Plasma treatment apparatus, method for forming film, and method for manufacturing thin film transistor
    1.
    发明授权
    Plasma treatment apparatus, method for forming film, and method for manufacturing thin film transistor 有权
    等离子体处理装置,薄膜​​形成方法以及制造薄膜晶体管的方法

    公开(公告)号:US08951894B2

    公开(公告)日:2015-02-10

    申请号:US13618472

    申请日:2012-09-14

    摘要: A structure of the plasma treatment apparatus is employed in which an upper electrode has projected portions provided with first introduction holes and recessed portions provided with second introduction holes, the first introduction hole of the upper electrode is connected to a first cylinder filled with a gas which is not likely to be dissociated, the second introduction hole is connected to a second cylinder filled with a gas which is likely to be dissociated, the gas which is not likely to be dissociated is introduced into a reaction chamber from an introduction port of the first introduction hole provided on a surface of the projected portion of the upper electrode, and the gas which is likely to be dissociated is introduced into the reaction chamber from an introduction port of the second introduction hole provided on a surface of the recessed portion.

    摘要翻译: 采用等离子体处理装置的结构,其中上电极具有设置有第一导入孔的突出部分和设置有第二导入孔的凹部,上电极的第一导入孔与填充有气体的第一圆筒连接, 不可能解离,第二引入孔连接到填充有可能解离的气体的第二气缸,不可能解离的气体从第一引入孔的引入口引入反应室 设置在上部电极的突出部分的表面上的引入孔和可能被解离的气体从设置在凹部的表面上的第二引入孔的引入口引入到反应室中。

    Transistor and semiconductor device
    2.
    发明授权
    Transistor and semiconductor device 有权
    晶体管和半导体器件

    公开(公告)号:US08895976B2

    公开(公告)日:2014-11-25

    申请号:US13164296

    申请日:2011-06-20

    IPC分类号: H01L29/78 H01L29/786

    CPC分类号: H01L29/7869 H01L29/408

    摘要: Manufactured is a transistor including an oxide semiconductor layer, a source electrode layer and a drain electrode layer overlapping with part of the oxide semiconductor layer, a gate insulating layer overlapping with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer, and a gate electrode overlapping with part of the oxide semiconductor layer with the gate insulating layer provided therebetween, wherein, after the oxide semiconductor layer which is to be a channel formation region is irradiated with light and the light irradiation is stopped, a relaxation time of carriers in photoresponse characteristics of the oxide semiconductor layer has at least two kinds of modes: τ1 and τ2, τ1

    摘要翻译: 制造的是包括与氧化物半导体层的一部分重叠的氧化物半导体层,源极电极层和漏极电极层,与氧化物半导体层重叠的栅极绝缘层,源极电极层和漏极电极层的晶体管, 以及与所述氧化物半导体层的与氧化物半导体层的一部分重叠的栅电极,其间设置有栅极绝缘层,其中,在作为沟道形成区域的氧化物半导体层被照射光并停止光照射之后,弛豫时间 氧化物半导体层的光响应特性中的载流子具有至少两种模式:τ1和τ2,τ1<τ2,τ2为300秒以下。 此外,制造包括晶体管的半导体器件。

    TRANSISTOR AND SEMICONDUCTOR DEVICE
    4.
    发明申请
    TRANSISTOR AND SEMICONDUCTOR DEVICE 有权
    晶体管和半导体器件

    公开(公告)号:US20110315979A1

    公开(公告)日:2011-12-29

    申请号:US13164296

    申请日:2011-06-20

    IPC分类号: H01L29/78

    CPC分类号: H01L29/7869 H01L29/408

    摘要: Manufactured is a transistor including an oxide semiconductor layer, a source electrode layer and a drain electrode layer overlapping with part of the oxide semiconductor layer, a gate insulating layer overlapping with the oxide semiconductor layer, the source electrode layer, and the drain electrode layer, and a gate electrode overlapping with part of the oxide semiconductor layer with the gate insulating layer provided therebetween, wherein, after the oxide semiconductor layer which is to be a channel formation region is irradiated with light and the light irradiation is stopped, a relaxation time of carriers in photoresponse characteristics of the oxide semiconductor layer has at least two kinds of modes: τ1 and τ2, τ1

    摘要翻译: 制造的是包括与氧化物半导体层的一部分重叠的氧化物半导体层,源极电极层和漏极电极层,与氧化物半导体层重叠的栅极绝缘层,源极电极层和漏极电极层的晶体管, 以及与所述氧化物半导体层的与氧化物半导体层的一部分重叠的栅电极,其间设置有栅极绝缘层,其中,在作为沟道形成区域的氧化物半导体层被照射光并停止光照射之后,弛豫时间 氧化物半导体层的光响应特性中的载流子具有至少两种模式:τ1和τ2,τ1<τ2,τ2为300秒以下。 此外,制造包括晶体管的半导体器件。

    SEMICONDUCTOR DEVICE
    5.
    发明申请
    SEMICONDUCTOR DEVICE 审中-公开
    半导体器件

    公开(公告)号:US20110227082A1

    公开(公告)日:2011-09-22

    申请号:US13048023

    申请日:2011-03-15

    IPC分类号: H01L29/786

    摘要: An oxide semiconductor layer in which “safe” traps exist exhibits two kinds of modes in photoresponse characteristics. By using the oxide semiconductor layer, a transistor in which light deterioration is suppressed to the minimum and the electric characteristics are stable can be achieved. The oxide semiconductor layer exhibiting two kinds of modes in photoresponse characteristics has a photoelectric current value of 1 pA to 10 nA inclusive. When the average time τ1 until which carriers are captured by the “safe” traps is large enough, there are two kinds of modes in photoresponse characteristics, that is, a region where the current value falls rapidly and a region where the current value falls gradually, in the result of a change in photoelectric current over time.

    摘要翻译: “安全”陷阱存在的氧化物半导体层表现出光响应特性的两种模式。 通过使用氧化物半导体层,可以实现将光劣化抑制到最小并且电特性稳定的晶体管。 在光响应特性中表现出两种模式的氧化物半导体层具有1pA至10nA的光电流值。 当通过“安全”陷阱捕获载流子的平均时间τ1足够大时,光响应特性即电流值急剧下降的区域和电流值逐渐下降的区域有两种模式 在光电流随时间变化的结果中。

    Display device and method for manufacturing display device
    6.
    发明授权
    Display device and method for manufacturing display device 有权
    显示装置及其制造方法

    公开(公告)号:US08083956B2

    公开(公告)日:2011-12-27

    申请号:US12246947

    申请日:2008-10-07

    IPC分类号: H01L21/302

    摘要: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.

    摘要翻译: 提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。 在显示装置中使用的功能层(例如着色层或像素电极层)通过将液体功能层形成材料排出到形成有包含第一有机化合物的层的开口而形成,该第一有机化合物具有C-N 键或作为碱的主链中的C-O键和包含第二有机化合物作为隔板的层。 控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度,从而可以选择性地形成疏液区域和亲液性区域。

    Display Device and Method for Manufacturing Display Device
    7.
    发明申请
    Display Device and Method for Manufacturing Display Device 有权
    显示设备和显示设备制造方法

    公开(公告)号:US20120091444A1

    公开(公告)日:2012-04-19

    申请号:US13333304

    申请日:2011-12-21

    IPC分类号: H01L51/54

    摘要: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.

    摘要翻译: 提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。 在显示装置中使用的功能层(例如着色层或像素电极层)通过将液体功能层形成材料排出到形成有包含第一有机化合物的层的开口而形成,该第一有机化合物具有C-N 键或作为碱的主链中的C-O键和包含第二有机化合物作为隔板的层。 控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度,从而可以选择性地形成疏液区域和亲液性区域。

    Display Device and Method for Manufacturing Display Device
    8.
    发明申请
    Display Device and Method for Manufacturing Display Device 有权
    显示设备和显示设备制造方法

    公开(公告)号:US20090096364A1

    公开(公告)日:2009-04-16

    申请号:US12246947

    申请日:2008-10-07

    IPC分类号: H01J1/63 H01L51/56

    摘要: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.

    摘要翻译: 提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。 在显示装置中使用的功能层(例如着色层或像素电极层)通过将液体功能层形成材料排出到形成有包含具有CN键的第一有机化合物的层的开口而形成,或 作为基底的主链中的CO键和包含第二有机化合物作为分隔层的层。 控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度,从而可以选择性地形成疏液区域和亲液性区域。

    Display device and method for manufacturing display device
    9.
    发明授权
    Display device and method for manufacturing display device 有权
    显示装置及其制造方法

    公开(公告)号:US08847482B2

    公开(公告)日:2014-09-30

    申请号:US13333304

    申请日:2011-12-21

    IPC分类号: H01L51/00 H01L27/32

    摘要: To provide a display device with higher image quality and reliability or a large-sized display device with a large screen at low cost with high productivity. A function layer (such as a coloring layer or a pixel electrode layer) used in the display device is formed by discharging a liquid function-layer-forming material to an opening formed with a layer including a first organic compound which has a C—N bond or a C—O bond in the main chain as a base and a layer including a second organic compound as a partition. The fluorine density exhibiting liquid repellency to the liquid function-layer-forming material, which is attached to a surface of the layers including organic compounds, is controlled, whereby a liquid repellent region and a lyophilic region can be selectively formed.

    摘要翻译: 提供具有更高图像质量和可靠性的显示设备或具有低成本且高生产率的大屏幕的大尺寸显示设备。 在显示装置中使用的功能层(例如着色层或像素电极层)通过将液体功能层形成材料排出到形成有包含第一有机化合物的层的开口而形成,该第一有机化合物具有C-N 键或作为碱的主链中的C-O键和包含第二有机化合物作为隔板的层。 控制附着在包含有机化合物的层的表面上对液体功能层形成材料具有疏液性的氟密度,从而可以选择性地形成疏液区域和亲液性区域。