plurality of synthesizing chambers by one or more partition layers. After preparing the synthesizing vessel it is heated under extra-high pressure to achieve a required temperature gradient from chamber to chamber. A plurality of solvents having different eutectic temperatures with respect to boron nitride (BN) sources are placed in the chambers according to the temperature gradient. The BN sources are placed in contact with solvent portions heated to relatively high temperatures. At least one seed crystal is placed in each solvent portion heated to relatively low temperatures. At least one cubic system boron nitride crystal is grown in each of the solvents in the chambers by the above heating of the synthesizing vessel under conditions of ultra-high pressure and temperatures assuring the required temperature gradient.
摘要:
A boron nitride system starts with an hBN material and yields a directly converted sintered cBN body having a high heat conductivity within the range of at least 4 W/cm..degree.C. to about 6.2 W/cm..degree.C. For this purpose the hBN starting material of the system has diffused therein an additive of an alkaline earth metal or alkali metal in an amount of from 0.6 mol % to 1.3 mol %. This starting material is directly converted into the cBN at a sintering temperature of at least 1350.degree. C. under a thermodynamically stabilized condition for the cBN, which contains cBN within the range of 99.9 to 99.3 wt. % of the sintered body and a metal remainder from the additive of the starting material within the range of 0.1 to 0.7 wt. % of the sintered body, except for minute naturally occurring components.
摘要:
A sintered compact of cubic boron nitride is made by adsorbing and/or diffusing 0.005 to 1.000 percent by weight of water into a boron nitride compact containing alkaline earth metal boron nitride as a catalyst. The so prepared compact is then subjected to a treatment under high pressure at a relatively low temperature to form a dense cubic boron nitride sintered compact of high purity.
摘要:
A high-temperature superconducting thin film of compound oxide selected from the group consisting of: Y.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Ho.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Lu.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Sm.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Nd.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Gd.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Eu.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Er.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Dy.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Tm.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, Yb.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, La.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-x, (La, Sr).sub.2 CuO.sub.4-x, which is deposited on a substrate of MgO or SrTiO.sub.3, with the outer surface of the high-temperature superconducting thin film being covered with a protective crystalline film of SrTiO.sub.3.
摘要:
An outer surface of a superconducting film of compound oxide such as YBa.sub.2 Cu.sub.3 O.sub.7-.delta. is protected with a protective layer which is composed of any one of (i) oxide of metal such as MgO, CaO, SrO etc, (ii) carbide such as SiC, or (iii) nitride such as BN.
摘要:
A semiconductor substrate such as silicon single crystal having a thin film of a superconducting material composed of a compound oxide whose critical temperature is higher than 30 K such as Ln.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-.delta. (Ln is Y or lanthanide), characterized in that a buffer layer composed of ZrO.sub.2, MgO containing or not containing metal element such as Ag is interposed between the semiconductor substrate and the superconducting thin film.
摘要:
A hole-burning material which comprises at least one hole which is formed on a zero-phonone line and semi-permanently lasts without suffering from any change in the temperature range from 2 to 120 K. and which can be erased by irradiation of excited light having an energy larger than the zero-phonone line, in which the burnt holes have long life and deep depth and any single holes can be erased.
摘要:
Superconducting material of oxide which have a composition represented by the general formula:{.alpha..sub.1-x (.beta..sub.1-w .gamma..sub.w).sub.x }.delta..sub.y .epsilon..sub.zparticularly, {Ba.sub.1-x (Y.sub.1-w .gamma..sub.w).sub.x }Cu.sub.y O.sub.z in which, ".gamma." represents at least one element selected from a group consisting of titanium (Ti), hafnium (Hf), silicon (Si), germanium (Ge), tin (Sn), lead (Pb) and manganese (Mn), and "X", "Y" "W" and "Z" represent numbers which are selected in the following ranges: 0.1.ltoreq.X.ltoreq.0.9, 0.4.ltoreq.y.ltoreq.1.0, 1.ltoreq.z.ltoreq.5 and 0.01.ltoreq.w.ltoreq.0.50 and which have crystal structures of perovskite type or quasiperovskite type.
摘要:
A novel process for preparing superconductor of bismuth-containing compound oxide such as Bi--Sr--Ca--Cu system.In the present invention, firstly an intermediate compound oxide containing metal elements of the superconductor except bismuth is prepared and then the intermediate compound oxide is contacted with bismuth oxide vapour at a temperature between 750.degree. and 950.degree. C. so that bismuth oxide is reacted with said intermediate compound oxide.
摘要:
A method for preparing a thin film of a composite copper oxide superconductor with a deposition source of the compound copper oxide, by applying an oxygen ion beam from an ion source onto a substrate while changing beam intensity during formation of the superconducting thin film, thereby to physically deposit evaporative particles from the deposition source on the substrate.