公开(公告)号：US20070103657A1

公开(公告)日：2007-05-10

申请号：US11555397

申请日：2006-11-01

Applicant: Shusuke YOSHITAKE ,  Shuichi Tamamushi

Inventor： Shusuke YOSHITAKE ,  Shuichi Tamamushi

IPC: G03B27/68

CPC classification number: G03F7/70783 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/84 ,  G03F7/707 ,  G03F7/70708 ,  H01J37/3174 ,  H01J2237/2007 ,  H01J2237/204 ,  H01J2237/2817 ,  H01J2237/31776 ,  H01L21/6838

Abstract: A position measuring apparatus includes a holder having storage spaces in which a three-point support member for supporting a backside of a substrate being a mask at three points, and a vacuum chuck member for holding a backside of a substrate being a mask are prepared, a stage on which one of the three-point support member and the vacuum chuck member prepared in the storage spaces of the holder is mounted, a vacuum pump to hold and chuck the substrate through the vacuum chuck member in a state of being mounted on the stage, and a recognition unit to recognize a position of a pattern written on the substrate supported by the three-point support member mounted on the stage and a position of a pattern written on the substrate held by the vacuum chuck member on the stage.

Abstract translation: 一种位置测量装置包括一个具有存放空间的保持架，其中三点支撑构件用于支撑三点处的掩模的基板的背面，以及用于保持作为掩模的基板的背面的真空卡盘构件， 安装在保持架的储存空间中的三点支撑构件和真空吸盘构件中的一个安装在其上的阶段，通过真空吸盘构件在安装在保持器的状态下保持和夹持基板的真空泵 阶段和识别单元，以识别写在由安装在舞台上的三点支撑构件支撑的基底上的图案的位置和写在由真空吸盘构件保持的基板上的图案的位置。

公开(公告)号：US20070103659A1

公开(公告)日：2007-05-10

申请号：US11555478

申请日：2006-11-01

Applicant: Shusuke YOSHITAKE ,  Shuichi Tamamushi

Inventor： Shusuke YOSHITAKE ,  Shuichi Tamamushi

IPC: G03B27/42

CPC classification number: G03F7/70783 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70708 ,  H01J37/3174 ,  H01J2237/31798

Abstract: A charged particle beam writing method includes measuring a topography of a backside of a substrate without an influence of a gravity sag, calculating a first positional deviation amount of a pattern written on a frontside of the substrate in a case of the backside of the substrate having been corrected to be flat, based on the the backside topography of the substrate, calculating a first coefficient of a first approximate expression indicating a positional deviation correction amount for correcting the first positional deviation amount, based on the first positional deviation amount, adding the first coefficient to a second coefficient of a second approximate expression indicating a positional deviation correction amount for correcting a second positional deviation amount of the pattern written on the frontside of the substrate in a case of the backside of the substrate having not been corrected to be flat, and writing the pattern on the frontside of the substrate utilizing a charged particle beam, based on one of a positional deviation correction amount obtained by a third approximate expression indicating a positional deviation correction amount using a third coefficient obtained as a result of the adding, and the positional deviation correction obtained by the second approximate expression.

Abstract translation: 带电粒子束写入方法包括在不受重力下垂的影响的情况下测量衬底背面的形貌，计算在衬底的背面形成的图案的第一位置偏移量，该衬底的背面具有 基于基板的背面形状校正为平坦，基于第一位置偏差量，计算指示用于校正第一位置偏差量的位置偏差校正量的第一近似表达式的第一系数， 系数为第二近似表达式的第二系数，表示在未校正的基板的背面为平坦的情况下，用于校正写入基板的正面的图案的第二位置偏移量的位置偏差校正量， 并使用带电的方式将图案写入衬底的前侧 基于通过第三近似表达式获得的位置偏差校正量中的一个，所述第三近似表达式指示使用作为相加结果获得的第三系数的位置偏差校正量和通过第二近似表达式获得的位置偏差校正之一。

公开(公告)号：US20100237256A1

公开(公告)日：2010-09-23

申请号：US12722922

申请日：2010-03-12

Applicant: Shusuke YOSHITAKE

Inventor： Shusuke YOSHITAKE

IPC: H01J37/30 ,  H01J37/20 ,  G01B11/14

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/20 ,  H01J2237/2482 ,  H01J2237/30438 ,  H01J2237/30455

Abstract: The reference mark has steps and is formed on a sample. A stage moves in X and Y directions. The sample M is placed on the stage. An optical lever type height position sensor emits light to detect the reference mark FM′ by the stage being scanned. The spot position of light reflected on the sample is detected in position sensitive detector. The X and Y coordinates of the position of the stage positioned when the spot position of the reflected light is changed is detected. The detected X and Y coordinates are regarded as the position C of the reference mark FM′. The position of a phase defect D located in the sample M is specified on the basis of the position C of the reference mark FM′. The position of a portion on which writing is to be performed is determined on the basis of a relationship with the specified position of the phase defect D.

Abstract translation: 参考标记具有步骤并形成在样品上。 舞台在X和Y方向移动。 将样品M放置在舞台上。 光杆式高度位置传感器发射光，以便在被扫描的阶段检测参考标记FM'。 在位置敏感检测器中检测到样品反射的光的位置。 检测当反射光的光点位置改变时定位的平台的位置的X和Y坐标。 检测出的X和Y坐标被认为是参考标记FM'的位置C. 基于参考标记FM'的位置C来指定位于样本M中的相位缺陷D的位置。 基于与相位缺陷D的指定位置的关系来确定要进行写入的部分的位置。

公开(公告)号：US20090242807A1

公开(公告)日：2009-10-01

申请号：US12408212

申请日：2009-03-20

Applicant: Kaoru TSURUTA ,  Takashi KAMIKUBO ,  Rieko NISHIMURA ,  Shusuke YOSHITAKE ,  Shuichi TAMAMUSHI

Inventor： Kaoru TSURUTA ,  Takashi KAMIKUBO ,  Rieko NISHIMURA ,  Shusuke YOSHITAKE ,  Shuichi TAMAMUSHI

IPC: A61N5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/30444

Abstract: A correcting substrate for a charged particle beam lithography apparatus includes a substrate body using a low thermal expansion material having a thermal expansion lower than that of a silicon oxide (SiO2) material; a first conductive film arranged above the substrate; and a second conductive film selectively arranged on the first conductive film and having a reflectance higher than the first conductive film, wherein the low thermal expansion material is exposed on a rear surface of the correcting substrate.

Abstract translation: 用于带电粒子束光刻设备的校正衬底包括使用热膨胀低于氧化硅（SiO 2）材料的热膨胀材料的低热膨胀材料的衬底体; 布置在所述基板上方的第一导电膜; 以及选择性地布置在所述第一导电膜上并具有高于所述第一导电膜的反射率的第二导电膜，其中所述低热膨胀材料暴露在所述校正衬底的后表面上。

公开(公告)号：US20090259431A1

公开(公告)日：2009-10-15

申请号：US12419642

申请日：2009-04-07

Applicant: Shusuke YOSHITAKE

Inventor： Shusuke YOSHITAKE

IPC: G06F15/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3174

Abstract: The present invention provides an electron beam writing apparatus and an image placement error correcting method each capable of calculating a high-accuracy correction amount relative to an image placement error in consideration of a difference in required unit area of height distribution data between the shape of a back surface of an EUV mask and the shape of a surface of a pin chuck. Of back surface shape data of the EUV mask necessary to perform an image placement error correction of each pattern, the back surface shape data of a position brought into contact with each pin of the pin chuck is extracted. The image placement error is calculated only from the extracted back surface shape data.

Abstract translation: 本发明提供了一种电子束写入装置和图像放置误差校正方法，它们能够考虑到a的形状之间的高度分布数据的所需单位面积的差异，计算相对于图像放置误差的高精度校正量 EUV掩模的背面和销卡盘的表面的形状。 对于执行每个图案的图像放置纠错所必需的EUV掩模的背面形状数据，提取与销卡盘的每个销接触的位置的背面形状数据。 仅从提取的背面形状数据计算图像放置误差。