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公开(公告)号:US07180006B2
公开(公告)日:2007-02-20
申请号:US10724219
申请日:2003-12-01
申请人: Soon Bog Kwon , Sang Hun Lee , Yang Sik Moon , Ki Pyo Hong , Yoon Kuen Cho
发明人: Soon Bog Kwon , Sang Hun Lee , Yang Sik Moon , Ki Pyo Hong , Yoon Kuen Cho
CPC分类号: H05K3/244 , H01L23/49572 , H01L23/49582 , H01L2924/0002 , H05K1/0393 , H05K3/28 , H05K2201/0397 , H05K2203/1105 , Y10S428/901 , Y10T29/49155 , Y10T29/4916 , Y10T428/24917 , Y10T428/325 , H01L2924/00
摘要: A tape substrate including an insulating film, a copper foil pattern formed on the insulating film at one side of the insulating film, and provided with a connecting area where an electronic element is to be mounted, a barrier layer plated on the copper foil pattern at the connecting area, and formed with a plurality of pores, and a tin layer plated on the barrier layer, and alloyed with a portion of the copper foil pattern corresponding to the connecting area, through the pores. A method for fabricating the tape substrate is also disclosed. In accordance with the invention, it is possible to reduce the time taken for the copper foil pattern to come into contact with the electroless tin plating solution used in the tin plating process, thereby preventing the copper component of the copper foil pattern from being eluted. Accordingly, there is no open-circuit fault caused by formation of pores. The barrier layer makes it possible to obtain an improved plating efficiency and to reduce the thickness of the alloy layer. In addition, the barrier layer serves to reduce internal stress generated at the interface between the tin layer and the copper foil pattern, thereby suppressing formation of voids. Accordingly, there is an effect of preventing a short circuit caused by the growth of whiskers.
摘要翻译: 一种带状基板,包括绝缘膜,在绝缘膜的一侧上的绝缘膜上形成的铜箔图案,并且设置有要安装电子元件的连接区域,镀在铜箔图案上的阻挡层 连接区域,并且形成有多个孔,以及镀在阻挡层上的锡层,并且与对应于连接区域的铜箔图案的一部分合金化。 还公开了一种用于制造带基材的方法。 根据本发明,可以减少铜箔图案与镀锡工艺中使用的化学镀锡溶液接触所花费的时间,从而防止铜箔图案的铜成分被洗脱。 因此,没有由孔形成引起的开路故障。 阻挡层可以获得提高的电镀效率并减小合金层的厚度。 此外,阻挡层用于减少在锡层和铜箔图案之间的界面处产生的内应力,从而抑制空隙的形成。 因此,存在防止晶须生长引起的短路的效果。
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公开(公告)号:US07255802B2
公开(公告)日:2007-08-14
申请号:US11023162
申请日:2004-12-28
申请人: Soon Bog Kwon , Sang Hun Lee , Yang Sik Moon , Ki Pyo Hong , Yoon Kuen Cho
发明人: Soon Bog Kwon , Sang Hun Lee , Yang Sik Moon , Ki Pyo Hong , Yoon Kuen Cho
CPC分类号: H05K3/244 , H01L23/49572 , H01L23/49582 , H01L2924/0002 , H05K1/0393 , H05K3/28 , H05K2201/0397 , H05K2203/1105 , Y10S428/901 , Y10T29/49155 , Y10T29/4916 , Y10T428/24917 , Y10T428/325 , H01L2924/00
摘要: A method for fabricating a tape substrate includes forming, on an insulating film, a copper foil pattern having a connecting area; coating a solder resist on the formed copper foil pattern, at a region other than the connecting area; plating a barrier layer on the copper foil pattern at the connecting area after the coating of the solder resist; and plating tin on the plated barrier layer plated, thereby forming a tin layer on the barrier layer. Another method for fabricating a tape substrate includes forming, on an insulating film, a copper foil pattern having a connecting area; plating a barrier layer over the formed copper foil pattern; plating tin over the barrier layer after the plating of the barrier layer, thereby forming a tin layer over the barrier layer; and coating a solder resist on the tin layer at a region other than the connecting area, after the formation of the tin layer.
摘要翻译: 一种带状基片的制造方法包括在绝缘膜上形成具有连接面积的铜箔图案; 在形成的铜箔图案上的除了连接区域以外的区域涂覆阻焊剂; 在涂覆阻焊剂之后的连接区域上在铜箔图案上镀覆阻挡层; 并在镀覆的阻挡层上镀锡,从而在阻挡层上形成锡层。 制造带基片的另一种方法包括在绝缘膜上形成具有连接区域的铜箔图案; 在所形成的铜箔图案上镀覆阻挡层; 在阻挡层的镀覆之后,在阻挡层上电镀锡,从而在阻挡层上形成锡层; 在形成锡层之后,在除了连接区域之外的区域的锡层上涂覆阻焊剂。
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公开(公告)号:US07635241B2
公开(公告)日:2009-12-22
申请号:US11454865
申请日:2006-06-19
申请人: Tae Hyun Lim , Hyun Joo Jeon , Kwang Jong Yoo , Ji Young Oh , Hyuk Sang Yoon , Yang Sik Moon
发明人: Tae Hyun Lim , Hyun Joo Jeon , Kwang Jong Yoo , Ji Young Oh , Hyuk Sang Yoon , Yang Sik Moon
IPC分类号: B65G53/16
CPC分类号: H01L21/67784 , B65G51/03
摘要: There is provided a support platform of a non-contact transfer apparatus. The support platform includes a plurality of first holes for introducing air on a surface of the support platform, and a plurality of second holes for removing the air introduced through the first holes. At least one of a size and a number of the first holes varies in a direction from a central portion of the support platform to peripheral portions of the support platform, and the second holes are identically formed to one another.
摘要翻译: 提供了非接触式传送装置的支撑平台。 支撑平台包括用于在支撑平台的表面上引入空气的多个第一孔和用于去除通过第一孔引入的空气的多个第二孔。 尺寸和数量的第一孔中的至少一个在从支撑平台的中心部分到支撑平台的周边部分的方向上变化,并且第二孔彼此相同地形成。
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公开(公告)号:US08267253B2
公开(公告)日:2012-09-18
申请号:US11476362
申请日:2006-06-27
申请人: Sung Eun Kim , Yang Sik Moon , Jong Bum Jung
发明人: Sung Eun Kim , Yang Sik Moon , Jong Bum Jung
IPC分类号: B65D85/00
摘要: A carrier having a plurality of support bars for safely transferring a substrate is provided. The carrier includes a frame having a through-hole formed at a center, the center through-hole including a first inner surface and a second inner surface that faces the first inner surface within in the through-hole; and a plurality of support bars joined to the first inner surface and the second inner surface.
摘要翻译: 提供了具有用于安全地转移基板的多个支撑杆的载体。 载体包括具有形成在中心的通孔的框架,所述中心通孔包括在所述通孔内面向所述第一内表面的第一内表面和第二内表面; 以及连接到第一内表面和第二内表面的多个支撑杆。
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公开(公告)号:US08470142B2
公开(公告)日:2013-06-25
申请号:US11451440
申请日:2006-06-13
申请人: Sung Eun Kim , Tae Hyun Lim , Hwan Kyu Yoo , Kwang Jong Yoo , Yang Sik Moon , Byeong Cheol An
发明人: Sung Eun Kim , Tae Hyun Lim , Hwan Kyu Yoo , Kwang Jong Yoo , Yang Sik Moon , Byeong Cheol An
IPC分类号: C23C14/34
CPC分类号: C23C14/042 , C23C14/35
摘要: A sputtering apparatus for depositing a target material on a substrate includes a chamber, a target in the chamber to provide the target material, a carrier to carry the substrate in the chamber to face the target, and a plurality of masks arranged along sides of the carrier and being movable back and forth with respect to the carrier.
摘要翻译: 用于在基板上沉积目标材料的溅射装置包括:腔室,用于提供目标材料的腔室中的靶;载体,用于将腔室中的衬底运送到靶材;以及多个掩模, 并且可相对于承载件来回移动。
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公开(公告)号:US08007644B2
公开(公告)日:2011-08-30
申请号:US11454730
申请日:2006-06-16
申请人: Sung Eun Kim , Tae Hyun Lim , Kwang Jong Yoo , Byung Han Yun , Yang Sik Moon
发明人: Sung Eun Kim , Tae Hyun Lim , Kwang Jong Yoo , Byung Han Yun , Yang Sik Moon
CPC分类号: C23C14/50 , C23C14/568 , Y10S414/139
摘要: An inclined carrier transferring apparatus for use inline sputtering equipment. The inclined carrier transferring apparatus includes rollers and a guiding portion. The rollers transfer and support the bottom of a carrier. The guiding portion is installed diagonally with respect to the rollers, to support the top of the carrier in a non-contact manner.
摘要翻译: 一种用于在线溅射设备的倾斜载体传送装置。 倾斜载体传送装置包括辊和引导部。 辊子传送和支撑载体的底部。 引导部分相对于辊倾斜地安装,以非接触的方式支撑载体的顶部。
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