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18 条记录 (耗时 0.025 秒)

    Fractionation of resins using a static mixer and a liquid-liquid centrifuge
    1.
    发明授权
    Fractionation of resins using a static mixer and a liquid-liquid centrifuge 失效

    公开(公告)号：US06512087B1

    公开(公告)日：2003-01-28

    申请号：US09698724

    申请日：2000-10-27

    申请人： Stanley F. Wanat ,  M. Dalil Rahman ,  Zhong Xiang

    发明人： Stanley F. Wanat ,  M. Dalil Rahman ,  Zhong Xiang

    IPC分类号： C08F604

    CPC分类号： C08G8/08 ,  C08G8/10 ,  G03F7/0236

    摘要： Disclosed is a method for producing low molecular weight oligomers of a film forming resin, which involves: a) providing a solution of the film forming resin in a first solvent system comprising a photoresist solvent, and optionally a water-soluble organic solvent; b) providing a second solvent system comprising at least one substantially pure C5-C8 alkane and/or at least one aromatic compound having at least one hydrocarbyl substituent and/or water/C1-C4 alcohol mixture; and performing steps c)-e) in the following order: c) mixing the solutions from a) and second solvent system from b) in a static mixer for a time period sufficient for efficient mixing; d) feeding the mixture from c) and second solvent system from b) through two separate inlet ports into a liquid/liquid centrifuge, one of the inlet ports feeding the mixture from c), the second inlet port feeding the second solvent system from b) into said liquid/liquid centrifuge at a feed ratio of the mixture from c) to the second solvent system from b) of from about 10/90 to about 90/10, at a temperature of from about 0° C. up to maximum temperature that is less than the boiling point of the lowest boiling solvent in the first or second solvent system; e) rotating the mixture from step d) inside the liquid/liquid centrifuge at a rotational speed sufficient to separate the mixture from step d) into two separate phases, and then collecting the two separate phases, each from two separate outlet ports, into two separate containers, wherein the heavier phase (H) comprises a fractionated film forming resin comprising higher molecular weight fractions of the film forming resin and the lighter phase (L) comprises low molecular weight oligomers of the film forming resin. The present invention also provides a method for producing a photoresist composition, and method for producing a microelectronic device using the aforementioned fractionated resin or low molecular weight oligomers of the film forming resin.

    Antireflective coating composition and process thereof
    3.
    发明授权
    Antireflective coating composition and process thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US08039201B2

    公开(公告)日：2011-10-18

    申请号：US11944105

    申请日：2007-11-21

    申请人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    发明人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    IPC分类号： G03C1/73 ,  G03F7/11

    CPC分类号： G03F7/091 ,  G03F7/0046

    摘要： The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.

    摘要翻译： 本发明涉及包含聚合物，热酸产生剂和任选的交联剂的抗反射组合物，其中所述聚合物包含至少一个疏水单元（1），至少一个生色团单元（2），至少一个具有 交联位点（3）和任选的能够交联聚合物的单元，其中R1至R8独立地选自氢和C1-C4烷基，W1是完全或部分氟化的亚烷基，X选自F，H和OH ; W2包含发色团，W3 Y包含交联位点。 本发明还涉及使用抗反射涂料组合物的方法。

    Solvent mixtures for antireflective coating compositions for photoresists
    4.
    发明授权
    Solvent mixtures for antireflective coating compositions for photoresists 有权
    用于光致抗蚀剂的抗反射涂料组合物的溶剂混合物

    公开(公告)号：US07824844B2

    公开(公告)日：2010-11-02

    申请号：US11624744

    申请日：2007-01-19

    申请人： Zhong Xiang ,  Hengpeng Wu ,  Hong Zhuang ,  Eleazar Gonzalez ,  Mark O. Neisser

    发明人： Zhong Xiang ,  Hengpeng Wu ,  Hong Zhuang ,  Eleazar Gonzalez ,  Mark O. Neisser

    IPC分类号： G03F7/40 ,  G03F7/30 ,  G03F7/11 ,  C08F8/30 ,  H01L21/027

    CPC分类号： G03F7/091 ,  C09D7/20 ,  G03F7/0048

    摘要： The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.

    摘要翻译： 本发明涉及一种抗反射涂料组合物，其能够涂覆在光致抗蚀剂层下面，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少一种主要有机溶剂和至少一种选择的二级有机溶剂 其中R 1，R 3和R 4选自H和C 1 -C 6烷基，R 2，R 5，R 6，R 7，R 8和R 9选自C 1 -C 6烷基， n = 1-5。 本发明还涉及能够涂覆在光致抗蚀剂层下面的抗反射涂料组合物，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少2种有机溶剂，并且其中抗反射涂料组合物具有 在加速老化后，0.2微米的液体颗粒数小于100 / ml。

    Antireflective composition for photoresists
    6.
    发明授权
    Antireflective composition for photoresists 有权
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号：US07638262B2

    公开(公告)日：2009-12-29

    申请号：US11502706

    申请日：2006-08-10

    申请人： Hengpeng Wu ,  Zhong Xiang ,  Hong Zhuang ,  Jianhui Shan ,  Jian Yin ,  Huirong Yao ,  PingHung Lu

    发明人： Hengpeng Wu ,  Zhong Xiang ,  Hong Zhuang ,  Jianhui Shan ,  Jian Yin ,  Huirong Yao ,  PingHung Lu

    IPC分类号： G03F7/095 ,  G03F7/11 ,  G03F7/38 ,  G03F7/09

    CPC分类号： G03F7/091 ,  Y10S438/952

    摘要： The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, A is a nonaromatic linking moiety, R′ and R″ are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and, Y′ is independently a (C1-C20) hydrocarbyl linking moiety. The invention further relates to a process for imaging the antireflective coating composition.

    摘要翻译： 本发明涉及一种用于光致抗蚀剂层的抗反射涂料组合物，其包含聚合物，交联剂和酸产生剂，其中聚合物包含至少一个结构单元1，其中A是非芳族连接部分，R'和R' 独立地选自氢，Z和W-OH，其中Z是（C1-C20）烃基部分，W是（C1-C20）烃基连接部分，Y'独立地是（C1-C20）烃基 连接部分。 本发明还涉及一种用于对抗反射涂料组合物进行成像的方法。

    Antireflective compositions for photoresists
    7.
    发明授权
    Antireflective compositions for photoresists 有权
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号：US07691556B2

    公开(公告)日：2010-04-06

    申请号：US11159002

    申请日：2005-06-22

    申请人： Hengpeng Wu ,  Shuji Ding-Lee ,  Zhong Xiang ,  Aritaka Hishida ,  Jianhui Shan ,  Hong Zhuang

    发明人： Hengpeng Wu ,  Shuji Ding-Lee ,  Zhong Xiang ,  Aritaka Hishida ,  Jianhui Shan ,  Hong Zhuang

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/091

    摘要： The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

    摘要翻译： 本发明涉及一种包含通过使甘脲化合物与至少一种含有至少一个羟基和/或至少一个酸基团的反应性化合物反应而得到的聚合物的涂层溶液，此外，聚合物可溶于有机溶剂中。 本发明还涉及一种用于对涂覆在这种涂料组合物上的光致抗蚀剂和用于涂料组合物的聚合物进行成像的方法。

    Antireflective composition for photoresists
    9.
    发明申请
    Antireflective composition for photoresists 有权
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号：US20080038659A1

    公开(公告)日：2008-02-14

    申请号：US11502706

    申请日：2006-08-10

    申请人： Hengpeng Wu ,  Zhong Xiang ,  Hong Zhuang ,  Jianhui Shan ,  Jian Yin ,  Huirong Yao ,  PingHung Lu

    发明人： Hengpeng Wu ,  Zhong Xiang ,  Hong Zhuang ,  Jianhui Shan ,  Jian Yin ,  Huirong Yao ,  PingHung Lu

    IPC分类号： G03C1/00

    CPC分类号： G03F7/091 ,  Y10S438/952

    摘要： The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, A is a nonaromatic linking moiety, R′ and R″ are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and, Y′ is independently a (C1-C20) hydrocarbyl linking moiety. The invention further relates to a process for imaging the antireflective coating composition.

    摘要翻译： 本发明涉及一种用于光致抗蚀剂层的抗反射涂料组合物，其包含聚合物，交联剂和酸产生剂，其中聚合物包含至少一个结构单元1，其中A是非芳族连接部分，R'和R' '独立地选自氢，Z和W-OH，其中Z是（C 1 -C 20 -C 20）烃基部分，W是（C 1 H 12） C 20 -C 20烃基连接部分，Y'独立地为（C 1 -C 20）烃基连接部分 。 本发明还涉及一种用于对抗反射涂料组合物进行成像的方法。