Polysilicon thin film transistor array panel and manufacturing method thereof
    1.
    发明授权
    Polysilicon thin film transistor array panel and manufacturing method thereof 有权
    多晶硅薄膜晶体管阵列面板及其制造方法

    公开(公告)号:US09005697B2

    公开(公告)日:2015-04-14

    申请号:US11866617

    申请日:2007-10-03

    摘要: A method of manufacturing a thin film transistor array panel is provided, which includes: depositing an amorphous silicon layer on an insulating substrate; converting the amorphous silicon layer to a polysilicon layer by a plurality of laser shots using a mask; forming a gate insulating layer on the polysilicon layer; forming a plurality of gate lines on the gate insulating layer; forming a first interlayer insulating layer on the gate lines; forming a plurality of data lines on the first interlayer insulating layer; forming a second interlayer insulating layer on the data lines; and forming a plurality of pixel electrodes on the second interlayer insulating layer, wherein the mask comprises a plurality of transmitting areas and a plurality of blocking areas arranged in a mixed manner.

    摘要翻译: 提供一种制造薄膜晶体管阵列面板的方法,其包括:在绝缘衬底上沉积非晶硅层; 通过使用掩模的多个激光照射将非晶硅层转化为多晶硅层; 在所述多晶硅层上形成栅极绝缘层; 在所述栅极绝缘层上形成多个栅极线; 在栅极线上形成第一层间绝缘层; 在所述第一层间绝缘层上形成多条数据线; 在数据线上形成第二层间绝缘层; 以及在所述第二层间绝缘层上形成多个像素电极,其中所述掩模包括以混合方式布置的多个透射区域和多个阻挡区域。

    POLYSILICON THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF
    4.
    发明申请
    POLYSILICON THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF 有权
    多晶硅薄膜晶体管阵列及其制造方法

    公开(公告)号:US20080115718A1

    公开(公告)日:2008-05-22

    申请号:US11866617

    申请日:2007-10-03

    IPC分类号: C30B28/08 B32B3/10

    摘要: A method of manufacturing a thin film transistor array panel is provided, which includes: depositing an amorphous silicon layer on an insulating substrate; converting the amorphous silicon layer to a polysilicon layer by a plurality of laser shots using a mask; forming a gate insulating layer on the polysilicon layer; forming a plurality of gate lines on the gate insulating layer; forming a first interlayer insulating layer on the gate lines; forming a plurality of data lines on the first interlayer insulating layer; forming a second interlayer insulating layer on the data lines; and forming a plurality of pixel electrodes on the second interlayer insulating layer, wherein the mask comprises a plurality of transmitting areas and a plurality of blocking areas arranged in a mixed manner.

    摘要翻译: 提供一种制造薄膜晶体管阵列面板的方法,其包括:在绝缘衬底上沉积非晶硅层; 通过使用掩模的多个激光照射将非晶硅层转化为多晶硅层; 在所述多晶硅层上形成栅极绝缘层; 在所述栅极绝缘层上形成多个栅极线; 在栅极线上形成第一层间绝缘层; 在所述第一层间绝缘层上形成多条数据线; 在数据线上形成第二层间绝缘层; 以及在所述第二层间绝缘层上形成多个像素电极,其中所述掩模包括以混合方式布置的多个透射区域和多个阻挡区域。

    Polysilicon thin film transistor array panel and manufacturing method thereof
    9.
    发明授权
    Polysilicon thin film transistor array panel and manufacturing method thereof 有权
    多晶硅薄膜晶体管阵列面板及其制造方法

    公开(公告)号:US07294857B2

    公开(公告)日:2007-11-13

    申请号:US11048726

    申请日:2005-02-03

    IPC分类号: H01L29/04

    摘要: A method of manufacturing a thin film transistor array panel is provided, which includes: depositing an amorphous silicon layer on an insulating substrate; converting the amorphous silicon layer to a polysilicon layer by a plurality of laser shots using a mask; forming a gate insulating layer on the polysilicon layer; forming a plurality of gate lines on the gate insulating layer; forming a first interlayer insulating layer on the gate lines; forming a plurality of data lines on the first interlayer insulating layer; forming a second interlayer insulating layer on the data lines; and forming a plurality of pixel electrodes on the second interlayer insulating layer, wherein the mask comprises a plurality of transmitting areas and a plurality of blocking areas arranged in a mixed manner.

    摘要翻译: 提供一种制造薄膜晶体管阵列面板的方法,其包括:在绝缘衬底上沉积非晶硅层; 通过使用掩模的多个激光照射将非晶硅层转化为多晶硅层; 在所述多晶硅层上形成栅极绝缘层; 在所述栅极绝缘层上形成多个栅极线; 在所述栅极线上形成第一层间绝缘层; 在所述第一层间绝缘层上形成多条数据线; 在数据线上形成第二层间绝缘层; 以及在所述第二层间绝缘层上形成多个像素电极,其中所述掩模包括以混合方式布置的多个透射区域和多个阻挡区域。