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    HAND-DEVICE, AND METHODS FOR EXAMINING A CORRODIBLE METAL OBJECT FOR CORROSION
    1.
    发明申请
    HAND-DEVICE, AND METHODS FOR EXAMINING A CORRODIBLE METAL OBJECT FOR CORROSION 审中-公开
    手持设备和用于检查可腐蚀金属物体的腐蚀方法

    公开(公告)号：US20130210154A1

    公开(公告)日：2013-08-15

    申请号：US13704747

    申请日：2011-06-01

    申请人： Stefan Dieckhoff ,  Peter Plagemann ,  Philippe Vulliet ,  Manfred Nachbar-Zielinski

    发明人： Stefan Dieckhoff ,  Peter Plagemann ,  Philippe Vulliet ,  Manfred Nachbar-Zielinski

    IPC分类号： G01N17/04

    CPC分类号： G01N17/04 ,  G01N17/00

    摘要： A hand-device is described for penetrating a heat-insulating layer of a corrodible metal object and for examining a pipeline for corrosion, preferably for penetrating a heat-insulating layer of a corrodible metal pipeline, with a penetrating body that comprises a pointed section for displacing the insulating layer and a holding section for receiving a driving force, and a detecting device for generating a signal as a response to a stimulus caused by corrosion, wherein the detecting device is arranged proximally to the pointed section of the penetrating body. Corresponding methods as well as uses are also described.

    摘要翻译： 描述了一种手持装置，用于穿透可腐蚀的金属物体的绝热层，并且用于检查用于腐蚀的管道，优选用于穿透可腐蚀的金属管道的隔热层，穿透体包括用于 移动绝缘层和用于接收驱动力的保持部分，以及用于产生作为对由腐蚀引起的刺激的响应的信号的检测装置，其中所述检测装置布置在所述穿透体的尖锐部分的近侧。 还描述了相应的方法以及用途。

    Device for testing the quality of microstructurization
    4.
    发明授权
    Device for testing the quality of microstructurization 有权
    用于测试微结构化质量的设备

    公开(公告)号：US08842271B2

    公开(公告)日：2014-09-23

    申请号：US13809207

    申请日：2011-07-08

    申请人： Udo Meyer ,  Susanne Markus ,  Stefan Dieckhoff

    发明人： Udo Meyer ,  Susanne Markus ,  Stefan Dieckhoff

    IPC分类号： G01N21/00 ,  G01N21/956 ,  G01B11/24 ,  G01N21/47 ,  G01B11/30

    CPC分类号： G01B11/24 ,  G01B11/303 ,  G01N21/4788 ,  G01N21/956

    摘要： A device for testing the quality of microstructurization of a surface (2) having a known target microstructurization quality, comprising a radiation source (1) for coherent radiation, a first detector (10) and a second detector (4) and a masking system, all of which are set up and arranged with respect to one another so that radiation emitted by the radiation source (1) onto the surface (2) produces a diffraction pattern, wherein the diffraction maximum of order n of the diffraction pattern without the masking system would impinge on the first detector (10), the masking system prevents 80% of the photons that are assigned to the diffraction maximum of order n from impinging on the first detector and the diffraction maximum of order a of the diffraction pattern impinges on the second detector (4), wherein n is selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 and a is selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 and a≠n.

    摘要翻译： 一种用于测试具有已知目标微结构化质量的表面（2）的微结构化质量的装置，包括用于相干辐射的辐射源（1），第一检测器（10）和第二检测器（4）以及掩蔽系统， 所有这些都相对于彼此设置和布置，使得由辐射源（1）发射到表面（2）上的辐射产生衍射图案，其中没有掩蔽系统的衍射图案的阶数n的衍射最大值 将影响第一检测器（10），掩蔽系统防止分配给n阶衍射最大值的80％的光子撞击在第一检测器上，并且衍射图案的阶数a的衍射最大值在第二检测器 检测器（4），其中n选自1,2,3,4,5,6,7,8,9和10，且a选自1,2,3,4， 5，6，7，8，9和10，a≠n。

    DEVICE FOR TESTING THE QUALITY OF MICROSTRUCTURIZATION
    5.
    发明申请
    DEVICE FOR TESTING THE QUALITY OF MICROSTRUCTURIZATION 有权
    用于测试微结构质量的装置

    公开(公告)号：US20130107278A1

    公开(公告)日：2013-05-02

    申请号：US13809207

    申请日：2011-07-08

    申请人： Udo Meyer ,  Susanne Markus ,  Stefan Dieckhoff

    发明人： Udo Meyer ,  Susanne Markus ,  Stefan Dieckhoff

    IPC分类号： G01B11/24

    CPC分类号： G01B11/24 ,  G01B11/303 ,  G01N21/4788 ,  G01N21/956

    摘要： A device is described for testing the quality of microstructurization of a surface (2) in the case of a known target microstructurization quality, comprising a radiation source (1) for coherent radiation, a first detector (10) and a second detector (4) and a masking system, which are set up and arranged with respect to one another so that(a) radiation emitted by the radiation source (1) onto a surface (2), which is provided with a microstructurization of the target quality, produces a diffraction pattern,(b) the diffraction maximum of order n of the diffraction pattern without the masking system would impinge on the first detector (10),(c) the masking system prevents 80% of the photons that are assigned to the diffraction maximum of order n from impinging on the detector and (d) the diffraction maximum of order a of the diffraction pattern impinges on the second detector (4), wherein n is selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 and a is selected from the group consisting of 1, 2, 3, 4, 5, 6, 7, 8, 9 and 10 and a≠n. Corresponding methods and uses are also described.

    摘要翻译： 在已知目标微结构化质量的情况下，描述了用于测试表面（2）的微结构化质量的装置，其包括用于相干辐射的辐射源（1），第一检测器（10）和第二检测器（4） 以及掩蔽系统，其相对于彼此设置和布置，使得（a）由辐射源（1）发射的辐射到具有目标质量的微观结构化的表面（2）上，产生一个 衍射图案，（b）没有掩蔽系统的衍射图案的阶数n的衍射最大值将撞击到第一检测器（10），（c）掩蔽系统防止分配给衍射最大值的80％的光子 （d）衍射图案的阶数a的衍射最大值撞击在第二检测器（4）上，其中n选自1,2,3,4,5,6 ，7,8,9和10，a选自t 他由1，2，3，4，5，6，7，8，9和10组成的组和a <> n。 还描述了相应的方法和用途。

    Process and apparatus for the coating or modification of surfaces
    6.
    发明申请
    Process and apparatus for the coating or modification of surfaces 失效
    用于涂层或改性表面的方法和设备

    公开(公告)号：US20060127574A1

    公开(公告)日：2006-06-15

    申请号：US11344609

    申请日：2006-02-01

    申请人： Stefan Dieckhoff ,  Ralph Wilken

    发明人： Stefan Dieckhoff ,  Ralph Wilken

    IPC分类号： B05D3/02 ,  C23C16/00

    CPC分类号： C23C16/44 ,  C23C16/452 ,  C23C16/455

    摘要： In a process according to the invention and an apparatus according to the invention for the coating or modification of a surface a flow of a first gaseous phase or of a first aerosol comprising one or more precursor compounds is guided along a heated filament so that the precursor compounds are converted into reactive compounds. Alternatively, non-activated particles are guided along a heated filament so that these are activated and are then combined with a gaseous phase or an aerosol comprising a plurality of precursor compounds, so that the precursor compounds are thereby converted into reactive compounds. The reactive compounds formed according to at least one of the two aforementioned steps are guided onto a substrate that is exposed to atmospheric pressure, so that a layer is deposited on the substrate or its surface is modified.

    摘要翻译： 在根据本发明的方法和根据本发明的用于涂覆或改性表面的装置中，第一气相或包含一种或多种前体化合物的第一气雾流沿着加热的细丝被引导，使得前体 化合物被转化成反应性化合物。 或者，未激活的颗粒沿着加热的细丝引导，使得它们被活化，然后与气相或包含多种前体化合物的气溶胶组合，从而将前体化合物转化为反应性化合物。 根据上述两个步骤中的至少一个形成的反应性化合物被引导到暴露于大气压的基底上，使得在基底上沉积一层或其表面。

    Process and apparatus for the coating or modification of surfaces
    8.
    发明授权
    Process and apparatus for the coating or modification of surfaces 失效
    用于涂层或改性表面的方法和设备

    公开(公告)号：US07410669B2

    公开(公告)日：2008-08-12

    申请号：US11344609

    申请日：2006-02-01

    申请人： Stefan Dieckhoff ,  Ralph Wilken

    发明人： Stefan Dieckhoff ,  Ralph Wilken

    IPC分类号： C23C16/00

    CPC分类号： C23C16/44 ,  C23C16/452 ,  C23C16/455

    摘要： In a process according to the invention and an apparatus according to the invention for the coating or modification of a surface a flow of a first gaseous phase or of a first aerosol comprising one or more precursor compounds is guided along a heated filament so that the precursor compounds are converted into reactive compounds. Alternatively, non-activated particles are guided along a heated filament so that these are activated and are then combined with a gaseous phase or an aerosol comprising a plurality of precursor compounds, so that the precursor compounds are thereby converted into reactive compounds. The reactive compounds formed according to at least one of the two aforementioned steps are guided onto a substrate that is exposed to atmospheric pressure, so that a layer is deposited on the substrate or its surface is modified.

    摘要翻译： 在根据本发明的方法和根据本发明的用于涂覆或改性表面的装置中，第一气相或包含一种或多种前体化合物的第一气雾流沿着加热的细丝被引导，使得前体 化合物被转化成反应性化合物。 或者，未激活的颗粒沿着加热的细丝引导，使得它们被活化，然后与气相或包含多种前体化合物的气溶胶组合，从而将前体化合物转化为反应性化合物。 根据上述两个步骤中的至少一个形成的反应性化合物被引导到暴露于大气压的基底上，使得在基底上沉积一层或其表面。